公开(公告)号：KR1020040050167A

公开(公告)日：2004-06-16

申请号：KR1020020077803

申请日：2002-12-09

Applicant: 한국화학연구원

Inventor： 이미혜 ,  최길영 ,  김용운 ,  박동원 ,  오재민 ,  이범진

IPC: C08G73/10

Abstract: PURPOSE: A polyamic acid derivative having an imide side chain containing double bond for a liquid crystal alignment layer and a monomer for the preparation of the polyamic acid derivative are provided, to improve heat resistance, solubility, surface strength, transparency, vertical alignment of liquid crystal and rubbing resistance. CONSTITUTION: The polyamic acid derivative is represented by the formula 1, wherein n is an integer of 1-300 and m is an integer of 1-30. Preferably the polyamic acid derivative has an intrinsic viscosity of 0.3-1.5 dL/g, a molecular weight of 10,000-150,000 g/mol, a surface pencil hardness of H to 7H, a pretilt angle of 88-89.9 degree and a pretilt angle after rubbing of 70-89.9 degree, is soluble in a solvent selected from the group consisting of dimethyl acetamide, dimethyl formamide, N-methyl-2-pyrrolidone, tetrahydrofuran, chloroform, acetone, ethyl acetate and γ-butyrolactone, and has an imidation temperature of 200-300 deg.C. The monomer is represented by the formula 2, wherein m is an integer of 1-30.

Abstract translation: 目的：提供具有用于液晶取向层的具有双键的酰亚胺侧链和用于制备聚酰胺酸衍生物的单体的聚酰胺酸衍生物，以提高液体的耐热性，溶解性，表面强度，透明性，垂直取向 水晶和耐摩擦性。 构成：聚酰胺酸衍生物由式1表示，其中n为1-300的整数，m为1-30的整数。 优选聚酰胺酸衍生物的特性粘度为0.3-1.5dL / g，分子量为10,000-150,000g / mol，表面铅笔硬度为H至7H，预倾角为88-89.9度，预倾角为 摩擦70-89.9度，可溶于选自二甲基乙酰胺，二甲基甲酰胺，N-甲基-2-吡咯烷酮，四氢呋喃，氯仿，丙酮，乙酸乙酯和γ-丁内酯的溶剂，并具有酰亚胺化温度 200-300摄氏度 单体由式2表示，其中m为1-30的整数。

公开(公告)号：KR1020030018153A

公开(公告)日：2003-03-06

申请号：KR1020010051727

申请日：2001-08-27

Applicant: 한국화학연구원 ,  제일모직주식회사

Inventor： 진문영 ,  최길영 ,  김대겸 ,  박동원 ,  오재민 ,  이무영 ,  동현수

IPC: G03F7/004 ,  G03F7/012

CPC classification number: G03F7/0387 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/037 ,  G03F7/0392 ,  G03F7/0751 ,  G03F7/38

Abstract: PURPOSE: An acid liable polyamide polymer and a photosensitive heat resisting insulator composition containing the polymer are provided, which are improved in the photosensitivity, the resolution, the mechanical properties and the flatness of coating. CONSTITUTION: The acid liable polyamide polymer has a repeating unit represented by the formula 1, and contains an acetal or carbonate side group as an acid liable group and a terminal group containing an acetylene group, wherein Ar1 is a tetravalent aromatic group; Ar2 is a divalent aromatic group; R1 and R2 are the same or different each other and are an acid liable group comprising carbonate or acetal; T1 and T2 are the same or different each other and are a terminal group comprising acetylene group; and m and n are an integer of 5-100, respectively. The acid liable polyamide polymer can be a homopolymer or a copolymer according to the combination of Ar1 and Ar2. The photosensitive heat resisting insulator composition comprises the polyamide polymer; and 0.3-15 wt% of a photoacid generator.

Abstract translation: 目的：提供含有聚合物的耐酸聚酰胺聚合物和含有聚合物的感光耐热绝缘体组合物，其改善了光敏性，分辨率，机械性能和涂层的平整度。 构成：酸性聚酰胺聚合物具有式1表示的重复单元，含有作为酸性基团的缩醛或碳酸酯侧基和含有乙炔基的末端基，其中Ar1为四价芳香族基团; Ar2是二价芳族基团; R1和R2彼此相同或不同，是含有碳酸酯或缩醛的酸性基团; T1和T2彼此相同或不同，并且是包含乙炔基的末端基团; m和n分别为5-100的整数。 耐酸的聚酰胺聚合物可以是根据Ar1和Ar2的组合的均聚物或共聚物。 感光耐热绝缘体组合物包含聚酰胺聚合物; 和0.3-15重量％的光酸产生剂。

公开(公告)号：KR100316735B1

公开(公告)日：2001-12-12

申请号：KR1019990025080

申请日：1999-06-29

Applicant: 한국화학연구원 ,  제일모직주식회사

Inventor： 진문영 ,  최길영 ,  원종찬 ,  김태균 ,  우상선 ,  박동원 ,  오재민 ,  이무영

IPC: C08G73/10

Abstract: 본발명은카르보네이트측쇄를포함하는폴리아미드중합체와감광성내열절연체조성물에관한것으로서, 더욱상세하게는빛에의해감광된부분은현상액에의해용해되고, 빛을받지않은부분은남아있다가후공정인가열공정에의해내열성고분자로전환이가능한기능을가진신규카르보네이트측쇄를포함하는폴리아미드중합체와, 상기한폴리아미드중합체와소량의광산발생제를함유시켜패시베이션막(passivation layer), 완충막(buffer coat) 또는복합다층인쇄회로기판의층간절연막등으로의사용이가능한감광성내열절연체조성물에관한것이다.

公开(公告)号：KR1020010011635A

公开(公告)日：2001-02-15

申请号：KR1019990031105

申请日：1999-07-29

Applicant: 한국화학연구원 ,  제일모직주식회사

Inventor： 진문영 ,  최길영 ,  원종찬 ,  김태균 ,  우상선 ,  박동원 ,  오재민 ,  이무영

IPC: C08G69/02

CPC classification number: C08G69/02 ,  C08L77/00 ,  C08L2201/02

Abstract: PURPOSE: A novel polyamide polymer capable of preventing an increase of a dielectric constant by the remaining hydroxyl group and having high heat resistance by transforming a hydroxyl group produced by pyrolysis of acetal or a side chain of its cyclic derivatives by heating a patterned exposed section to a thermally stable benzoxazole group and photosensitive heat resistant insulator composition are provided, which are useful as a layer insulation film of a passivation layer of semiconductors, a buffer coat or composite multilayer PCP. CONSTITUTION: A polyamide polymer having an intrinsic viscosity of 0.1 to 2.5 dL/g contains the formula 1 as a repeating unit and a photosensitive heat resistant insulator composition contains 0.3 to 20% by weight of a photoacid generator based on the polyamide. A concentration of an acid sensitive group (-OR1 or -OR2) is 3 to 70%. The photoacid generator is a material for generating an acid by absorbing light in an area of long wavelength (more than 300nm) as compared to an absorbing area of polyamide

Abstract translation: 目的：一种新型的聚酰胺聚合物，其能够通过将图案化的曝光部分加热而将通过热解乙缩醛或其环状衍生物的侧链产生的羟基转化为具有高残留羟基并且具有高耐热性的介电常数 提供了热稳定的苯并恶唑基和感光耐热绝缘体组合物，其可用作半导体钝化层，缓冲涂层或复合多层PCP的层绝缘膜。 构成：特性粘度为0.1〜2.5dL / g的聚酰胺聚合物含有式1作为重复单元，感光耐热性绝缘体组合物含有0.3〜20重量％的基于聚酰胺的光致酸发生剂。 酸敏感基团（-OR1或-OR2）的浓度为3〜70％。 光致酸发生器是通过吸收长波长（大于300nm）的区域中的光而与聚酰胺的吸收区域相比产生酸的材料