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    Light-sensitive element for printing plate or photoresist mfr. - with thin oil film between imaging mask and positive- or negative-working layer to prevent dust deposition and give smooth plates
    25.
    发明专利
    Light-sensitive element for printing plate or photoresist mfr. - with thin oil film between imaging mask and positive- or negative-working layer to prevent dust deposition and give smooth plates 未知

    公开(公告)号：DE4130170A1

    公开(公告)日：1993-06-17

    申请号：DE4130170

    申请日：1991-09-11

    Applicant: BASF AG

    Inventor： BAUER GERHARD DR

    IPC: G03F7/09 ,  G03F7/20

    Abstract: The novel feature in a flat, curved or cylindrical UV- and/or visible light-sensitive recording element of the type comprising (A) a dimensionally stable carrier, (B) a negatively- or positively-working recording layer (B1) or (B2) and (D) a repeatedly-removable, multi-use imaging mask is that between (B) and (D) there is present (C) a transparent 0.01-10 microns thick layer of a viscous, inert, wetting oil which has a higher RI than sensitive layer (B1) or (B2) and mask (D). Also claimed is an embodiment in which there is also a covering layer (E) of transparent, tear-resistant polymer film between layer (B) and oil film (C); in either case layer (C) forms a complete cover on the underlying layer. USE/ADVANTAGE - The element is used for mfr. of photoresists or of flat, curved or cylindrical printing plates. The prior art problems of contacting and dust deposition are overcome and the element can be used without a vacuum table. Also, it can be used with the smooth (B) or (E) layers required for prodn. of dabbing-type printing plates.

    Light-sensitive recording element with mask formed directly on top coat - comprising tear-resistant polymer, used as resist or esp. in computer to plate process
    26.
    发明专利
    Light-sensitive recording element with mask formed directly on top coat - comprising tear-resistant polymer, used as resist or esp. in computer to plate process 未知

    公开(公告)号：DE4117127A1

    公开(公告)日：1992-11-26

    申请号：DE4117127

    申请日：1991-05-25

    Applicant: BASF AG

    Inventor： BAUER GERHARD DR

    IPC: G03F1/00

    Abstract: Recording element, which is sensitive to UV and/or visible actinic light, has (A) a dimensionally stable base, (B) a negative- or positive-working light-sensitive recording layer (B1) or (B2), (C) an optically transparent top coat contg. polymer(s) forming a tear-resistant film and (D) a mask formed directly on the light-sensitive (sic) top coat (C). The novelty is that (D) is a relief pattern of coated areas (D1) and uncoated areas (D2), in which (D1) are opaque to the actinic light used. Pref. (D1) consists of liq. droplets or solid particles transferred to the surface of (C), pref. of electrophotographic toner, ink applied by ink-jet printing or pigment or pigment/binder applied by thermal transfer printing. (B) is a negative-working photocurable or photopolymerisable layer (B1) or a positive-working photodegradable layer (B2). (C) consists of (co)polyamide, polyurethane, poly(meth)acrylate, cyclo-rubber with a high deg. of cyclisation, ethylene-propylene copolymer (co)PVC, EVA, partly or almost completely hydrolysed poly(vinyl alcohol alkanecarboxylate ester), partly or almost complete hydrolysed vinyl alcohol alkanecarboxylate ester/alkylene oxide graft copolymer, gelatin, cellulose ether or ester, polyvinylpyrrolidone, vinyl-aromatic/alkenedicarboxylic anhydride copolymer, poly(meth)acrylic acid (meth)acrylic acid/(meth)acrylate copolymer and/or polyalkylene oxide. The element is packed in opaque, undeformable package for sale. USE/ADVANTAGE - The element is useful in the prodn. of printing plates and photoresists, esp. seamless gravure, offset, letterpress and flexographic printing cylinders for continuous printing. The element can be used in the computer to plate technique and the process is rapid and reli

    Increasing abrasion-resistance of printing plate and photoresist - by coating printing or non-printing area or relief e.g. with toner, ink or pigment and opt. binder
    27.
    发明专利
    Increasing abrasion-resistance of printing plate and photoresist - by coating printing or non-printing area or relief e.g. with toner, ink or pigment and opt. binder 未知

    公开(公告)号：DE4117126A1

    公开(公告)日：1992-11-26

    申请号：DE4117126

    申请日：1991-05-25

    Applicant: BASF AG

    Inventor： BAUER GERHARD DR

    IPC: G03F7/40 ,  G03G13/26

    Abstract: Prodn. of abrasion-resistant printing plates and photoresists involves (1) exposure of a light-sensitive recording element, which has (A) a dimensionally stable base and (B) a negative- or positive-working recording layer (B1) or (B2), sensitive to UV or visible actinic light; and (2) washing out the unexposed areas of (B1) or the exposed areas of (B2) with a suitable developer; and (3) after-treatment with a suitable agent (I). (I) is applied image-wise to either the printing or non-printing surface of the printing plate or to the relief surface of the photoresist. USE/ADVANTAGE - The process is useful for making printed plates (gravure, offset, letterpress and flexographic plates) and photoresists. Treatment with (I) is simple and improves the abrasion resistance and other properti

    Reducing residual monomer content of liquid system in polymer production
    28.
    发明专利
    Reducing residual monomer content of liquid system in polymer production 未知

    公开(公告)号：DE19741189A1

    公开(公告)日：1999-03-25

    申请号：DE19741189

    申请日：1997-09-18

    Applicant: BASF AG

    Inventor： RUPANER ROBERT DR ,  DOBBELAAR JOHANNES DR ,  LAWRENZ SVEN ,  BAUER GERHARD DR

    IPC: C08F6/00

    Abstract: Method of reducing the residual monomer (I) content in a solution, mixture, melt, suspension or dispersion of a polymer produced by free radical polymerization (liquid system). The process involves adding a nucleophilic agent (II), which forms an adduct with (I) at the reaction temperature, in an amount of 0.5-5 mole (II) /mole (I). The novelty is that (II) is stirred gradually into the liquid system in a production reactor with a height/diameter ratio of 0.8-4 in a dosing time not less than the shortest possible mixing time.

    30.
    发明专利
    未知

    公开(公告)号：ES2093997T3

    公开(公告)日：1997-01-01

    申请号：ES94102863

    申请日：1994-02-25

    Applicant: BASF AG

    Inventor： BAUER GERHARD DR ,  AYDIN ORAL DR ,  STRECKER BEATE DR ,  OFTRING ALFRED DR

    IPC: C07C251/54 ,  C08F8/30 ,  C08J3/24 ,  C08K5/32 ,  C08K5/33 ,  C08L33/06 ,  C09J11/06

    Abstract: Compound of the formula in which R and R independently of one another are C1-C10-alkyl, C1-C10-alkoxy-C5-C10-cycloalkyl or a C5-C10-aryl radical which can also contain 1 to 3 non-adjacent nitrogen, oxygen or sulphur atoms as hetero atoms in the carbon chain or carbon ring and which can be substituted by 1 to 3 C1-C4-alkyl or -alkoxy groups, R or R can represent a hydrogen atom, or R and R together form a bridge of 2 to 14 carbon atoms, it being possible for some of the carbon atoms also to be part of an aromatic ring system, A represents an n-valent organic radical, and n is an integer equal to or greater than 2.

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