公开(公告)号：JP2007235179A

公开(公告)日：2007-09-13

申请号：JP2007159104

申请日：2007-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006203183A

公开(公告)日：2006-08-03

申请号：JP2005367350

申请日：2005-12-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： SIMON KLAUS

IPC: H01L21/027 ,  B29C59/02 ,  B82B3/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide a lithography method capable of a high resolution imprint.
SOLUTION: In a substrate 40 substantially covered with an imprintable medium, the imprint method contacts mutually spaced-apart first and second target regions made of the imprintable medium on the substrate with first and second templates 41, 42 respectively; moves the first and second templates 41, 42 parallel and adjacently to each other to imprint a pattern defined by the templates 41, 42 into the imprintable medium; and then removes the first and second templates from the imprinted medium.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供能够进行高分辨率印记的光刻方法。 解决方案：在基本上覆盖有可压印介质的基板40中，压印方法分别在第一和第二模板41,42上在基板上接触由可压印介质制成的相互间隔开的第一和第二目标区域; 使第一和第二模板41,42彼此平行和相邻地移动以将由模板41,42定义的图案压印到可压印介质中; 然后从打印的介质中移除第一和第二模板。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006186352A

公开(公告)日：2006-07-13

申请号：JP2005350407

申请日：2005-12-05

Applicant: ASML NETHERLANDS BV

Inventor： SIMON KLAUS ,  VAN DEN BRINK ENNO ,  KEIJSERS GERARDUS JOHANNES JOS ,  VAN DIJK ADRIANUS HUBERTUS HEN ,  BAIJENS HUBERTUS ANTONIUS MARI

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for facilitating measures for any problem that contamination or damage is generated in a projection lens or its peripheral region due to gas emission of volatile components in resist during radiation exposure. SOLUTION: This lithography system projects a patterned radiation beam on the target of a substrate containing a radiation photosensitive layer by a radiation source, a patterning structure and a projection system is provided with a gas flashing system for supplying air from a region between the projection system and the substrate in order to remove gas spread from the target section while the target section is exposed by the patterned radiation beam. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2005051215A

公开(公告)日：2005-02-24

申请号：JP2004190786

申请日：2004-06-29

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MULKENS JOHANNES CATHARINUS HU ,  ANTONIUS THEODORUS ANNA MARIA ,  LOF JOERI ,  SIMON KLAUS ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F9/7026 ,  G03F7/70341 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To provide leveling means which can be used in an immersion lithography apparatus.
SOLUTION: Measuring devices 20a and 20b for determining the height and/or inclination of a substrate W obtain the pressure and/or height of a liquid 11 in a liquid reservoir 10 of the immersion lithography apparatus. From the measurement results, it is possible to obtain the vertical position of the substrate with respect to a projection system or at least a change of the position.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供可用于浸没式光刻设备中的调平装置。 解决方案：用于确定基板W的高度和/或倾斜度的测量装置20a和20b获得浸没式光刻设备的液体储存器10中的液体11的压力和/或高度。 从测量结果可以获得基板相对于投影系统的垂直位置或者至少改变位置。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004206083A

公开(公告)日：2004-07-22

申请号：JP2003399185

申请日：2003-11-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： SIMON KLAUS ,  LOF JOERI ,  MINNAERT ARTHUR WINFRED EDUARD ,  SMEETS ERIK MARIE JOSE

IPC: B81C1/00 ,  C40B60/14 ,  G03F7/20

CPC classification number: B82Y30/00 ,  B01J2219/00353 ,  B01J2219/00432 ,  B01J2219/00434 ,  B01J2219/00439 ,  B01J2219/00448 ,  B01J2219/00711 ,  B01J2219/0072 ,  C40B60/14 ,  G03F7/708

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus suitable for the manufacture of a micro-meter or smaller scale devices by locally selective chemical reaction, preferably with high throughput. SOLUTION: A flowcell having a plurality of separate chambers is disposed on a substrate table, and a fluid is brought into contact with exposed areas of the substrate to interact therewith. Thereby, a series of exposures and chemical processes can be carried out without removing the substrate from the substrate table. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2004165666A

公开(公告)日：2004-06-10

申请号：JP2003381339

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  DE SMIT JOANNES THEODOOR ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  MEIJER HENDRICUS JOHANNES MARI ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus.
SOLUTION: A map of the surface of a substrate is formed at a measurement station. Then the substrate W is moved to the place of which space between a projection lens and the substrate is filled with liquid. Subsequently, the substrate is aligned with, for example, a transmission image sensor to expose exactly according to the map formed previously. In this way, the mapping is never carried out under an environment of liquid.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2014241425A

公开(公告)日：2014-12-25

申请号：JP2014152937

申请日：2014-07-28

Applicant: エーエスエムエル ネザーランズ ビー.ブイ. ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

Abstract: 【課題】液浸投影露光装置において、基板および浸漬液の温度勾配による画像のゆがみを減じる。【解決手段】投影露光装置PLの最終段の部材、基板および浸漬液体の温度を共通の目標温度T4に調整する温度制御器を含む浸漬リトグラフ装置であって、これら構成部材の全温度を調整し、温度勾配を減少させることで、画像形成の整合性と全体的性能を向上させる。使用する手段は、フィードバック回路によって浸漬液の流速および温度を制御することを含む。【選択図】図4

公开(公告)号：JP2014158053A

公开(公告)日：2014-08-28

申请号：JP2014110008

申请日：2014-05-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and immersion liquid in an immersion projection exposure apparatus.SOLUTION: An immersion lithography apparatus comprises a temperature controller for adjusting temperature of a member in a final stage of a projection exposure apparatus PL, a substrate, and immersion liquid to common target temperature T4. Image forming consistency and whole performance can be improved, by adjusting all of the temperature of these structural members and by reducing temperature gradients. Means used to adjust the temperature may include controlling a flow rate and the temperature of the immersion liquid via a feedback circuit.

Abstract translation: 要解决的问题：为了减少由浸没投影曝光装置中的基板和浸没液中的温度梯度引起的图像失真。解决方案：浸没式光刻装置包括温度控制器，用于在投影曝光的最后阶段中调节部件的温度 设备PL，基板和浸入液体到共同目标温度T4。 通过调节这些结构件的所有温度和降低温度梯度，可以提高成像的一致性和整体性能。 用于调节温度的手段可以包括通过反馈电路来控制浸入液体的流量和温度。

公开(公告)号：JP2012049569A

公开(公告)日：2012-03-08

申请号：JP2011260273

申请日：2011-11-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SIMON KLAUS

IPC: H01L21/027 ,  B29C59/02

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide a lithography capable of a high resolution imprint.SOLUTION: An imprint method is disclosed. In one example, separated first and second target regions made of an imprintable medium on a substrate are brought into contact with first and second templates, respectively, to form first and second imprints on the imprintable medium, and then the first and second templates are removed from the imprinted medium.

Abstract translation: 要解决的问题：提供能够进行高分辨率印记的光刻。 解决方案：公开了一种压印方法。 在一个示例中，分离的由可压印介质构成的分离的第一和第二目标区域分别与第一和第二模板接触，以在可压印介质上形成第一和第二印记，然后移除第一和第二模板 从印记媒体。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010135857A

公开(公告)日：2010-06-17

申请号：JP2010059726

申请日：2010-03-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projection apparatus, space between a final element of the projection system and a substrate table of the lithography projection apparatus is surrounded by a sealing member. A gas seal is formed between the sealing member and a plane of the substrate and the liquid is confined in the space. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时最小化在阶段操作期间需要加速的液体的量。 解决方案：在光刻投影装置中，投影系统的最终元件与光刻投影装置的基板台之间的空间被密封构件包围。 在密封构件和基板的平面之间形成气体密封，并且液体被限制在该空间中。 版权所有（C）2010，JPO＆INPIT