Interference system and semiconductor exposure apparatus having the same
    21.
    发明授权
    Interference system and semiconductor exposure apparatus having the same 失效
    干涉系统和具有相同的半导体曝光装置

    公开(公告)号:US06661522B2

    公开(公告)日:2003-12-09

    申请号:US09893636

    申请日:2001-06-29

    Applicant: Chidane Ouchi

    Inventor: Chidane Ouchi

    CPC classification number: G03F7/706 G01B9/02057 G01B9/02065 G01J9/02

    Abstract: Disclosed is a Fizeau interference system for causing interference between reflection lights from a reflection surface and a semi-transmission surface, respectively, disposed along one and the same optical axis. The interference system includes a light source, an optical path difference applying optical system for dividing light from the light source into two lights and for re-combining them, and an interference optical system for causing reflection of the two lights passed through the optical path difference applying optical system, at corresponding one of the reflection surface and the semi-transmission surface, and to cause interference of them, wherein a difference &Dgr;F in optical path length of the light reflected by the reflection surface and with respect to the light reflected by the semi-transmission surface satisfies a relation |&Dgr;D−&Dgr;F|

    Abstract translation: 公开了一种Fizeau干涉系统,用于分别沿着同一个光轴设置来自反射面和半透射面的反射光之间的干涉。 干涉系统包括光源,用于将来自光源的光分为两个光并用于重新组合的光路差分施加光学系统,以及用于使通过光程差的两个光的反射的干涉光学系统 在相应的一个反射面和半透射面上施加光学系统,并引起它们的干涉,其中由反射面反射的光和相对于由反射面反射的光的光路长度的差ΔF 半透射面满足关系| DeltaD-ΔF| <ΔL,其中由光程差应用光学系统DeltaD应用的两个光之间的光程差ΔD和来自光源的光的相干长度为ΔL 。

    X-ray imaging apparatus
    22.
    发明授权
    X-ray imaging apparatus 有权
    X射线成像装置

    公开(公告)号:US09066704B2

    公开(公告)日:2015-06-30

    申请号:US13416339

    申请日:2012-03-09

    Abstract: An X-ray imaging apparatus comprises a grating configured to form an interference pattern by diffracting X-rays from an X-ray source, a amplitude grating configured to partly shield X-rays forming the interference pattern, and an X-ray detector configured to detect an intensity distribution of X-rays from the amplitude grating. The amplitude grating is comprised of a central area and a peripheral area and the peripheral area shows an X-ray transmittance higher than the central area relative to X-rays perpendicularly entering the amplitude grating.

    Abstract translation: 一种X射线摄像装置,其特征在于,包括:被配置为通过衍射来自X射线源的X射线形成干涉图案的光栅;被配置为部分地屏蔽形成所述干涉图案的X射线的振幅光栅;以及X射线检测器, 检测来自幅度光栅的X射线的强度分布。 振幅光栅由中心区域和外围区域组成,周边区域相对于垂直进入振幅光栅的X射线,显示高于中心区域的X射线透射率。

    X-RAY IMAGING APPARATUS
    23.
    发明申请
    X-RAY IMAGING APPARATUS 有权
    X射线成像装置

    公开(公告)号:US20130034209A1

    公开(公告)日:2013-02-07

    申请号:US13641966

    申请日:2011-05-20

    Applicant: Chidane Ouchi

    Inventor: Chidane Ouchi

    Abstract: Provided is an X-ray imaging apparatus having simple configuration and obtaining differential phase contrast images in two directions crossing each other without rotating the diffraction grating and the masking grating. The apparatus including: a diffraction grating diffracting X-rays; a masking grating masking portions rays and transmitting portions are two-dimensionally arranged to partially mask bright zones of the interference pattern; a moving device changing the relative position between the interference pattern and the masking grating; a detector detecting the intensity distribution of the X-rays transmitted through the masking grating; and a calculator calculating a differential phase contrast image or a phase contrast image of a subject, the calculator being configured to calculate the differential phase contrast image or the phase contrast image in each of two mutually crossing directions on the basis of results of detection performed a plurality of times by the detector.

    Abstract translation: 本发明提供一种具有简单结构的X射线成像设备,并且在不旋转衍射光栅和掩蔽光栅的情况下彼此交叉的两个方向获得差分相位差图像。 该装置包括衍射光栅衍射X射线; 屏蔽光栅遮蔽部分光线和透射部分被二维布置以部分地掩蔽干涉图案的亮区; 移动装置改变干涉图案和掩蔽光栅之间的相对位置; 检测器,其检测透过所述掩蔽光栅的X射线的强度分布; 以及计算器,其计算对象的差分相位差图像或相位对比图像,所述计算器被配置为基于检测结果a计算两个相互交叉方向中的每一个中的差分相位对比图像或相位对比图像 多次由检测器。

    X-ray imaging apparatus, X-ray imaging method, and X-ray imaging program
    24.
    发明授权
    X-ray imaging apparatus, X-ray imaging method, and X-ray imaging program 失效
    X射线成像装置,X射线成像方法和X射线成像程序

    公开(公告)号:US08340243B2

    公开(公告)日:2012-12-25

    申请号:US13190770

    申请日:2011-07-26

    Abstract: An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

    Abstract translation: X射线成像装置包括相位光栅,吸收光栅,检测器和运算单元。 算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。 此外,运算单元执行相位检索步骤,从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱,对分离的频谱进行傅里叶逆变换,获取差分相位图像。

    X-RAY IMAGING APPARATUS
    25.
    发明申请
    X-RAY IMAGING APPARATUS 有权
    X射线成像装置

    公开(公告)号:US20120263274A1

    公开(公告)日:2012-10-18

    申请号:US13518233

    申请日:2011-01-14

    Applicant: Chidane Ouchi

    Inventor: Chidane Ouchi

    Abstract: An X-ray imaging apparatus which takes an image of an object to be detected, comprises: a first grating to form a periodic bright-dark pattern by a Talbot effect, based on an X-ray from an X-ray source; a second grating, disposed at a position where the bright-dark pattern is formed, to block a part of the bright-dark pattern; a detector to detect an X-ray intensity distribution of the X-ray which passed through the second grating; and a calculator to calculate phase information of the X-ray based on the detected X-ray intensity distribution, wherein the second grating includes a first region having a first blocking pattern and a second region having a second blocking pattern, and a direction in which the first blocking pattern blocks a bright section of the bright-dark pattern is different from a direction in which the second blocking pattern blocks the bright section of the bright-dark pattern.

    Abstract translation: 拍摄被检测物体的图像的X射线摄像装置包括:基于来自X射线源的X射线,通过Talbot效应形成周期性明暗图案的第一光栅; 设置在形成明暗图案的位置处的第二光栅,以阻挡亮暗图案的一部分; 用于检测通过第二光栅的X射线的X射线强度分布的检测器; 以及计算器,用于基于检测到的X射线强度分布来计算X射线的相位信息,其中第二光栅包括具有第一阻挡图案的第一区域和具有第二阻挡图案的第二区域,以及其中 第一阻挡图案阻挡亮暗图案的明亮部分不同于第二遮挡图案阻挡亮暗图案的亮部的方向。

    X-RAY IMAGING APPARATUS, X-RAY IMAGING METHOD, AND X-RAY IMAGING PROGRAM
    26.
    发明申请
    X-RAY IMAGING APPARATUS, X-RAY IMAGING METHOD, AND X-RAY IMAGING PROGRAM 失效
    X射线成像装置,X射线成像方法和X射线成像程序

    公开(公告)号:US20110280368A1

    公开(公告)日:2011-11-17

    申请号:US13190770

    申请日:2011-07-26

    Abstract: An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

    Abstract translation: X射线成像装置包括相位光栅,吸收光栅,检测器和运算单元。 算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。 此外,运算单元执行相位检索步骤,从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱,对分离的频谱进行傅里叶逆变换,获取差分相位图像。

    Measuring apparatus, exposure apparatus and method, and device manufacturing method
    27.
    发明授权
    Measuring apparatus, exposure apparatus and method, and device manufacturing method 有权
    测量装置,曝光装置和方法以及装置制造方法

    公开(公告)号:US08004691B2

    公开(公告)日:2011-08-23

    申请号:US11721397

    申请日:2006-04-24

    CPC classification number: G03F7/706 G01M11/0264 G01M11/0271

    Abstract: A measuring apparatus includes a pinhole mask, located on an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole mask and the optical system, in which Lg=m·Pg2/λ is met, where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measuring light beam, m is an integer other than zero, and Lg is a distance between the diffraction grating and an image plane of the optical system. The measuring apparatus detects an interferogram formed by interference between a plurality of the measuring light beams split by the diffraction grating. The plurality of measuring light beams includes an aberration of the optical system.

    Abstract translation: 一种测量装置,包括:针孔掩模,位于待测光学系统的物平面上,并且具有多个用于从测量光束产生球面波的针孔;以及衍射光栅,用于分割具有 通过针孔掩模和满足Lg = m·Pg2 /λ的光学系统,其中Pg是衍射光栅的光栅间距,λ是测量光束的波长,m是除零以外的整数, Lg是衍射光栅与光学系统的像平面之间的距离。 测量装置检测由由衍射光栅分裂的多个测量光之间的干涉形成的干涉图。 多个测量光束包括光学系统的像差。

    IMAGING APPARATUS AND IMAGING METHOD
    28.
    发明申请
    IMAGING APPARATUS AND IMAGING METHOD 有权
    成像装置和成像方法

    公开(公告)号:US20110200168A1

    公开(公告)日:2011-08-18

    申请号:US13085199

    申请日:2011-04-12

    CPC classification number: G01N23/04 G01N2223/401

    Abstract: An imaging apparatus analyzes a periodic pattern of a Moiré due to Talbot interference by the Fourier transform method and forms an image. The imaging apparatus includes a first grating having a structure that transmits light beams from a beam source to refract or diffract the light beams and forms a self image based on a first periodic pattern by the Talbot interference at a predetermined position; a second grating that absorbs part of the first periodic pattern and causes a Moiré to be generated based on a second periodic pattern when the second grating is arranged at a position at which the self image is formed. All cross sections of the Moiré with axes in differential directions of a wavefront for the analysis by the Fourier transform method have a two-dimensional periodic structure in which periods of patterns in the second periodic pattern are the same.

    Abstract translation: 成像装置通过傅里叶变换方法分析由于Talbot干扰引起的莫尔的周期性图案并形成图像。 成像装置包括第一光栅,其具有透射来自光束源的光束以折射或衍射光束的结构,并且通过Talbot在预定位置处的干涉基于第一周期性图案形成自身图像; 当第二光栅布置在形成自身图像的位置时,第二光栅吸收第一周期性图案的一部分并且基于第二周期性图案产生莫尔(Moiré)。 具有用于通过傅立叶变换方法分析的波前差分方向上的轴的莫尔的所有横截面具有其中第二周期图案中的图案周期相同的二维周期性结构。

    MEASURING APPARATUS, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD
    29.
    发明申请
    MEASURING APPARATUS, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD 有权
    测量装置,曝光装置和方法以及装置制造方法

    公开(公告)号:US20090290136A1

    公开(公告)日:2009-11-26

    申请号:US11721397

    申请日:2006-04-24

    CPC classification number: G03F7/706 G01M11/0264 G01M11/0271

    Abstract: A measuring apparatus includes a pinhole mask, located at an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole mask and the optical system, wherein Lg=m·Pg2/λ is met, where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measuring light beam, m is an integer other than zero, and Lg is a distance between the diffraction grating and an image plane of the optical system. The measuring apparatus calculates a wavefront aberration of the optical system from an interferogram formed by causing interference of the measuring light beams split by the diffraction grating.

    Abstract translation: 测量装置包括:针孔掩模,位于待测光学系统的物平面上,并且具有多个用于从测量光束产生球面波的针孔;以及衍射光栅,用于分割具有 通过针孔掩模和光学系统,其中满足Lg = m.Pg2 /λ,其中Pg是衍射光栅的光栅间距,λ是测量光束的波长,m是除零以外的整数,以及 Lg是衍射光栅与光学系统的像面之间的距离。 测量装置根据由衍射光栅分裂的测量光束的干涉而形成的干涉图来计算光学系统的波前像差。

    Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method
    30.
    发明授权
    Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method 失效
    使用剪切干涉测量的测量方法和装置,使用其的曝光方法和装置以及装置制造方法

    公开(公告)号:US07253907B2

    公开(公告)日:2007-08-07

    申请号:US10994331

    申请日:2004-11-23

    Applicant: Chidane Ouchi

    Inventor: Chidane Ouchi

    CPC classification number: G03F7/706 G01J9/0215 G03F7/70266

    Abstract: A measuring method for measuring a wave front of light, which has passed through a target optical system. The method includes the steps of dividing the light that passes the target optical system into a first wave front and a second wave front made by offsetting the first wave front by a predetermined amount in a predetermined direction, obtaining information concerning an interference fringe using shearing interference with divided light, calculating a differential wave front between the first wave front and the second wave front by using the information concerning the interference fringe obtained in the obtaining step, and correcting the differential wave front based on the predetermined amount and a wave number in the predetermined direction.

    Abstract translation: 一种测量已经通过目标光学系统的光的波前测量方法。 该方法包括以下步骤:将通过目标光学系统的光划分为第一波前和通过在预定方向上将第一波前偏移预定量而形成的第二波前,使用剪切干涉获得关于干涉条纹的信息 利用分光,通过使用在获取步骤中获得的干涉条纹的信息来计算第一波前和第二波前的差分波前,并根据预定量和波数对波导数进行校正 预定方向。

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