公开(公告)号：DE3917197A1

公开(公告)日：1990-11-29

申请号：DE3917197

申请日：1989-05-26

Applicant: BASF AG

Inventor： HOESSEL PETER DR ,  SCHUPP HANS DR ,  LIENERT KLAUS DR ,  LEHMANN HELMUT

IPC: C08G18/75 ,  C08G18/34 ,  C08G18/60 ,  C08G18/72 ,  C08G18/80 ,  C09D5/25 ,  C09D175/00 ,  C09D175/04 ,  C09J175/04 ,  H01B3/30

Abstract: The present invention relates to hot-melt adhesive coating solutions which contain… A) from 5 to 80% by weight of a copolyamide built up from units derived from… A1) organic dicarboxylic acids … … where R is an aliphatic radical having from 1 to 20 carbon atoms or an aromatic radical having from 5 to 25 carbon atoms,… and… A2) a mixture of diisocyanates comprising… a21) from 20 to 95 mol% of a diisocyanate of the formula… OCN-R -NCO… where R is an aromatic radical having 5 to 25 carbon atoms,… a22) from 5 to 70 mol% of a diisocyanate of the formula… OCN-R -NCO… where R is … … or a linear aliphatic radical having 3 to 30 carbon atoms which is substituted by 1 to 3 C1-C4-alkyl groups, and R and R , independently of one another, are each a C1-C4-alkyl group or a hydrogen atom,… a23) from 0 to 20 mol% of a diisocyanate of the formula… OCN-(CH2)y-NCO… where y is an integer in the range from 1 to 20,… and… B) from

公开(公告)号：DE3833437A1

公开(公告)日：1990-04-05

申请号：DE3833437

申请日：1988-10-01

Applicant: BASF AG

Inventor： BLUM RAINER ,  REHMER GERD DR ,  SCHUPP HANS DR

IPC: C08J3/28 ,  C08G73/06 ,  C08G73/10 ,  C08L79/04 ,  C08L79/08 ,  C09D179/00 ,  C09D179/04 ,  C09D179/08 ,  G02B6/44 ,  G03F7/038

Abstract: The invention relates to radiation-sensitive mixtures of certain precursors and carbonyl compounds which contain aromatic radicals and, in the UV-excited state, are capable of hydrogen abstraction, which mixtures experience a solubility differentiation on irradiation with actinic light and are suitable for the preparation of polyimides, polyisoindoloquinazolinediones, polyoxazinediones, polyquinazolinediones or polyquinazolones. They are suitable for the production of insulating layers and printed circuit boards.

公开(公告)号：DE3706561A1

公开(公告)日：1988-09-08

申请号：DE3706561

申请日：1987-02-28

Applicant: BASF AG

Inventor： KOCH HORST DR ,  SCHUPP HANS DR ,  SCHWALM REINHOLD DR

IPC: G03F7/032 ,  G03F7/004 ,  G03F7/027 ,  G03F7/033 ,  G03F7/10 ,  G03C1/68

公开(公告)号：DE3619698A1

公开(公告)日：1987-12-17

申请号：DE3619698

申请日：1986-06-16

Applicant: BASF AG

Inventor： ELZER ALBERT ,  SANNER AXEL DR ,  SCHUPP HANS DR ,  BECK ERICH DR

IPC: C08F2/48 ,  G03F7/033 ,  G03F7/10 ,  G03C1/68 ,  C08L39/00

Abstract: A photosensitive recording element which is suitable for the production of printing plates or resist images possesses a photopolymerizable recording layer which is applied to a dimensionally stable base, can be developed in an aqueous alkaline medium and contains, as a polymeric binder, one or more film-forming copolymers which are insoluble in water but soluble or dispersible in aqueous alkaline solutions and consist of from 10 to 50% by weight of one or more N-vinylamides, preferably N-vinylcaprolactam and/or N-vinylpyrrolidone, from 5 to 30% by weight of acrylic acid and/or methacrylic acid, from 30 to 80% by weight of one or more comonomers from the group consisting of the vinyl aromatics and (meth)acrylates of monoalkanols and from 0.2 to 5% by weight of an olefinically unsaturated compound which contains basic nitrogen atoms and has a pKa>4.