Process for the preparation of block copolymers

    公开(公告)号:DE3833651A1

    公开(公告)日:1990-04-05

    申请号:DE3833651

    申请日:1988-10-04

    Applicant: BASF AG

    Abstract: A process for the preparation of block copolymers by polymerising at least one further monomer (B) onto the reactive terminal groups (a2) of existing polymer chains (A), these groups having been produced by supply of energy, in which the reactive terminal groups (a2) are produced, by irradiation with actinic light having a wavelength lambda of from 230 to 450 nm, from terminal groups (a1) which represent photopolymerisation initiators bonded to the polymer chains (A).

    29.
    发明专利
    未知

    公开(公告)号:DE3736980A1

    公开(公告)日:1989-05-18

    申请号:DE3736980

    申请日:1987-10-31

    Applicant: BASF AG

    Abstract: Light-sensitive registration material comprising… A) a photopolymerisable relief-forming layer which, after imagewise exposure to actinic light, can be developed with a liquid developer,… B) a covering layer which adheres firmly to the photopolymerisable relief-forming layer (A), is soluble or swellable in the liquid developers and is composed of polymers forming rupture-resistant films, and… C) a covering sheet which can readily be peeled off the covering layer (B),… the covering layer (B) containing specific tertiary amines and/or amides and/or specific quaternary ammonium salts of the type according to the claims and defined in greater detail. … A process is also provided for producing photopolymerisable printing plates, relief plates or photoresists using this registration material.

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