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    REDUCING ALGORITHMIC INACCURACY IN SCATTEROMETRY OVERLAY METROLOGY
    21.
    发明申请
    REDUCING ALGORITHMIC INACCURACY IN SCATTEROMETRY OVERLAY METROLOGY 审中-公开
    降低算术计算中的算术不准确度

    公开(公告)号：WO2014074873A1

    公开(公告)日：2014-05-15

    申请号：PCT/US2013/069236

    申请日：2013-11-08

    Applicant: KLA-TENCOR CORPORATION

    Inventor： BRINGOLTZ, Barak ,  KANDEL, Daniel ,  GHINOVKER, Mark ,  BOMZON, Zeev ,  LEVINSKI, Vladimir

    IPC: H01L21/66

    CPC classification number: G01B11/14 ,  G01B11/2441 ,  G03F7/70633

    Abstract: Methods and systems for minimizing of algorithmic inaccuracy in scatterometry overlay (SCOL) metrology are provided. SCOL targets are designed to limit the number of oscillation frequencies in a functional dependency of a resulting SCOL signal on the offset and to reduce the effect of higher mode oscillation frequencies. The targets are segmented in a way that prevents constructive interference of high modes with significant amplitudes, and thus avoids the inaccuracy introduced by such terms into the SCOL signal. Computational methods remove residual errors in a semi-empirical iterative process of compensating for the residual errors algorithmically or through changes in target design.

    Abstract translation: 提供了用于最小化散点映射覆盖（SCOL）计量学中算法不准确性的方法和系统。 SCOL目标被设计为将所得到的SCOL信号的功能依赖性的振荡频率的数量限制在偏移上并且降低更高模式振荡频率的影响。 目标被分段，以防止具有显着幅度的高模式的建构性干扰，从而避免了由这些术语引入到SCOL信号中的不准确性。 计算方法在半经验迭代过程中，通过算法或通过目标设计的变化来补偿残差，从而消除残差。

    SCANNING IN ANGLE-RESOLVED REFLECTOMETRY AND ALGORITHMICALLY ELIMINATING DIFFRACTION FROM OPTICAL METROLOGY
    22.
    发明申请
    SCANNING IN ANGLE-RESOLVED REFLECTOMETRY AND ALGORITHMICALLY ELIMINATING DIFFRACTION FROM OPTICAL METROLOGY 审中-公开
    在角度解析中进行扫描并从光学计量学中解决偏差

    公开(公告)号：WO2014004564A1

    公开(公告)日：2014-01-03

    申请号：PCT/US2013/047691

    申请日：2013-06-25

    Applicant: KLA-TENCOR CORPORATION

    Inventor： MANASSEN, Amnon ,  HILL, Andy ,  KANDEL, Daniel ,  SELA, Ilan ,  BACHAR, Ohad ,  BRINGOLTZ, Barak

    IPC: H01L21/66

    CPC classification number: G01N21/55 ,  G01B11/00 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/104

    Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a target pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the target pattern and the scanning is carried out optically or mechanically according to a scanning pattern; and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

    Abstract translation: 提供了角度分辨反射计和反射测量方法，其包括相干光源，光学系统被布置成使用来自光源的相干光的光点扫描目标图案以产生收集的光瞳中的光分布的实现，其中 点覆盖目标图案的一部分，并且根据扫描图案光学地或机械地执行扫描; 以及处理单元，被配置为通过组合瞳孔图像来生成收集的瞳孔分布的合成图像。 提供了测量系统和方法，其通过估计定量地测量参数对孔径尺寸的功能依赖性并且从与孔径尺寸相关的功能依赖性的识别的衍射分量推导出测量参数的校正项，从而降低衍射误差， 相对于测量条件。

    ADVANCED PROCESS CONTROL OPTIMIZATION
    25.
    发明申请
    ADVANCED PROCESS CONTROL OPTIMIZATION 审中-公开
    高级过程控制优化

    公开(公告)号：WO2011159625A2

    公开(公告)日：2011-12-22

    申请号：PCT/US2011/040216

    申请日：2011-06-13

    Applicant: KLA-TENCOR CORPORATION ,  CHOI, DongSub ,  WIDMANN, Amir ,  KANDEL, Daniel ,  TIEN, David

    Inventor： CHOI, DongSub ,  WIDMANN, Amir ,  KANDEL, Daniel ,  TIEN, David

    IPC: H01L21/027

    CPC classification number: G03F7/70525

    Abstract: A method for automatic process control (APC) performance monitoring may include, but is not limited to: computing one or more APC performance indicators for one or more production lots of semiconductor devices; and displaying a mapping of the one or more APC performance indicators to the one or more production lots of semiconductor devices.

    Abstract translation: 用于自动过程控制（APC）性能监控的方法可以包括但不限于：计算一个或多个生产批次的半导体器件的一个或多个APC性能指标; 以及显示所述一个或多个APC性能指示符到所述一个或多个半导体器件的生产批次的映射。

    SUBSTRATE MATRIX TO DECOUPLE TOOL AND PROCESS EFFECTS
    26.
    发明申请
    SUBSTRATE MATRIX TO DECOUPLE TOOL AND PROCESS EFFECTS 审中-公开
    基板矩阵对工具和过程效应

    公开(公告)号：WO2009143200A2

    公开(公告)日：2009-11-26

    申请号：PCT/US2009/044594

    申请日：2009-05-20

    Applicant: KLA-TENCOR CORPORATION ,  IZIKSON, Pavel ,  ADEL, Michael, E. ,  KANDEL, Daniel

    Inventor： IZIKSON, Pavel ,  ADEL, Michael, E. ,  KANDEL, Daniel

    IPC: H01L21/66

    CPC classification number: G03F7/70641 ,  G05B19/41845 ,  G05B2219/32187 ,  G05B2219/36307 ,  H01L22/20 ,  Y02P90/16 ,  Y02P90/22

    Abstract: A method of characterizing a process by selecting the process to characterize, selecting a parameter of the process to characterize, determining values of the parameter to use in a test matrix, specifying an eccentricity for the test matrix, selecting test structures to be created in cells on a substrate, processing the substrate through the process using in each cell the value of the parameter as determined by the eccentric test matrix, measuring a property of the test structures in the cells, and developing a correlation between the parameter and the property.

    Abstract translation: 一种通过选择表征过程来表征过程的方法，选择过程的参数来表征，确定在测试矩阵中使用的参数的值，指定测试矩阵的偏心度，选择要在单元格中创建的测试结构 在基板上，通过在每个单元中使用由偏心测试矩阵确定的参数值来处理基板，测量单元中的测试结构的性质，以及发展参数与特性之间的相关性。

    SCANNING IN ANGLE-RESOLVED REFLECTOMETRY AND ALGORITHMICALLY ELIMINATING DIFFRACTION FROM OPTICAL METROLOGY
    27.
    发明公开
    SCANNING IN ANGLE-RESOLVED REFLECTOMETRY AND ALGORITHMICALLY ELIMINATING DIFFRACTION FROM OPTICAL METROLOGY 审中-公开
    扫描角度和分辨反射算法DIFFRAKTIONSENTFERNUNG从光学检测

    公开(公告)号：EP2865003A1

    公开(公告)日：2015-04-29

    申请号：EP13808673.1

    申请日：2013-06-25

    Applicant: Kla-Tencor Corporation

    Inventor： MANASSEN, Amnon ,  HILL, Andy ,  KANDEL, Daniel ,  SELA, Ilan ,  BACHAR, Ohad ,  BRINGOLTZ, Barak

    IPC: H01L21/66

    CPC classification number: G01N21/55 ,  G01B11/00 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/104

    Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

    METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL
    28.
    发明公开
    METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL 审中-公开
    方法和体系，为产品度量的改善过程控制质量PROVIDING

    公开(公告)号：EP2694983A1

    公开(公告)日：2014-02-12

    申请号：EP12768608.7

    申请日：2012-04-04

    Applicant: KLA-Tencor Corporation

    Inventor： KANDEL, Daniel ,  COHEN, Guy ,  KLEIN, Dana ,  LEVINSKI, Vladimir ,  SAPIENS, Noam ,  SHULMAN, Alex ,  KAMENETSKY, Vladimir ,  AMIT, Eran ,  VAKSHTEIN, Irina

    IPC: G01N37/00

    CPC classification number: G03F7/70633 ,  G01N2223/6116 ,  G03F1/48 ,  G03F7/70616

    Abstract: The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.

    SCATTEROMETRY METROLOGY TARGET DESIGN OPTIMIZATION
    29.
    发明公开
    SCATTEROMETRY METROLOGY TARGET DESIGN OPTIMIZATION 有权
    SCATTEROMETRIE-METROLOGIE-TARGETDESIGNOPTIMIERUNG

    公开(公告)号：EP2386114A2

    公开(公告)日：2011-11-16

    申请号：EP10729404.3

    申请日：2010-01-04

    Applicant: KLA-Tencor Corporation

    Inventor： ADEL, Michael E. ,  MANASSEN, Amnon ,  KANDEL, Daniel

    IPC: H01L21/66

    CPC classification number: G03F7/70683 ,  G03F7/705 ,  G03F7/70633 ,  H01L22/12

    Abstract: A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.

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