公开(公告)号：US20240361698A1

公开(公告)日：2024-10-31

申请号：US18565200

申请日：2022-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus HARTGERS ,  Marco Matheus Louis STEEGHS ,  Gerardus Hubertus Petrus Maria SWINKELS ,  Giovanni IMPONENTE ,  Nicholas William Maria PLANTZ ,  Wouter Joep ENGELEN ,  Marcus Adrianus VAN DE KERKHOF

IPC: G03F7/20

CPC classification number: G03F7/2002

Abstract: A plate for use in an imaging system to determine at least two optical properties of an illumination beam of the imaging system, the imaging system configured to illuminate an illumination region with the illumination beam, the plate including a plurality of markers, wherein a first subset of the plurality of markers includes a first type of markers for determining a first optical property of the illumination beam, and a second subset of the plurality of markers includes a second type of markers for determining a second optical property of the illumination beam, wherein the plurality of markers are located within a marker region of the plate and the marker region generally corresponds to the illumination region.

公开(公告)号：US20240094647A1

公开(公告)日：2024-03-21

申请号：US17768881

申请日：2020-09-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Ferdinandus Martinus Jozef Henricus VAN DE WETERING ,  Andrei Mikhailovich YAKUNIN

IPC: G03F7/00

CPC classification number: G03F7/70933 ,  G03F7/70725 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70916

Abstract: A reticle conditioning system includes: a support structure to support a reticle; a gas supply module to provide a flow of gas adjacent to the reticle; and a biasing module to control an electrical potential of the reticle. The biasing module includes a first electrode, a second electrode and a voltage supply. The first and second electrodes are each spaced apart from and facing the reticle, when the reticle is supported by the support structure, so as to at least partially overlap with the reticle. The voltage supply is arranged to maintain the first electrode at a positive voltage, and the second electrode at a negative voltage, these voltages being such that the voltage of the reticle is negative. The second electrode is disposed such that, when the reticle is supported by the support structure, it does not overlap an image forming portion of the reticle.

公开(公告)号：US20230296986A1

公开(公告)日：2023-09-21

申请号：US18017365

申请日：2021-07-19

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Timothy Allan BRUNNER ,  Marcus Adrianus VAN DE KERKHOF

IPC: G03F7/20

CPC classification number: G03F7/70475 ,  G03F7/70466

Abstract: A lithographic system and a method for exposing a substrate are provided. The method includes providing a plurality of mask sets. Each mask set includes complementary masks corresponding to a respective pattern. The method further comprises exposing the substrate with the plurality of mask sets. A stitch location between the complementary masks of a mask set is different than a stitch location between the complementary masks of each other mask set of the plurality of mask sets.

公开(公告)号：US20220276553A1

公开(公告)日：2022-09-01

申请号：US17637891

申请日：2020-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Sander BALTUSSEN ,  Vadim Yevgenyevich BANINE ,  Alexandr DOLGOV ,  DONMEZ NOYAN ,  Zomer Silvester HOUWELING ,  Arnoud Willem NOTENBOOM ,  Marcus Adrianus VAN DE KERKHOF ,  Ties Wouter VAN DER WOORD ,  Paul Alexander VERMEULEN ,  David Ferdinand VLES ,  Victoria VORONINA ,  Halil Gökay YEGEN

IPC: G03F1/62 ,  C01B32/158 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.

公开(公告)号：US20220075279A1

公开(公告)日：2022-03-10

申请号：US17428897

申请日：2020-01-24

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF

IPC: G03F7/20 ,  G03F1/38 ,  G03F1/82 ,  H01L21/67

Abstract: A method of protecting a component of a lithographic apparatus, the method including the steps of: providing a protective cover which is shaped to protect at least part of said component, the protective cover having a contact surface which is arranged to adhere to a first surface of at least part of said lithographic apparatus or said component; and bringing the protective cover into proximity with the component so as to cause the contact surface to adhere to the lithographic apparatus or said component and remain adhered without the application of external force. It is also provided a patterning device for use in a lithographic apparatus and a lithographic apparatus.

公开(公告)号：US20190171109A1

公开(公告)日：2019-06-06

申请号：US16257955

申请日：2019-01-25

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Anton Bernhard Van Oosten ,  Hans Butler ,  Erik Roelof Loopstra ,  Marc Wilhelmus Maria Van Der Wijst ,  Koen Jacobus Johannes Maria Zaal

IPC: G03F7/20 ,  G02B26/08 ,  G02B7/182

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

公开(公告)号：US20170153556A1

公开(公告)日：2017-06-01

申请号：US15428858

申请日：2017-02-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Timotheus Franciscus SENGERS ,  Marcus Adrianus VAN DE KERKHOF ,  Mark Kroon ,  Kees VAN WEERT

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70058 ,  G03F7/70191 ,  G03F7/70341 ,  G03F7/7055 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.

公开(公告)号：US20150323872A1

公开(公告)日：2015-11-12

申请号：US14762190

申请日：2013-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Anton Bernhard VAN OOSTEN ,  Hans BUTLER ,  Erik Roelof LOOPSTRA ,  Marc Wilhelmus Maria VAN DER WIJST ,  Koen Jacobus Johannes Maria ZAAL

IPC: G03F7/20 ,  G02B7/182

CPC classification number: G03F7/702 ,  G02B7/182 ,  G02B7/1827 ,  G02B26/0825 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70575 ,  G03F7/709

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

Abstract translation: 公开了一种被配置为将光束投射到光刻设备内的基板的目标部分上的系统。 该系统包括具有用于定位反射镜和/或配置反射镜形状的致动器（500）的反射镜（510），致动器还为反射镜提供主动阻尼，以及用于产生致动器控制的控制器（515a，515b） 用于控制所述致动器的信号。 当定位所述反射镜和/或构造所述反射镜的形状时，第一坐标系用于控制所述致动器，并且当向所述反射镜提供主动阻尼时，使用第二坐标系来控制所述致动器。

公开(公告)号：US20150116683A1

公开(公告)日：2015-04-30

申请号：US14584956

申请日：2014-12-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Timotheus Franciscus SENGERS ,  Marcus Adrianus VAN DE KERKHOF ,  Mark KROON ,  Kees VAN WEERT

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70058 ,  G03F7/70191 ,  G03F7/70341 ,  G03F7/7055 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.

Abstract translation: 提供了一种光刻设备，其具有在基底水平的传感器，所述传感器包括辐射接收器，支撑辐射接收器的透射板和辐射探测器，其中所述传感器布置成避免辐射接收器与最终的辐射之间的辐射损失 辐射探测器的元件。

公开(公告)号：US20240337956A1

公开(公告)日：2024-10-10

申请号：US18578780

申请日：2022-07-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Lucas Christiaan Johan HEIJMANS ,  Imre Rudolf Richard DEHNER ,  Raymond Wilhelmus Louis LAFARRE ,  Cornelis Christiaan OTTENS ,  Marcus Adrianus VAN DE KERKHOF ,  Andrey NIKIPELOV ,  Dennis VANOTTERDIJK ,  Edwin Johannes Theodorus SMULDERS ,  Andrei Mikhailovich YAKUNIN ,  Guido SALMASO ,  Luc VOORDECKERS ,  Chaitanya Krishna ANDE ,  Martinus Jacobus Johannes COENEN

IPC: G03F7/00 ,  G03F1/62

CPC classification number: G03F7/70925 ,  G03F7/70708 ,  G03F7/7085 ,  G03F7/70875 ,  G03F1/62

Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus including at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules include a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms include: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.