公开(公告)号：JP2003257851A

公开(公告)日：2003-09-12

申请号：JP2002383104

申请日：2002-12-09

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS HERNES ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC ,  DE GROOT TON

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To provide a projection apparatus for lithography having a planar magnetic positioning means that can be automatically self-recovered and that suppresses mechanical load applied to guide pipes that are mounted on a substrate table to the smallest extent. SOLUTION: This projection apparatus for lithography has a planar magnetic positioning means with which movement of the substrate table in a plane is accomplished, and a mechanical limiter that limits rotation of the substrate table around a direction normal to the plane. COPYRIGHT: (C)2003,JPO

公开(公告)号：DE60225229D1

公开(公告)日：2008-04-10

申请号：DE60225229

申请日：2002-12-09

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS HERNES ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC ,  DE GROOT TON

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.

公开(公告)号：DE60225229T2

公开(公告)日：2009-03-26

申请号：DE60225229

申请日：2002-12-09

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS HERNES ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRICUS ,  DE GROOT TON

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.

公开(公告)号：SG103379A1

公开(公告)日：2004-04-29

申请号：SG200207470

申请日：2002-12-09

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS HERNES ,  VEN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC ,  DE GROOT TON

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.