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公开(公告)号：KR100322234B1
公开(公告)日：2002-02-07
申请号：KR1019990031105
申请日：1999-07-29
IPC: C08G69/02
Abstract: 본발명은아세탈또는이의고리화유도체를측쇄로포함하는폴리아미드중합체와감광성내열절연체조성물에관한것으로서, 더욱상세하게는빛에의해감광된부분은현상액에의해용해되고, 빛을받지않은부분은남아있다가후공정인가열공정에의해내열성고분자로전환이가능한기능을가진아세탈또는이의고리화유도체를측쇄로포함하는신규폴리아미드중합체와, 상기한폴리아미드중합체와소량의광산발생제가함유되어있어패시베이션막(passivation layer), 완충막(buffer coat) 또는복합다층인쇄회로기판의층간절연막등으로의사용이가능한감광성내열절연체조성물에관한것이다.
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公开(公告)号：KR100491930B1
公开(公告)日：2005-05-27
申请号：KR1020020077803
申请日：2002-12-09
Applicant: 한국화학연구원
IPC: C08G73/10
Abstract: 본 발명은 이중결합 함유 이미드 측쇄기를 갖는 폴리아믹산 유도체에 관한 것으로서, 보다 상세하게는 지방족 테트라카르복실산이무수물과 이중결합 함유 이미드 측쇄기를 갖는 방향족 디아민을 적정비율로 포함한 혼합물을 용액중합함으로써 폴리아믹산 유도체에 이중 결합이 함유된 이미드 측쇄기를 부여하고, 이를 원료로하여 내열성, 용해성, 표면강도특성, 기계적 특성, 투명성, 액정의 수직배향성 및 특히 내러빙특성이 우수한 폴리이미드 수지 유도체를 제조할 수 있고, 액정 공정에 대한 안정성이 우수하기 때문에 수직배향형 TFT-TN 및 STN LCD용 액정배향막으로의 응용이 가능한 폴리이미드 수지 유도체를 제조할 수 있는 신규한 이중결합 함유 이미드 측쇄기를 갖는 폴리아믹산 유도체에 관한 것이다.
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公开(公告)号：KR100468052B1
公开(公告)日：2005-01-24
申请号：KR1020010060354
申请日：2001-09-28
Applicant: 한국화학연구원
IPC: C08G73/10
Abstract: PURPOSE: A polyamic acid derivative having an aliphatic ring-based side chain for a liquid crystal alignment layer is provided, to improve the heat resistance, the surface strength characteristic, the transparency, the pretilt angle of liquid crystal and the solubility of the polyamic acid derivative. CONSTITUTION: The polyamic acid derivative is represented by the formula 1, wherein n is an integer of 1-300. Preferably the polyamic acid derivative has an intrinsic viscosity of 0.3-1.5 dL/g, a molecular weight of 10,000-150,000, a glass transition temperature of 230-400 deg.C, a pretilt angle of 4-89.5 degree, and an imidization temperature of 200-300 deg.C. The polyamic acid derivative is soluble in dimethylacetamide, dimethylformamide, N-methyl-2-pyrrolidone, tetrahydrofuran, chloroform, acetone, ethyl acetate or γ-butyrolactone.
Abstract translation: 目的：提供一种用于液晶取向层的具有脂肪族环系侧链的聚酰胺酸衍生物，以提高耐热性，表面强度特性，透明性，液晶的预倾角和聚酰胺酸的溶解性 衍生物。 构成：聚酰胺酸衍生物由式1表示，其中n是1-300的整数。 优选聚酰胺酸衍生物的特性粘度为0.3-1.5dL / g，分子量为10,000-150,000，玻璃化转变温度为230-400℃，预倾角为4-89.5度，酰亚胺化温度 200-300℃。 聚酰胺酸衍生物可溶于二甲基乙酰胺，二甲基甲酰胺，N-甲基-2-吡咯烷酮，四氢呋喃，氯仿，丙酮，乙酸乙酯或γ-丁内酯。
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公开(公告)号：KR100435517B1
公开(公告)日：2004-06-10
申请号：KR1020010051727
申请日：2001-08-27
Abstract: PURPOSE: An acid liable polyamide polymer and a photosensitive heat resisting insulator composition containing the polymer are provided, which are improved in the photosensitivity, the resolution, the mechanical properties and the flatness of coating. CONSTITUTION: The acid liable polyamide polymer has a repeating unit represented by the formula 1, and contains an acetal or carbonate side group as an acid liable group and a terminal group containing an acetylene group, wherein Ar1 is a tetravalent aromatic group; Ar2 is a divalent aromatic group; R1 and R2 are the same or different each other and are an acid liable group comprising carbonate or acetal; T1 and T2 are the same or different each other and are a terminal group comprising acetylene group; and m and n are an integer of 5-100, respectively. The acid liable polyamide polymer can be a homopolymer or a copolymer according to the combination of Ar1 and Ar2. The photosensitive heat resisting insulator composition comprises the polyamide polymer; and 0.3-15 wt% of a photoacid generator.
Abstract translation: 目的：提供一种酸敏聚酰胺聚合物和含有该聚合物的光敏耐热绝缘体组合物，其光敏性，分辨率，机械性能和涂层的平整度得到改善。 组成：酸性聚酰胺聚合物具有由式1表示的重复单元，并且包含作为酸性可
能基团的缩醛或碳酸酯侧基和含有乙炔基的端基，其中Ar 1是四价芳族基团; Ar2是二价芳族基团; R1和R2彼此相同或不同，并且是包含碳酸酯或缩醛的酸性可逆基团; T1和T2彼此相同或不同，并且是包含乙炔基的端基; m和n分别是5-100的整数。 根据Ar 1和Ar 2的组合，酸性聚酰胺聚合物可以是均聚物或共聚物。 该光敏耐热绝缘体组合物包含聚酰胺聚合物; 和0.3-15重量％的光酸产生剂。-
公开(公告)号：KR1020040050167A
公开(公告)日：2004-06-16
申请号：KR1020020077803
申请日：2002-12-09
Applicant: 한국화학연구원
IPC: C08G73/10
Abstract: PURPOSE: A polyamic acid derivative having an imide side chain containing double bond for a liquid crystal alignment layer and a monomer for the preparation of the polyamic acid derivative are provided, to improve heat resistance, solubility, surface strength, transparency, vertical alignment of liquid crystal and rubbing resistance. CONSTITUTION: The polyamic acid derivative is represented by the formula 1, wherein n is an integer of 1-300 and m is an integer of 1-30. Preferably the polyamic acid derivative has an intrinsic viscosity of 0.3-1.5 dL/g, a molecular weight of 10,000-150,000 g/mol, a surface pencil hardness of H to 7H, a pretilt angle of 88-89.9 degree and a pretilt angle after rubbing of 70-89.9 degree, is soluble in a solvent selected from the group consisting of dimethyl acetamide, dimethyl formamide, N-methyl-2-pyrrolidone, tetrahydrofuran, chloroform, acetone, ethyl acetate and γ-butyrolactone, and has an imidation temperature of 200-300 deg.C. The monomer is represented by the formula 2, wherein m is an integer of 1-30.
Abstract translation: 目的：提供具有用于液晶取向层的具有双键的酰亚胺侧链和用于制备聚酰胺酸衍生物的单体的聚酰胺酸衍生物，以提高液体的耐热性，溶解性，表面强度，透明性，垂直取向 水晶和耐摩擦性。 构成：聚酰胺酸衍生物由式1表示，其中n为1-300的整数，m为1-30的整数。 优选聚酰胺酸衍生物的特性粘度为0.3-1.5dL / g，分子量为10,000-150,000g / mol，表面铅笔硬度为H至7H，预倾角为88-89.9度，预倾角为 摩擦70-89.9度，可溶于选自二甲基乙酰胺，二甲基甲酰胺，N-甲基-2-吡咯烷酮，四氢呋喃，氯仿，丙酮，乙酸乙酯和γ-丁内酯的溶剂，并具有酰亚胺化温度 200-300摄氏度 单体由式2表示，其中m为1-30的整数。
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Patent Agency Ranking
公开(公告)号：KR1020030018153A
公开(公告)日：2003-03-06
申请号：KR1020010051727
申请日：2001-08-27
CPC classification number: G03F7/0387 , G03F7/0226 , G03F7/0233 , G03F7/037 , G03F7/0392 , G03F7/0751 , G03F7/38
Abstract: PURPOSE: An acid liable polyamide polymer and a photosensitive heat resisting insulator composition containing the polymer are provided, which are improved in the photosensitivity, the resolution, the mechanical properties and the flatness of coating. CONSTITUTION: The acid liable polyamide polymer has a repeating unit represented by the formula 1, and contains an acetal or carbonate side group as an acid liable group and a terminal group containing an acetylene group, wherein Ar1 is a tetravalent aromatic group; Ar2 is a divalent aromatic group; R1 and R2 are the same or different each other and are an acid liable group comprising carbonate or acetal; T1 and T2 are the same or different each other and are a terminal group comprising acetylene group; and m and n are an integer of 5-100, respectively. The acid liable polyamide polymer can be a homopolymer or a copolymer according to the combination of Ar1 and Ar2. The photosensitive heat resisting insulator composition comprises the polyamide polymer; and 0.3-15 wt% of a photoacid generator.
Abstract translation: 目的：提供含有聚合物的耐酸聚酰胺聚合物和含有聚合物的感光耐热绝缘体组合物，其改善了光敏性，分辨率，机械性能和涂层的平整度。 构成：酸性聚酰胺聚合物具有式1表示的重复单元，含有作为酸性基团的缩醛或碳酸酯侧基和含有乙炔基的末端基，其中Ar1为四价芳香族基团; Ar2是二价芳族基团; R1和R2彼此相同或不同，是含有碳酸酯或缩醛的酸性基团; T1和T2彼此相同或不同，并且是包含乙炔基的末端基团; m和n分别为5-100的整数。 耐酸的聚酰胺聚合物可以是根据Ar1和Ar2的组合的均聚物或共聚物。 感光耐热绝缘体组合物包含聚酰胺聚合物; 和0.3-15重量％的光酸产生剂。
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公开(公告)号：KR100316735B1
公开(公告)日：2001-12-12
申请号：KR1019990025080
申请日：1999-06-29
IPC: C08G73/10
Abstract: 본발명은카르보네이트측쇄를포함하는폴리아미드중합체와감광성내열절연체조성물에관한것으로서, 더욱상세하게는빛에의해감광된부분은현상액에의해용해되고, 빛을받지않은부분은남아있다가후공정인가열공정에의해내열성고분자로전환이가능한기능을가진신규카르보네이트측쇄를포함하는폴리아미드중합체와, 상기한폴리아미드중합체와소량의광산발생제를함유시켜패시베이션막(passivation layer), 완충막(buffer coat) 또는복합다층인쇄회로기판의층간절연막등으로의사용이가능한감광성내열절연체조성물에관한것이다.
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8.发明公开
公开(公告)号：KR1020010011635A
公开(公告)日：2001-02-15
申请号：KR1019990031105
申请日：1999-07-29
IPC: C08G69/02
CPC classification number: C08G69/02 , C08L77/00 , C08L2201/02
Abstract: PURPOSE: A novel polyamide polymer capable of preventing an increase of a dielectric constant by the remaining hydroxyl group and having high heat resistance by transforming a hydroxyl group produced by pyrolysis of acetal or a side chain of its cyclic derivatives by heating a patterned exposed section to a thermally stable benzoxazole group and photosensitive heat resistant insulator composition are provided, which are useful as a layer insulation film of a passivation layer of semiconductors, a buffer coat or composite multilayer PCP. CONSTITUTION: A polyamide polymer having an intrinsic viscosity of 0.1 to 2.5 dL/g contains the formula 1 as a repeating unit and a photosensitive heat resistant insulator composition contains 0.3 to 20% by weight of a photoacid generator based on the polyamide. A concentration of an acid sensitive group (-OR1 or -OR2) is 3 to 70%. The photoacid generator is a material for generating an acid by absorbing light in an area of long wavelength (more than 300nm) as compared to an absorbing area of polyamide
Abstract translation: 目的：一种新型的聚酰胺聚合物，其能够通过将图案化的曝光部分加热而将通过热解乙缩醛或其环状衍生物的侧链产生的羟基转化为具有高残留羟基并且具有高耐热性的介电常数 提供了热稳定的苯并恶唑基和感光耐热绝缘体组合物，其可用作半导体钝化层，缓冲涂层或复合多层PCP的层绝缘膜。 构成：特性粘度为0.1〜2.5dL / g的聚酰胺聚合物含有式1作为重复单元，感光耐热性绝缘体组合物含有0.3〜20重量％的基于聚酰胺的光致酸发生剂。 酸敏感基团（-OR1或-OR2）的浓度为3〜70％。 光致酸发生器是通过吸收长波长（大于300nm）的区域中的光而与聚酰胺的吸收区域相比产生酸的材料
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公开(公告)号：KR100491944B1
公开(公告)日：2005-05-30
申请号：KR1020020077802
申请日：2002-12-09
Applicant: 한국화학연구원
IPC: C08G73/10
Abstract: 본 발명은 이미드 고리 함유 측쇄기를 갖는 액정배향막용 폴리아믹산 유도체와 그의 제조방법에 관한 것으로서, 보다 상세하게는 지방족 고리계 산이무수물을 적정비율 이상 포함하는 산이무수물과 이미드 고리 함유 측쇄기를 갖는 방향족 디아민을 적정비율 이상 포함하는 방향족 디아민류를 용액중합함으로써, 제조된 폴리아믹산이 이미드 고리를 측쇄기로 갖게 되어 내열성과 표면강도 특성 등의 기계적특성과 투명성 및 액정의 수직 배향성이 우수한 폴리이미드 수지를 제조할 수 있는 신규한 폴리아믹산 유도체와 그의 제조방법에 관한 것이다.
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公开(公告)号：KR1020040050166A
公开(公告)日：2004-06-16
申请号：KR1020020077802
申请日：2002-12-09
Applicant: 한국화학연구원
IPC: C08G73/10
Abstract: PURPOSE: A polyamic acid derivative having an imide ring-containing side chain for a liquid crystal alignment layer and a monomer for the preparation of the polyamic acid derivative are provided, to improve heat resistance, surface strength, transparency and vertical alignment of liquid crystal. CONSTITUTION: The polyamic acid derivative is represented by the formula 1, wherein n is an integer of 1-300 and m is an integer of 1-30. Preferably the polyamic acid derivative has an intrinsic viscosity of 0.3-1.5 dL/g, a molecular weight of 10,000-150,000 g/mol, a glass transition temperature of 230-400 deg.C and a pretilt angle of 85-89.9 degree, is soluble in a solvent selected from the group consisting of dimethyl acetamide, dimethyl formamide, N-methyl-2-pyrrolidone, tetrahydrofuran, chloroform, acetone, ethyl acetate and γ -butyrolactone, and has an imidation temperature of 200-300 deg.C. The monomer is represented by the formula 2, wherein m is an integer of 1-30.
Abstract translation: 目的：提供具有用于液晶取向层的含酰亚胺环的侧链和制备聚酰胺酸衍生物的单体的聚酰胺酸衍生物，以提高液晶的耐热性，表面强度，透明性和垂直取向。 构成：聚酰胺酸衍生物由式1表示，其中n为1-300的整数，m为1-30的整数。 优选聚酰胺酸衍生物的特性粘度为0.3-1.5dL / g，分子量为10,000-150,000g / mol，玻璃化转变温度为230-400℃，预倾角为85-89.9度，为 溶于选自二甲基乙酰胺，二甲基甲酰胺，N-甲基-2-吡咯烷酮，四氢呋喃，氯仿，丙酮，乙酸乙酯，γ-丁内酯的溶剂中，酰亚胺化温度为200〜300℃。 单体由式2表示，其中m为1-30的整数。
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