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公开(公告)号：SG11201500235XA
公开(公告)日：2015-02-27
申请号：SG11201500235X
申请日：2013-07-12
Applicant: BASF SE
Inventor： KLIPP ANDREAS , HONCIUC ANDREI , MONTERO PANCERA SABRINA , BAAN ZOLTAN
Abstract: A composition comprising a quaternary ammonium compound for developing photoresists applied to semiconductor substrates is provided. A method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices is also provided. The pattern collapse can be avoided by prevent swelling of the photoresist by using the improved composition.
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