23.
    发明专利
    未知

    公开(公告)号:DE3671699D1

    公开(公告)日:1990-07-12

    申请号:DE3671699

    申请日:1986-12-13

    Applicant: HOECHST AG

    Abstract: 1. An antimycotic nail varnish containing a) a 1-hydroxy-2-pyridone of the formula I see diagramm : EP0226984,P8,F2 in which R**1 is a saturated hydrocarbon radical having 6-9 carbon atoms, one of the radicals R**2 and R**4 is a hydrogen atom and the other is hydrogen, methyl or ethyl and R**3 is an alkyl radical having one or two carbon atoms, in the free form or in salt form, as the antimycotic substance, b) a water-insoluble film-forming agent, c) a physiologically acceptable solvent, and if appropriate d) additives customary in cosmetics.

    28.
    发明专利
    未知

    公开(公告)号:DE3544983A1

    公开(公告)日:1987-06-25

    申请号:DE3544983

    申请日:1985-12-19

    Applicant: HOECHST AG

    Abstract: 1. An antimycotic nail varnish containing a) a 1-hydroxy-2-pyridone of the formula I see diagramm : EP0226984,P8,F2 in which R**1 is a saturated hydrocarbon radical having 6-9 carbon atoms, one of the radicals R**2 and R**4 is a hydrogen atom and the other is hydrogen, methyl or ethyl and R**3 is an alkyl radical having one or two carbon atoms, in the free form or in salt form, as the antimycotic substance, b) a water-insoluble film-forming agent, c) a physiologically acceptable solvent, and if appropriate d) additives customary in cosmetics.

    29.
    发明专利
    未知

    公开(公告)号:DE2214608A1

    公开(公告)日:1973-10-04

    申请号:DE2214608

    申请日:1972-03-25

    Applicant: HOECHST AG

    Abstract: 1416397 Process for 1-hydroxy-2-pyridones HOECHST AG 21 March 1973 [25 March 1972] 13587/73 Heading C2C The invention comprises making compounds in which R 1 represents an alkyl radical of 1 to 17 carbon atoms which may be branched; an alkenyl radical of 2 to 17 carbon atoms; a cycloalkyl radical of 3 to 8 carbon atoms; a cyclohexylalkyl radical; a phenyl, phenylalkyl, phenylalkenyl, benzhydryl, phenoxymethyl; phenylmercaptomethyl or phenyl-sulphonylmethyl radical which may be substituted in the aromatic nucleus by one or more alkyl, alkoxy, amino, nitro, alkoxycarbonyl or cyano groups or halogen atoms; or a furyl or furylalkenyl radical; R 2 represents a hydrogen atom or an alkyl, alkenyl or alkynyl radical or a benzyl group or R 2 together with R 1 or R 3 forms a 5- or 6- membered carbocyclic ring; R 3 represents a hydrogen atom, an alkyl radical or a phenyl group and R 4 represents a hydrogen atom, an alkyl or alkenyl radical, a methoxymethyl or benzyl radical, or a chlorine or bromine atom, by reacting a 2-pyrone of the general Formula (II) with NH 2 OH or its salt in the presence of an optionally substituted aminopyridine or imidazole. Pharmaceutical preparations showing antibacterial and antimycotic actions contain (I) as active ingredient.

    30.
    发明专利
    未知

    公开(公告)号:DE2134358A1

    公开(公告)日:1973-01-25

    申请号:DE2134358

    申请日:1971-07-09

    Applicant: HOECHST AG

    Abstract: 1399748 Organotin compounds HOECHST AG 7 July 1972 [9 July 1971] 31945/72 Heading C2J Compounds of general formula where R 1 -R 4 are alkyl, aryl or alkaryl groups and R 4 may additionally be H, and R 5 is H or methyl are prepared by condensing a bisorganotin oxide (R 1 R 2 R 3 Sn) 2 O with a carboxylic acid at elevated temperature, usually in benzene, toluene or xylene as solvent. The compounds have fungistatic and bacteriostatic properties and are used in the antimicrobial finishing of fibrous materials (many specified). The compounds may be applied as solutions, especially in iso-propanol/water mixtures or in dimethyloldihydroxy-ethylene-urea containing MgCl 2 , dispersions or emulsions and may be incorporated into pastes, pigment mixtures and plastics dispersions such as polyacrylate, polyurethane, butadiene copolymer, polyvinylacetate, or natural latex and especially an aqueous dispersion of a copolymer of butyl acrylate, acrylonitrile, styrene and acrylamide.

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