DEPOSITION APPARATUS AND METHODS
    4.
    发明申请
    DEPOSITION APPARATUS AND METHODS 审中-公开
    沉积装置和方法

    公开(公告)号:WO2014144189A1

    公开(公告)日:2014-09-18

    申请号:PCT/US2014028489

    申请日:2014-03-14

    Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

    Abstract translation: 一种沉积设备(20),包括:腔室(22); 耦合到所述室的处理气体源(62); 耦合到所述室的真空泵(52); 至少两个电子枪(26); 耦合到电子枪的一个或多个电源(30); 多个坩埚(32,33,34),其定位或定位在至少一个所述电子枪的视场内的操作位置; 以及具有至少一个操作位置的部件保持器(170),用于将间隔在坩埚上方的部件保持在间隔高度H上。间隔高度H在包括至少22英寸的范围内是可调节的。

    DEPOSITION APPARATUS AND METHODS
    10.
    发明公开
    DEPOSITION APPARATUS AND METHODS 审中-公开
    ABSCHEIDUNGSVORRICHTUNG UND VERFAHREN

    公开(公告)号:EP2971222A4

    公开(公告)日:2017-05-10

    申请号:EP14765262

    申请日:2014-03-14

    Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

    Abstract translation: 一种沉积装置(20),包括:腔室(22); 耦合到所述室的处理气体源(62); 联接到腔室的真空泵(52) 至少两个电子枪(26); 耦合到电子枪的一个或多个电源(30) 多个坩埚(32,33,34),位于或可定位在至少一个所述电子枪的视场内的操作位置; 以及具有至少一个操作位置的零件保持器(170),该操作位置用于保持在坩埚上方与隔离高度H隔开的部分。隔离高度H可在包括至少22英寸的范围内调节。

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