公开(公告)号：EP4268256A1

公开(公告)日：2023-11-01

申请号：EP21834768.0

申请日：2021-12-08

Applicant: ASML Netherlands B.V.

Inventor： STEENBRINK, Stijn, Wilem, Herman, Karel ,  KONING, Johan, Joost ,  VAN SOEST, Jurgen ,  WIELAND, Marco, Jan-Jaco

IPC: H01J37/12 ,  H01J37/28

公开(公告)号：EP4214738A2

公开(公告)日：2023-07-26

申请号：EP21763090.4

申请日：2021-08-19

Applicant: ASML Netherlands B.V.

Inventor： VAN DER KROON, Boudewijn, Weijert, Herman, Jan ,  VAN SOEST, Jurgen

IPC: H01J37/248 ,  H01R13/53

公开(公告)号：EP4211711A1

公开(公告)日：2023-07-19

申请号：EP21759097.5

申请日：2021-08-16

Applicant: ASML Netherlands B.V.

Inventor： WALVOORT, Derk, Ferdinand ,  MUDRETSOV, Dmitry ,  HU, Xuerang ,  XI, Qingpo ,  VAN SOEST, Jurgen ,  WIELAND, Marco, Jan-Jaco

IPC: H01J37/09 ,  H01J37/16 ,  H01J37/28 ,  H01J37/317

公开(公告)号：EP4128309A1

公开(公告)日：2023-02-08

申请号：EP21711562.5

申请日：2021-03-15

Applicant: ASML Netherlands B.V.

Inventor： VAN SOEST, Jurgen ,  BERGLUND, Gun Sara Mari ,  HUANG FOEN CHUNG, Robert Wong Joek Meu ,  MARTINEZ NEGRETE GASQUE, Diego ,  DINU GURTLER, Laura

IPC: H01J37/02 ,  H01J37/28

公开(公告)号：EP4102535A1

公开(公告)日：2022-12-14

申请号：EP21178234.7

申请日：2021-06-08

Applicant: ASML Netherlands B.V.

Inventor： VAN SOEST, Jurgen ,  VEENSTRA, Roy Ramon ,  SMAKMAN, Erwin Paul ,  VAN ZUTPHEN, Tom ,  MANGNUS, Albertus Victor Gerardus

IPC: H01J37/073

Abstract: The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.

公开(公告)号：EP3879557A1

公开(公告)日：2021-09-15

申请号：EP20161844.4

申请日：2020-03-09

Applicant: ASML Netherlands B.V.

Inventor： VAN SOEST, Jurgen ,  VAN DER KROON, Boudewijn, Weijert, Herman, Jan

IPC: H01J37/04 ,  H01J37/09

Abstract: An aperture body for passing a portion of a charged particle beam propagating along a beam path comprising an axis, the aperture body comprising: an aperture portion defining an opening around the axis; wherein the aperture portion comprises, adjacent to the opening, an up-beam facing surface, and a down-beam facing surface; wherein the up-beam facing surface is angled with respect to a plane that is perpendicular to the axis, so that the opening in the up-beam facing surface is up-beam of a more radially outward portion of the up-beam facing surface.