公开(公告)号：EP3097219A4

公开(公告)日：2017-02-15

申请号：EP15737817

申请日：2015-01-08

Applicant: UNITED TECHNOLOGIES CORP

Inventor： TRUBELJA MLADEN F ,  LITTON DAVID A ,  DEPALMA JOSEPH A ,  NEAL JAMES W ,  MALONEY MICHAEL ,  BEERS RUSSELL A ,  HAZEL BRIAN T ,  COTNOIR GLENN A

IPC: C23C14/06 ,  C23C14/08 ,  C23C14/22 ,  C23C14/24 ,  C23C14/30 ,  C23C14/50 ,  C23C14/54 ,  F01D9/04 ,  F01D15/10

CPC classification number: C23C14/542 ,  C23C14/083 ,  C23C14/243 ,  C23C14/30 ,  C23C14/505 ,  C23C14/54 ,  F01D9/041 ,  F01D15/10 ,  F05D2220/32 ,  F05D2230/313 ,  F05D2230/90 ,  F05D2300/2118

Abstract: A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.

Abstract translation: 用于物理气相沉积涂覆方法的方法包括将陶瓷涂层材料从羽状物沉积到至少一个基底上以在其上形成陶瓷涂层，并且在沉积期间，以相对于 陶瓷涂层材料沉积到至少一个基底上。

公开(公告)号：EP3092324A4

公开(公告)日：2017-08-02

申请号：EP15735044

申请日：2015-01-07

Applicant: UNITED TECHNOLOGIES CORP

Inventor： DEPALMA JOSEPH A ,  TRUBELJA MLADEN F ,  LITTON DAVID A ,  NOVIKOV DMITRI L ,  BURLATSKY SERGEI F

IPC: C23C14/08 ,  C23C14/22 ,  C23C14/30

CPC classification number: C23C14/228 ,  C23C14/02 ,  C23C14/083 ,  C23C14/243 ,  C23C14/30

Abstract: A method for use in a coating process includes pre-heating a substrate in the presence of a coating material and shielding the substrate during the pre-heating from premature deposition of the coating material by establishing a gas screen between the substrate and the coating material. An apparatus for use in a coating process includes a chamber, a crucible that is configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible. A second manifold provides gas during a later coating deposition to compress a vapor plume of the coating material and focus the plume on the substrate to increase deposition rate.

Abstract translation: 用于涂覆工艺的方法包括在涂层材料的存在下预热基底，并且在预加热过程中通过在基底和涂层材料之间建立气体屏幕而预先沉积涂层材料来屏蔽基底。 一种用于涂覆过程的设备包括腔室，构造成将涂层材料保持在腔室中的坩埚，可操作以加热腔室内部的能量源，相对于坩埚定位的涂层封套，以及 位于涂层外壳附近的至少一个气体歧管。 所述至少一个气体歧管构造成在涂层外壳和坩埚之间提供气体筛网。 第二歧管在稍后的涂层沉积期间提供气体以压缩涂层材料的蒸汽羽流并将羽流聚焦在基板上以增加沉积速率。