公开(公告)号：JP2005167247A

公开(公告)日：2005-06-23

申请号：JP2004346399

申请日：2004-11-30

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BERGE PETER T ,  KEIJSERS GERARDUS JOHANNES JOS

IPC: G03F9/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F9/7084 ,  G03F9/7003 ,  G03F9/7076 ,  Y10S438/975

Abstract: PROBLEM TO BE SOLVED: To provide an improved and desirable, more correct or convenient method for measuring the orientation of a crystal axis in a substrate. SOLUTION: A plurality of markers are printed in resist on the substrate in an angle range to the crystal axis of the substrate. The markers are etched on the substrate using anisotropic etching process, the markers are those such that their apparent positions after they are etched depend on their orientation to the crystal axis. The apparent positions of the markers are measured, thereby the orientation of the crystal axis is derived. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供用于测量衬底中的晶体轴的取向的改进的和期望的，更正确或更方便的方法。 解决方案：在基板上的抗蚀剂中以与基板的晶轴成角度范围的方式印刷多个标记。 使用各向异性蚀刻工艺在基板上刻蚀标记，标记是这样的标记，使得它们在蚀刻后的表观位置取决于它们对晶轴的取向。 测量标记的表观位置，从而导出晶轴的取向。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2006186352A

公开(公告)日：2006-07-13

申请号：JP2005350407

申请日：2005-12-05

Applicant: ASML NETHERLANDS BV

Inventor： SIMON KLAUS ,  VAN DEN BRINK ENNO ,  KEIJSERS GERARDUS JOHANNES JOS ,  VAN DIJK ADRIANUS HUBERTUS HEN ,  BAIJENS HUBERTUS ANTONIUS MARI

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for facilitating measures for any problem that contamination or damage is generated in a projection lens or its peripheral region due to gas emission of volatile components in resist during radiation exposure. SOLUTION: This lithography system projects a patterned radiation beam on the target of a substrate containing a radiation photosensitive layer by a radiation source, a patterning structure and a projection system is provided with a gas flashing system for supplying air from a region between the projection system and the substrate in order to remove gas spread from the target section while the target section is exposed by the patterned radiation beam. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2009111348A

公开(公告)日：2009-05-21

申请号：JP2008227687

申请日：2008-09-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LEONARDUS VAN DIJK PAULUS WILH ,  VAN BUEL HENRICUS WILHELMUS MA ,  KEIJSERS GERARDUS JOHANNES JOS ,  ONVLEE JOHANNES ,  VAN DEN BROEK JOHANNES ARIE

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70775 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a substrate carrier which copes with various shapes and sizes of a substrate. SOLUTION: A substrate carrier WC arranged to hold a substrate in a predetermined position is disclosed. The substrate carrier has a transparent region 2 that extends through the substrate carrier from the side of the substrate carrier on which the substrate is held to the opposite side of the substrate carrier, the transparent region is formed of glass, and substantially transparent to a signal used to determine a position of an edge of the substrate on the substrate carrier. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够处理基板的各种形状和尺寸的基板载体。 公开了一种布置成将基板保持在预定位置的基板载体WC。 衬底载体具有透明区域2，该透明区域2从衬底载体的衬底载体侧保持到衬底载体的相对侧延伸穿过衬底载体，透明区域由玻璃形成并对信号基本透明 用于确定衬底在衬底载体上的边缘的位置。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007305989A

公开(公告)日：2007-11-22

申请号：JP2007120775

申请日：2007-05-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER BRINK ENNO ,  VAN BUEL HENRICUS WILHELMUS MA ,  CONSOLINI JOSEPH J ,  KEIJSERS GERARDUS JOHANNES JOS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  TRAVERS RICHARD JOSEPH ,  TEUWEN MAURICE ANTON JAQUES ,  MEESTER ARNOUT JOHANNES ,  HAFNER FREDERICK WILLIAM ,  GREENLEE VINYU ,  BALIENS HUBERTUS ANTONIUS MARI

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70691

Abstract: PROBLEM TO BE SOLVED: To provide a pattern onto a non-traditional substrate by a novel method with use of a novel substrate carrier and a substrate carrier. SOLUTION: According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in a given position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate. According to a second aspect, there is provided a method of removably securing a substrate to a substrate carrier, including: positioning a substrate on the substrate carrier so that a sealed space can be defined between the substrate and the substrate carrier; and establishing a vacuum in the space between the substrate and the substrate carrier. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：通过使用新型衬底载体和衬底载体的新方法将图案提供到非传统衬底上。 解决方案：根据本发明的一个方面，提供了一种衬底载体，其布置成使用真空将衬底保持在给定位置，真空建立在衬底载体和衬底之间形成的密封空间中 。 根据第二方面，提供了一种将衬底可移除地固定到衬底载体的方法，包括：将衬底定位在衬底载体上，使得可以在衬底和衬底载体之间限定密封空间; 以及在衬底和衬底载体之间的空间中建立真空。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：DE602004015397D1

公开(公告)日：2008-09-11

申请号：DE602004015397

申请日：2004-11-26

Applicant: ASML NETHERLANDS BV

Inventor： TEN BERGE PETER ,  KEIJSERS GERARDUS JOHANNES JOS

IPC: G03F9/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/68

Abstract: A plurality of markers are printed in resist on a substrate at a range of angles relative to a crystal axis of the substrate. The markers are etched in to the substrate using an anisotropic etch process, the markers being such that after the etch their apparent positions are dependent on their orientation relative to the crystal axis. The apparent positions of the markers are measured and from this the orientation of the crystal axis is derived.

公开(公告)号：SG123681A1

公开(公告)日：2006-07-26

申请号：SG200507762

申请日：2005-12-02

Applicant: ASML NETHERLANDS BV

Inventor： SIMON KLAUS ,  BRINK VAN DEN ENNO ,  KEIJSERS GERARDUS JOHANNES JOS ,  DIJK VAN ADRIANUS HUBERTUS HEN ,  BAIJENS HUBERTUS ANTONIUS MARI

Abstract: An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.

公开(公告)号：SG112071A1

公开(公告)日：2005-06-29

申请号：SG200406966

申请日：2004-11-30

Applicant: ASML NETHERLANDS BV

Inventor： TEN BERGE PETER ,  KEIJSERS GERARDUS JOHANNES JOS

IPC: G03F9/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/68

Abstract: A plurality of markers are printed in resist on a substrate at a range of angles relative to a crystal axis of the substrate. The markers are etched in to the substrate using an anisotropic etch process, the markers being such that after the etch their apparent positions are dependent on their orientation relative to the crystal axis. The apparent positions of the markers are measured and from this the orientation of the crystal axis is derived.