公开(公告)号：JP2008205465A

公开(公告)日：2008-09-04

申请号：JP2008032818

申请日：2008-02-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  LOOPSTRA ERIK R ,  RIEPEN MICHEL ,  MONDT EVA

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a system for removing a liquid from a substrate table, in particular, from a gap between the substrate table and a substrate, and to provide a method therefor.
SOLUTION: In the liquid removing method, the liquid is removed from the substrate held on the substrate table and from the gap between the substrate and the substrate table. A liquid removing device is provided with at least one outlet port, forming a predetermined geometric long and thin extractor; the substrate table is moved relative to the liquid removing device so that the extractor passes all through the substrate and the gap; and that the local tangent in the local portion of the extractor at the end of non-dry portion in the gap substantially holds the angle between about 35° and 90° on a planar view, at arbitrary times with respect to that in the gap.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于从衬底台，特别是从衬底台和衬底之间的间隙去除液体的系统，并提供其方法。 解决方案：在液体去除方法中，液体从保持在基板台上的基板和基板与基板台之间的间隙移除。 液体去除装置设置有至少一个出口，形成预定的几何长薄抽提器; 衬底台相对于液体去除装置移动，使得提取器全部通过衬底和间隙; 并且在间隙中非干燥部分末端处的提取器的局部部分中的局部切线在平面视图上基本上保持约35°至90°之间的角度，相对于间隙中的任意时间。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008153652A

公开(公告)日：2008-07-03

申请号：JP2007315494

申请日：2007-12-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  MONDT EVA ,  ZDRAVKOV ALEXANDER NIKOLOV

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a lithographic method which can reduce passage of air through liquid or contamination of the liquid. SOLUTION: The lithographic apparatus comprises a substrate table for holding a substrate, a projection system for projecting a patterned radiation beam projected on the substrate, a liquid supplying system which supplies liquid to a space between the projection system, the substrate table, and the substrate, and a sealing prepared to the substrate table. The sealing can be operated from opened configuration to closed configuration, and in closed configuration, when a substrate is on the substrate table, the sealing closes a gap between them. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供可以减少空气通过液体或液体污染的光刻设备和光刻方法。 解决方案：光刻设备包括用于保持基板的基板台，用于投影投影在基板上的图案化辐射束的投影系统，将液体供应到投影系统，基板台之间的空间的液体供应系统， 和衬底，以及准备到衬底台的密封。 密封可以从打开的构型操作到闭合构型，并且在封闭构造中，当衬底位于衬底台上时，密封封闭它们之间的间隙。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2005260234A

公开(公告)日：2005-09-22

申请号：JP2005064873

申请日：2005-03-09

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： HOL SVEN ANTOIN JOHAN ,  COX HENRIKUS HERMAN MARIE ,  JACOBS HERNES ,  VREUGDEWATER PATRICIA ,  ZAAL KOEN JACOBUS JOHANNES MAR

IPC: G03F7/20 ,  H01L21/027 ,  H02K41/035

CPC classification number: G03F7/70758 ,  G03F7/70941

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus, a lorentz actuator, and a method for manufacturing a device. SOLUTION: The lithography apparatus has an extremely effective lorentz actuator. The lorentz actuator has a conductive element for generating a force by the interaction of a main magnet system and an auxiliary magnet system which are disposed in a haulback configuration with a current carried by a conductive element, and a synthesized magnetic field of first and second magnetic fields generated by the main magnet system and the auxiliary magnet system respectively. The lorentz actuator further has a magnetic element substantially extending between the outside of a first magnet system subassembly and the outside of a second magnet system subassembly. The magnetic element guides part of a second auxiliary magnetic field between the first magnet system subassembly and the second magnet system subassembly. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，lorentz致动器和用于制造器件的方法。

解决方案：光刻设备具有非常有效的洛伦兹致动器。 洛伦兹致动器具有用于通过主磁体系统和辅助磁体系统的相互作用产生力的导电元件，所述主磁体系统和辅助磁体系统被布置在具有由导电元件承载的电流的牵引结构中，以及第一和第二磁体的合成磁场 分别由主磁铁系统和辅助磁铁系统产生的磁场。 左旋致动器还具有基本上在第一磁体系统子组件的外部和第二磁体系统子组件的外部之间延伸的磁性元件。 磁性元件引导第一磁体系统子组件和第二磁体系统子组件之间的第二辅助磁场的一部分。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004289115A

公开(公告)日：2004-10-14

申请号：JP2003373440

申请日：2003-09-26

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JACOBS HERNES ,  COX HENRIKUS HERMAN MARIE ,  VOSTERS PETRUS MATTHIJS HENRIC

IPC: G03F7/20 ,  G03B7/20 ,  G03B27/42 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/709 ,  G03F7/70766

Abstract: PROBLEM TO BE SOLVED: To provide a low-cost supporting means with a simple structure that is a lithographic projection apparatus and can be used in a vacuum in order to support a balance mass for eliminating vibrations due to a reaction force when moving a substrate table.
SOLUTION: The balance mass of a lithographic projection apparatus is supported on a base frame by at least one flexible supporting element that is mechanically attached to this balance mass and the base frame and has at least two pivot points. Since this supporting element has two or more pivot points, this supporting means hardly shows resistance to the horizontal movements of the balance mass BM, so as to allow the balance mass BM to move freely in a horizontal direction. An air bearing is not used, so it can be used even in a vacuum.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2003257851A

公开(公告)日：2003-09-12

申请号：JP2002383104

申请日：2002-12-09

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS HERNES ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC ,  DE GROOT TON

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To provide a projection apparatus for lithography having a planar magnetic positioning means that can be automatically self-recovered and that suppresses mechanical load applied to guide pipes that are mounted on a substrate table to the smallest extent. SOLUTION: This projection apparatus for lithography has a planar magnetic positioning means with which movement of the substrate table in a plane is accomplished, and a mechanical limiter that limits rotation of the substrate table around a direction normal to the plane. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2008078643A

公开(公告)日：2008-04-03

申请号：JP2007225165

申请日：2007-08-31

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70816

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus whose movable object component can be guided with a gas bearing, to which pressurized gas is supplied by using an improved gas supply mechanism. SOLUTION: The lithographic apparatus which has a track prepared with a plurality of gas flow ejection holes arranged along the track is disclosed. Gas conduits are constituted so that they supply the pressurized gas to the gas flow ejection holes in order to form the gas bearing constituted for supporting the object component movably along the track. Furthermore, a gas flow device is formed that is constituted for generating gas flows which pass through one or more gas flow ejection holes on a guide surface of the object component, or for impeding gas flows which pass through one or more gas flow ejection holes, corresponding to the positional relations between the gas flow ejection holes and positions on the guide surface. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其可移动物体部件可以由气体轴承引导，通过使用改进的气体供应机构来供应加压气体。 解决方案：公开了具有沿轨道布置的多个气流喷射孔准备的轨道的光刻设备。 气体管道构成为使得它们将气体供给到气流喷射孔，以便形成用于沿轨道可移动地支撑物体部件的气体轴承。 此外，形成气体流动装置，该气体流动装置构成用于产生通过物体部件的引导表面上的一个或多个气体流动喷出孔的气流或用于阻止通过一个或多个气体流动喷出孔的气体流动， 对应于气流喷射孔与引导表面上的位置之间的位置关系。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006344969A

公开(公告)日：2006-12-21

申请号：JP2006157940

申请日：2006-06-07

Applicant: ASML NETHERLANDS BV

Inventor： COX HENRIKUS HERMAN MARIE ,  JACOBS HERNES ,  SCHOOT HARMEN KLAAS VAN DER ,  VOSTERS PETRUS MATTHIJS HENRIC

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method utilizing substrate stage compensation. SOLUTION: The lithographic apparatus has an illumination system that conditions a radiation beam, and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto the target of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, and a base frame. The substrate support drive is configured to generate a force at least in one direction between the substrate support and the reaction mass, the balance mass, or the support frame. COPYRIGHT: (C)2007,JPO&INPIT

公开(公告)号：JP2006313345A

公开(公告)日：2006-11-16

申请号：JP2006123397

申请日：2006-04-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/677

CPC classification number: G03F7/7075 ,  Y10S414/141

Abstract: PROBLEM TO BE SOLVED: To provide a system and method that provide a substrate handler for loading and/or unloading a substantially flat substrate on/from a substrate table.
SOLUTION: A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a patterning device capable of modulating the radiation beam, a substrate table constructed to support a substrate, and a projection system configured to project the modulated radiation beam onto a target portion of the substrate. Further, the lithographic apparatus comprises a substrate handler configured to load and/or unload the substrate on/from the substrate table. The substrate handler is configured to support the substrate in a support plane and comprises a conveyor device for moving the substrate in a direction substantially parallel to the support plane. The conveyor device comprises a gripping device configured to push or pull the substrate in the indicated direction and a driving device for driving the gripping device in the indicated direction.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种系统和方法，该系统和方法提供用于在衬底台上/从衬底台上装载和/或卸载基本平坦的衬底的衬底处理器。 解决方案：光刻设备包括被配置为调节辐射束的照明系统，能够调制辐射束的图案形成装置，被构造成支撑衬底的衬底台和被配置成将调制的辐射束投射到 基板的目标部分。 此外，光刻设备包括：衬底处理器，其构造成在衬底台上/从衬底台上装载和/或卸载衬底。 衬底处理器被配置为在支撑平面中支撑衬底，并且包括用于沿基本平行于支撑平面的方向移动衬底的输送装置。 输送装置包括构造成沿所示方向推动或拉动基板的夹紧装置和用于沿所示方向驱动夹持装置的驱动装置。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006173618A

公开(公告)日：2006-06-29

申请号：JP2005359970

申请日：2005-12-14

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DIJSSELDONK ANTONIUS JOHAN ,  AMHAOUCH MUSTAFA ,  BOX WILHELMUS J ,  JACOBS JOHANNES HENRICUS WILHE ,  JACOBS HERNES ,  RAVENSBERGEN MARIUS ,  TERKEN MARTINUS ARNOLDUS HENRI ,  LIVESEY ROBERT GORDON ,  VAN VROONHOVEN FRANCISCUS CATH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70841 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment which has a short quiescent time and a small area of a portion exposed to vacuum.
SOLUTION: Lithography equipment which operates in a vacuum is disclosed. The lithography equipment comprises a vacuum housing for providing a vacuum environment for a supporting portion or a substrate table structured such that a patterning apparatus is supported, a projection system, or its arbitrary combination. In the vacuum housing, a plurality of transporting circuits for transporting fluids and/or electrical signals for use in the first process mode of a lithography process are housed. At least one of the plurality of transporting circuits is for transporting energy toward the interior of the vacuum housing in order to guide the gas evolution of the vacuum housing for use in the lithography equipment in the second process mode for allowing the lithography equipment to be in a vacuum operation state.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有短静态时间和暴露于真空的部分的小面积的光刻设备。

解决方案：公开了在真空中操作的平版印刷设备。 光刻设备包括用于为支撑部分提供真空环境的真空外壳或者构造成使得图案形成装置被支撑，投影系统或其任意组合构成的基板台。 在真空壳体中，容纳用于输送流体的多个输送电路和/或用于光刻工艺的第一工艺模式的电信号。 多个传送电路中的至少一个用于将能量传送到真空壳体的内部，以引导在第二工艺模式中用于光刻设备的真空壳体的气体放出，以允许光刻设备处于 真空运行状态。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2004343120A

公开(公告)日：2004-12-02

申请号：JP2004144298

申请日：2004-05-14

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER MEULEN FRITS ,  JACOBS HERNES ,  TERKEN MARTINUS ARNOLDUS HENRI

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/70716 ,  G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To prevent collisions or reduce damages caused from such collisions. SOLUTION: A lithography projection apparatus includes a collision protection apparatus for protecting internal components against damages from collision. The collision protection apparatus has at least one damper, to apply a damping force and/or to absorb a collision force and to reduce or remove the damage to all delicate and costly components. The collision protection apparatus can monitor the position and the velocity of a moving component, in order to determine the time when a collision is likely to occur. COPYRIGHT: (C)2005,JPO&NCIPI