公开(公告)号：WO2009023154A3

公开(公告)日：2009-04-23

申请号：PCT/US2008009571

申请日：2008-08-11

Applicant: KLA TENCOR CORP ,  KADKLY AZMI ,  BIELLAK STEPHEN ,  VAEZ-IRAVANI MEHDI

Inventor： KADKLY AZMI ,  BIELLAK STEPHEN ,  VAEZ-IRAVANI MEHDI

IPC: H01L21/66

CPC classification number: G01N21/9501

Abstract: Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to illuminate an area on the wafer by directing light to the wafer at an oblique angle of incidence. The system also includes a collection subsystem configured to simultaneously collect light scattered from different spots within the illuminated area and to focus the light collected from the different spots to corresponding positions in an image plane. In addition, the system includes a detection subsystem configured to separately detect the light focused to the corresponding positions in the image plane and to separately generate output responsive to the light focused to the corresponding positions in the image plane. The output can be used to detect defects on the wafer.

Abstract translation: 提供了配置用于检查晶片的系统。 一个系统包括照明子系统，该照明子系统被配置为以倾斜的入射角将光引导到晶片上来照射晶片上的区域。 该系统还包括收集子系统，其被配置为同时收集从照明区域内的不同点散射的光并且将从不同点收集的光聚焦到图像平面中的相应位置。 另外，该系统包括检测子系统，该检测子系统被配置为分别检测聚焦到图像平面中的对应位置的光，并且响应于聚焦到图像平面中的对应位置的光单独产生输出。 该输出可用于检测晶圆上的缺陷。

公开(公告)号：WO9914575B1

公开(公告)日：1999-06-03

申请号：PCT/US9819564

申请日：1998-09-18

Applicant: KLA TENCOR CORP ,  VAEZ IRAVANI MEHDI ,  STOKOWSKI STANLEY ,  ZHAO GUOHENG

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STANLEY ,  ZHAO GUOHENG

IPC: G01N21/956 ,  G01J3/44 ,  G01N21/00 ,  G01N21/21 ,  G01N21/47 ,  G01N21/88 ,  G01N21/94 ,  G01N21/95 ,  H01L21/66 ,  G01B11/24 ,  G01N21/86

CPC classification number: G01J3/44 ,  G01J3/0216 ,  G01J3/0229 ,  G01N21/21 ,  G01N21/47 ,  G01N21/474 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8825 ,  G01N2021/8845 ,  G01N2021/8848 ,  G01N2201/065

Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors (78) to restrict detection to certain azimuthal angles.

Abstract translation: 使用弯曲镜像表面（78）来收集由样本表面（76a）散射并且源自正常照明光束（70）和斜向照明光束（90）的辐射。 所收集的辐射被聚焦到检测器（80）。 通过采用两个不同波长的辐射，通过有意地在由两个光束照射的光点之间引入偏移或者通过将正常照明光束和倾斜照明光束（70,90）切换到其上，并且通过使用两个不同波长的辐射来区分源自正常照明光束和倾斜照明光束的散射辐射 交替关闭。 可以通过检测倾斜照明光束的镜面反射并响应于此改变照明方向来校正由样本高度变化引起的光束位置误差。 蝴蝶形空间滤波器可以与曲面镜辐射收集器（78）结合使用，以将检测限制在某些方位角。

公开(公告)号：EP2294371A4

公开(公告)日：2014-03-26

申请号：EP09743692

申请日：2009-05-07

Applicant: KLA TENCOR CORP

Inventor： VAEZ-IRAVANI MEHDI ,  NASSER GHODSI MEHRAN ,  ZHAO GUOHENG

IPC: G01J3/00 ,  G01J3/42

CPC classification number: H01J37/244 ,  G01N2223/079 ,  G01N2223/086 ,  G01N2223/33 ,  H01J37/256 ,  H01J2237/24495 ,  H01J2237/2511 ,  H01J2237/2807

公开(公告)号：EP1023582A4

公开(公告)日：2000-11-29

申请号：EP98947155

申请日：1998-09-18

Applicant: KLA TENCOR CORP

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STANLEY ,  ZHAO GUOHENG

IPC: G01N21/956 ,  G01J3/44 ,  G01N21/00 ,  G01N21/21 ,  G01N21/47 ,  G01N21/88 ,  G01N21/94 ,  G01N21/95 ,  H01L21/66 ,  G01B7/34 ,  G01B11/24 ,  G01N21/86

CPC classification number: G01J3/44 ,  G01J3/0216 ,  G01J3/0229 ,  G01N21/21 ,  G01N21/47 ,  G01N21/474 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8825 ,  G01N2021/8845 ,  G01N2021/8848 ,  G01N2201/065

Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors (78) to restrict detection to certain azimuthal angles.

Abstract translation: 使用弯曲镜像表面（78）来收集由样本表面（76a）散射并且源自正常照明光束（70）和斜向照明光束（90）的辐射。 所收集的辐射被聚焦到检测器（80）。 通过采用两个不同波长的辐射，通过有意地在由两个光束照射的光点之间引入偏移或者通过将正常照明光束和倾斜照明光束（70,90）切换到其上，并且通过使用两个不同波长的辐射来区分源自正常照明光束和倾斜照明光束的散射辐射 交替关闭。 可以通过检测倾斜照明光束的镜面反射并响应于此改变照明方向来校正由样本高度变化引起的光束位置误差。 蝴蝶形空间滤波器可以与曲面镜辐射收集器（78）结合使用，以将检测限制在某些方位角。

公开(公告)号：WO2012138460A2

公开(公告)日：2012-10-11

申请号：PCT/US2012028910

申请日：2012-03-13

Applicant: KLA TENCOR CORP ,  ZHAO GUOHENG ,  LEVY ADY ,  SALNIK ALEX ,  VAEZ-IRAVANI MEHDI ,  NICOLAIDES LENA ,  NGAI SAMUEL S H

Inventor： ZHAO GUOHENG ,  LEVY ADY ,  SALNIK ALEX ,  VAEZ-IRAVANI MEHDI ,  NICOLAIDES LENA ,  NGAI SAMUEL S H

IPC: G01N21/01 ,  F21S2/00 ,  F21V8/00 ,  G01R31/26

CPC classification number: H05B33/0803

Abstract: An apparatus for illuminating a target surface, the apparatus having a plurality of LED arrays, where each of the arrays has a plurality of individually addressable LEDs, and where at least one of the arrays is disposed at an angle of between about forty-five degrees and about ninety degrees relative to the target surface, where all of the arrays supply light into a light pipe, the light pipe having interior walls made of a reflective material, where light exiting the light pipe illuminates the target surface, and a controller for adjusting an intensity of the individually addressable light sources.

Abstract translation: 一种用于照射目标表面的装置，该装置具有多个LED阵列，其中每个阵列具有多个独立可寻址的LED，并且其中至少一个阵列以大约四十五度之间的角度设置 并且相对于目标表面大约九十度，其中所有阵列将光提供到光管中，光管具有由反射材料制成的内壁，其中离开光管的光照射目标表面，以及用于调节的控制器 独立寻址光源的强度。

公开(公告)号：WO2009137706A3

公开(公告)日：2010-02-25

申请号：PCT/US2009043185

申请日：2009-05-07

Applicant: KLA TENCOR CORP ,  VAEZ-IRAVANI MEHDI ,  NASSER GHODSI MEHRAN ,  ZHAO GUOHENG

Inventor： VAEZ-IRAVANI MEHDI ,  NASSER GHODSI MEHRAN ,  ZHAO GUOHENG

IPC: G01J3/00 ,  G01J3/42

CPC classification number: H01J37/244 ,  G01N2223/079 ,  G01N2223/086 ,  G01N2223/33 ,  H01J37/256 ,  H01J2237/24495 ,  H01J2237/2511 ,  H01J2237/2807

Abstract: A spectrometer having an electron beam generator for generating an electron beam that is directed at a sample. An electron beam positioner directs the electron beam onto a position of the sample, and thereby produces a secondary emitted stream from the sample, where the secondary emitted stream includes at least one of electrons and x-rays. An secondary emitted stream positioner positions the secondary emitted stream onto a detector array, which receives the secondary emitted stream and detects both the amounts and the received positions of the secondary emitted stream. A modulator modulates the electron beam that is directed onto the sample, and thereby sweeps the electron beam between a first position and a second position on the sample. An extractor is in signal communication with both the modulator and the detector array.

Abstract translation: 具有用于产生针对样品的电子束的电子束发生器的光谱仪。 电子束定位器将电子束引导到样品的位置，从而产生来自样品的二次发射流，其中二次发射流包括电子和X射线中的至少一个。 二次发射流定位器将二次发射流定位在检测器阵列上，检测器阵列接收二次发射流并检测二次发射流的量和接收位置。 调制器调制被引导到样品上的电子束，从而在样品上的第一位置和第二位置之间扫描电子束。 提取器与调制器和检测器阵列进行信号通信。

公开(公告)号：WO2009111407A3

公开(公告)日：2009-11-26

申请号：PCT/US2009035749

申请日：2009-03-02

Applicant: KLA TENCOR CORP ,  ZHAO GUOHENG ,  RUNYON REX ,  VAEZ-IRAVANI MEHDI

Inventor： ZHAO GUOHENG ,  RUNYON REX ,  VAEZ-IRAVANI MEHDI

IPC: H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2201/10 ,  G01N2201/104 ,  G02B26/123 ,  Y10S359/90

Abstract: A multi-spot scanning technique using a spot array having a predetermined gap between spots can advantageously provide scalability to a large number of spots as well as the elimination of cross-talk between channels. The multi-spot scanning technique can select a number of spots for the spot array (1D or 2D), determine a separation between the spots to minimize crosstalk, and perform a scan on a wafer using the spot array and a full field of view (FOV). Performing the scan includes performing a plurality of scan line cycles, wherein each scan line cycle can fill in gaps left by previous scan line cycles. This 'delay and fill' scan allows large spacing between spots, thereby eliminating cross-talk at the detector plane. In one embodiment, the scan is begun and ended outside a desired scan area on the wafer to ensure full scan coverage.

Abstract translation: 使用在点之间具有预定间隙的点阵列的多点扫描技术可以有利地为大量点提供可缩放性以及消除信道之间的串扰。 多点扫描技术可以为点阵列（1D或2D）选择多个点，确定点之间的分隔以最小化串扰，并且使用点阵列和全视场在晶片上执行扫描（ FOV）。 执行扫描包括执行多个扫描线周期，其中每个扫描线周期可以填充先前扫描线周期留下的间隙。 这种“延迟和填充”扫描允许点之间具有大的间距，从而消除检测器平面处的串扰。 在一个实施例中，扫描在晶片上的期望扫描区域之外开始并结束，以确保全扫描覆盖。

公开(公告)号：EP2652776A4

公开(公告)日：2018-01-17

申请号：EP11849418

申请日：2011-12-07

Applicant: KLA-TENCOR CORP

Inventor： ZHAO GUOHENG ,  LEONG JENN-KUEN ,  VAEZ-IRAVANI MEHDI

IPC: G01N21/95 ,  H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/47 ,  G01N21/8806 ,  G01N2201/06113 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Systems and methods for inspecting a wafer are provided. One system includes an illumination subsystem configured to illuminate the wafer; a collection subsystem configured to collect light scattered from the wafer and to preserve the polarization of the scattered light; an optical element configured to separate the scattered light collected in different segments of the collection numerical aperture of the collection subsystem, where the optical element is positioned at a Fourier plane or a conjugate of the Fourier plane of the collection subsystem; a polarizing element configured to separate the scattered light in one of the different segments into different portions of the scattered light based on polarization; and a detector configured to detect one of the different portions of the scattered light and to generate output responsive to the detected light, which is used to detect defects on the wafer.

公开(公告)号：EP2862197A4

公开(公告)日：2016-02-17

申请号：EP13803745

申请日：2013-06-07

Applicant: KLA TENCOR CORP

Inventor： NASSER-GHODSI MEHRAN ,  STOKOWSKI STANLEY E ,  VAEZ-IRAVANI MEHDI

IPC: G06T7/00 ,  G03F1/84 ,  H01L21/027

CPC classification number: G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

公开(公告)号：WO03089872A2

公开(公告)日：2003-10-30

申请号：PCT/US0312070

申请日：2003-04-18

Applicant: KLA TENCOR CORP

Inventor： VAEZ-IRAVANI MEHDI ,  MILLER LARRY

IPC: G01N21/88 ,  G01N21/956 ,  G01B

CPC classification number: G01N21/95623 ,  G01N21/8806

Abstract: A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. For patterned surface inspection, a cross-shaped filter is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface. In another embodiment, different portions of the same objective may be used for focusing the illumination beams onto the surface and for collecting the scattered radiation from the illuminated spots simultaneously. In another embodiment, a one-dimensional array of illumination beams are directed at an oblique angle to the surface to illuminate a line of illuminated spots at an angle to the plane of incidence. Radiation scattered from the spots are collected along directions perpendicular to the line of spots or in a double dark field configuration.

Abstract translation: 紧凑且通用的多点检查成像系统采用将辐射束阵列聚焦到表面的目标和具有大数值孔径的第二反射或折射物镜，用于收集来自照明点阵列的散射辐射。 来自每个照明点的散射辐射被聚焦到相应的光纤通道，使得关于散射的信息可以被传送到用于处理的远程检测器阵列中的相应检测器。 对于图案化表面检查，十字形过滤器与表面一起旋转，以减少曼哈顿几何形状的衍射效应。 也可以采用环形孔形状的空间滤光器，以减少从诸如表面上的阵列的图案的散射。 在另一个实施例中，相同物镜的不同部分可用于将照明光束聚焦到表面上并且用于从同时收集来自照明斑点的散射辐射。 在另一个实施例中，照明光束的一维阵列以与入射平面成一定角度的一定角度照射到该表面上的倾斜角度。 从斑点散射的辐射沿垂直于斑点线的方向或双暗场配置收集。