公开(公告)号：US20220035239A1

公开(公告)日：2022-02-03

申请号：US17278356

申请日：2019-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter-Jan VAN ZWOL ,  Sander BALTUSSEN ,  Dennis DE GRAAF ,  Johannes Christiaan Leonardus FRANKEN ,  Adrianus Johannes Maria GIESBERS ,  Alexander Ludwig KLEIN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Alexey Sergeevich KUZNETSOV ,  Arnoud Willem NOTENBOOM ,  Mahdiar VALEFI ,  Marcus Adrianus VAN DE KERKHOF ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Ties Wouter VAN DER WOORD ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

公开(公告)号：US20220276553A1

公开(公告)日：2022-09-01

申请号：US17637891

申请日：2020-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Sander BALTUSSEN ,  Vadim Yevgenyevich BANINE ,  Alexandr DOLGOV ,  DONMEZ NOYAN ,  Zomer Silvester HOUWELING ,  Arnoud Willem NOTENBOOM ,  Marcus Adrianus VAN DE KERKHOF ,  Ties Wouter VAN DER WOORD ,  Paul Alexander VERMEULEN ,  David Ferdinand VLES ,  Victoria VORONINA ,  Halil Gökay YEGEN

IPC: G03F1/62 ,  C01B32/158 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.