-
21.PHYSICAL VAPOR DEPOSITION USING ROTATIONAL SPEED SELECTED WITH RESPECT TO DEPOSITION RATE 审中-公开
Title translation: PHYSIKALISCHE DAMPFABSCHEIDUNG MIT DREHZAHLAUSWAHL HINSICHTLICH DER ABSCHEIDUNGSGESCHWINDIGKEIT公开(公告)号:EP3097219A4
公开(公告)日:2017-02-15
申请号:EP15737817
申请日:2015-01-08
Applicant: UNITED TECHNOLOGIES CORP
Inventor: TRUBELJA MLADEN F , LITTON DAVID A , DEPALMA JOSEPH A , NEAL JAMES W , MALONEY MICHAEL , BEERS RUSSELL A , HAZEL BRIAN T , COTNOIR GLENN A
IPC: C23C14/06 , C23C14/08 , C23C14/22 , C23C14/24 , C23C14/30 , C23C14/50 , C23C14/54 , F01D9/04 , F01D15/10
CPC classification number: C23C14/542 , C23C14/083 , C23C14/243 , C23C14/30 , C23C14/505 , C23C14/54 , F01D9/041 , F01D15/10 , F05D2220/32 , F05D2230/313 , F05D2230/90 , F05D2300/2118
Abstract: A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.
Abstract translation: 用于物理气相沉积涂覆方法的方法包括将陶瓷涂层材料从羽状物沉积到至少一个基底上以在其上形成陶瓷涂层,并且在沉积期间,以相对于 陶瓷涂层材料沉积到至少一个基底上。
-
公开(公告)号:EP2506980A4
公开(公告)日:2013-07-10
申请号:EP10834025
申请日:2010-11-30
Applicant: UNITED TECHNOLOGIES CORP
Inventor: NEAL JAMES W , LATOUR ROBERT F , ZIMMERMAN BENJAMIN J
CPC classification number: C23C14/02 , C23C14/024 , C23C14/541 , C23C14/566 , H01L21/67173 , H01L21/67213
-