公开(公告)号：NL2007577A

公开(公告)日：2012-05-14

申请号：NL2007577

申请日：2011-10-12

Applicant: ASML NETHERLANDS BV

Inventor： FENG HANYING ,  CAO YU ,  YE JUN

IPC: G03F7/20

公开(公告)号：NL2007579A

公开(公告)日：2012-05-14

申请号：NL2007579

申请日：2011-10-12

Applicant: ASML NETHERLANDS BV

Inventor： FENG HANYING ,  CAO YU ,  YE JUN

IPC: G03F7/20

Abstract: Described herein are methods for matching the characteristics of a lithographic projection apparatus to a reference lithographic projection apparatus, where the matching includes optimizing projection optics characteristics. The projection optics can be used to shape wavefront in the lithographic projection apparatus. According to the embodiments herein, the methods can be accelerated by using linear fitting algorithm or using Taylor series expansion using partial derivatives of transmission cross coefficients (TCCs).