-
公开(公告)号：US12061402B2
公开(公告)日：2024-08-13
申请号：US17304741
申请日：2021-06-24
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan
IPC: G02F1/15 , B32B17/10 , B32B37/14 , B32B38/00 , B32B38/10 , G02F1/1333 , G02F1/1524 , G02F1/153 , G02F1/157 , G09G3/19 , G02F1/155
CPC classification number: G02F1/1524 , B32B17/10119 , B32B17/1099 , B32B37/14 , B32B38/10 , B32B38/105 , G02F1/1333 , G02F1/1533 , B32B17/10513 , G02F1/133302 , G02F1/153 , G02F2001/1536 , G02F1/155 , G02F2201/56 , Y10T29/49126 , Y10T156/1052
Abstract: Certain aspects pertain to methods of fabricating an optical device on a substantially transparent substrate that include a pre-deposition operation that removes a width of lower conductor layer at a distance from the outer edge of the substrate to form a pad at the outer edge. The pad and any deposited layers of the optical device may be removed in a post edge deletion operation.
-
公开(公告)号：US20230068903A1
公开(公告)日：2023-03-02
申请号：US17760289
申请日：2021-02-05
Applicant: View, Inc.
Inventor： Madhura R. Gadre , Todd William Martin
IPC: B23K26/046 , B23K26/06 , B23K26/08 , B23K26/40 , B23K26/361
Abstract: Methods of determining a polygon ablation pattern for use in mitigating one or more defects in an optical device are described. A method comprises identifying spatial coordinates of one or more defects areas in a first image of the optical device taken when tinted, defining a region of interest around at least one defect area of the one or more defect areas, and determining a polygon boundary around the at least one defect area in the region of interest to define the polygon ablation pattern.
-
公开(公告)号：US11086182B2
公开(公告)日：2021-08-10
申请号：US16195693
申请日：2018-11-19
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan
IPC: G02F1/1524 , G02F1/1333 , B32B17/10 , G02F1/153 , B32B37/14 , B32B38/10 , B32B38/00 , G02F1/155
Abstract: Certain aspects pertain to methods of fabricating an optical device on a substantially transparent substrate that include a pre-deposition operation that removes a width of lower conductor layer at a distance from the outer edge of the substrate to form a pad at the outer edge. The pad and any deposited layers of the optical device may be removed in a post edge deletion operation.
-
公开(公告)号：US11048137B2
公开(公告)日：2021-06-29
申请号：US15448414
申请日：2017-03-02
Applicant: View, Inc. , Corning Incorporated
Inventor： Tom Toan-Cong Tran , Brian D. Griedel , Robert T. Rozbicki , Todd William Martin
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
-
公开(公告)号：US20210191212A1
公开(公告)日：2021-06-24
申请号：US17195521
申请日：2021-03-08
Applicant: View, Inc.
Inventor： Tom Toan-Cong Tran , Brian D. Griedel , Robert T. Rozbicki , Todd William Martin
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
-
Patent Agency Ranking
公开(公告)号：US20210001426A1
公开(公告)日：2021-01-07
申请号：US16947841
申请日：2020-08-19
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan , Fabian Strong , Robert T. Rozbicki
IPC: B23K26/0622 , G02F1/155 , H01L27/144 , G02F1/153 , B23K26/082 , B23K26/402 , B23K26/57 , B23K26/08 , B23K26/38 , E06B9/24 , B23K26/361 , G02F1/1524 , B32B17/06 , C03B33/07 , H01B5/14
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
-
公开(公告)号：US10606142B2
公开(公告)日：2020-03-31
申请号：US15109624
申请日：2014-12-31
Applicant: View, Inc. , CORNING INCORPORATED
Inventor： Tom Toan-Cong Tran , Brian D. Griedel , Robert T. Rozbicki , Todd William Martin
IPC: G02F1/153 , G02F1/1523
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
-
公开(公告)号：US20240082949A1
公开(公告)日：2024-03-14
申请号：US18491638
申请日：2023-10-20
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan , Fabian Strong , Robert T. Rozbicki
IPC: B23K26/0622 , B23K26/08 , B23K26/082 , B23K26/361 , B23K26/38 , B23K26/402 , B23K26/57 , B32B17/06 , C03B33/07 , E06B9/24 , G02F1/1523 , G02F1/1524 , G02F1/153 , G02F1/155 , H01B5/14 , H01L27/144
CPC classification number: B23K26/0624 , B23K26/082 , B23K26/0846 , B23K26/361 , B23K26/38 , B23K26/402 , B23K26/57 , B32B17/06 , C03B33/076 , E06B9/24 , G02F1/1523 , G02F1/1524 , G02F1/153 , G02F1/1533 , G02F1/155 , H01B5/14 , H01L27/1443 , B23K2103/172
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
-
29.发明授权公开(公告)号：US11762254B2
公开(公告)日：2023-09-19
申请号：US18049626
申请日：2022-10-25
Applicant: View, Inc.
CPC classification number: G02F1/1533 , G02F1/155 , G02F2001/1536 , G02F2001/1555 , G02F2201/08
Abstract: Certain embodiments relate to optical devices and methods of fabricating optical devices that pre-treat a sub-layer to enable selective removal of the pre-treated sub-layer and overlying layers. Other embodiments pertain to methods of fabricating an optical device that apply a sacrificial material layer.
-
公开(公告)号：US10895793B2
公开(公告)日：2021-01-19
申请号：US16249822
申请日：2019-01-16
Applicant: View, Inc.
Inventor： Sridhar Karthik Kailasam , Dhairya Shrivastava , Zhiwei Cai , Robert T. Rozbicki , Dane Thomas Gillaspie , Todd William Martin , Anshu A. Pradhan , Ronald M. Parker
IPC: G02F1/153
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
-
-
-
-
-
-
-
-
-
Search Results
34
records
(took 0.036 seconds)
