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公开(公告)号：EP1739403A1
公开(公告)日：2007-01-03
申请号：EP06076084.0
申请日：2003-10-09
Applicant: ILLINOIS TOOL WORKS INC.
Inventor： Hayford, Paul D. , Long, David W.
IPC: G01N3/02
CPC classification number: G01N21/01 , G01N3/02 , G01N2201/0233 , G01N2203/0017 , G01N2203/0025 , G01N2203/0238 , G01N2203/0242 , G01N2203/0647
Abstract: A method of monitoring the surface of a sample under test is provided and the method comprises the steps of:
illuminating the surface with light (20) polarised in a first direction;
viewing light reflected from the surface through a polarising filter (27) arranged at 90° to the first direction,
wherein the surface of the sample under test is provided with a marked area where diffuse reflection of the incident polarised light will occur in order to improve the contrast between the marked area and the surface of the sample under text.Abstract translation: 提供了一种监测待测样品表面的方法，该方法包括以下步骤：用在第一方向上极化的光（20）照射该表面; 从通过与第一方向成90°的偏振滤光器（27）观察从表面反射的光，其中被测试样品的表面设置有突出的区域，其中将出现入射偏振光的漫反射以便改善 文字标记区域与样品表面之间的对比度。
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22.发明公开VERFAHREN UND VORRICHTUNG ZUR UNTERDRÜCKUNG VON LICHTABSORPTION, LICHTSTREUUNG UND KONTAMINATION BEI WELLENLÄNGEN UNTERHALB VON 200NM 审中-公开方法和设备减少光的吸收，光的分布与污染波长低于200NM
公开(公告)号：EP1423679A2
公开(公告)日：2004-06-02
申请号：EP02779421.3
申请日：2002-09-25
Inventor： DUPARRE, Angela , GLIECH Stefan , NOTNI Gunther , STEINERT, Jörg
IPC: G01N21/15
CPC classification number: G01N21/15 , G01N21/211 , G01N2201/0233
Abstract: The invention relates to a method for reduction of gas-generated light absorption and light dispersion and/or contamination on using light at an applied wavelength of below 200nm in optical beam paths. The above is achieved, whereby the gases located in the beam path are at least partly evacuated to a sub-atmospheric pressure and simultaneously, or subsequently, a flushing gas is introduced into the beam path, whereby despite the introduction of said flushing gas, the sub-atmospheric pressure is retained and the total absorption in the beam path treated thus comprises at most 50 %.
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23.发明申请公开(公告)号：US20180372607A1
公开(公告)日：2018-12-27
申请号：US15527710
申请日：2015-11-19
Applicant: HACH LANGE GMBH
Inventor： MANFRED BATTEFELD , HANS-JOACHIM KUMPCH , AXEL LEYER , BAS DE HEIJ , CLEMENS HANSCHKE , MICHAEL KUEPPERS , ANDREAS JONAK , ELK FRICKE , HEINZ RUDDE , MARKUS HAHN , MARKUS LENHARD , ROLF UTHEMANN , SEBASTIAN MINKE , ANDREAS GOLITZ , BERND GASSNER , FRANK STEINHAUER , LOTHAR HEIDEMANNS , ANDREAS MITREITER
CPC classification number: G01N15/06 , G01N21/15 , G01N21/51 , G01N21/53 , G01N2015/0693 , G01N2021/157 , G01N2021/158 , G01N2201/0233 , G01N2201/0235 , G01N2201/0238
Abstract: A nephelometric turbidimeter for measuring a turbidity of a liquid sample in a transparent sample cuvette. The nephelometric turbidimeter includes a cuvette chamber housing with a cuvette chamber having the transparent sample cuvette arranged therein, and a drying apparatus. The drying apparatus includes a cuvette chamber inlet opening which vents the cuvette chamber, a cuvette chamber outlet opening which de-vents the cuvette chamber, an air circulator which circulates air from the cuvette chamber outlet opening to the cuvette chamber inlet opening, and a drying body. The drying body is provided as a container of a hygroscopic agent defined by a drying substance which is arranged in a drying path between the cuvette chamber outlet opening and the cuvette chamber inlet opening so that air flows through the drying body.
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24.发明授权Method and apparatus for measuring appearance and disappearance temperatures of wax for transparent, translucent and opaque oils 有权用于测量透明，半透明和不透明油的蜡的外观和消失温度的方法和装置公开(公告)号：US09354167B2
公开(公告)日：2016-05-31
申请号：US14507979
申请日：2014-10-07
Applicant: Vivian Hoi Nga Yuen , Edmund K H Woo , Gordon S Y Chiu
Inventor： Vivian Hoi Nga Yuen , Edmund K H Woo , Gordon S Y Chiu
CPC classification number: G01N21/51 , G01N15/1434 , G01N15/1463 , G01N21/0332 , G01N21/15 , G01N21/84 , G01N25/02 , G01N33/2811 , G01N2015/0092 , G01N2021/151 , G01N2021/1761 , G01N2021/513 , G01N2201/0231 , G01N2201/0233
Abstract: An apparatus and method for the measurement of wax appearance temperature and wax disappearance temperature. The apparatus includes the following. The sample receptacle having a receptacle opening, including a bottom, at least one side and an open top. The sample receptacle including an inlet and an outlet for sample insertion and removal. The at least one side about the receptacle opening being light absorbing. The sample receptacle including a transparent cover mounted over the open top. The bottom of the receptacle opening having a reflective upper surface. A thermo device temperature change of the sample. A thermometer to register current temperature of the sample. A viewing chamber above the transparent cover, where the viewing chamber is surrounded by material that is light absorbing. A light emitting device to project light through the viewing chamber and the transparent cover.
Abstract translation: 用于测量蜡外观温度和蜡消失温度的装置和方法。 该装置包括以下装置。 样品容器具有容器开口，包括底部，至少一侧和敞开的顶部。 样品容器包括用于样品插入和取出的入口和出口。 围绕容器开口的至少一侧是光吸收。 样品容器包括安装在开口顶部上的透明盖。 容器开口的底部具有反射的上表面。 样品的热敏元件温度变化。 用于记录样品当前温度的温度计。 在透明盖上方的观察室，其中观察室由吸光材料包围。 一种用于通过观察室和透明盖突出光的发光装置。
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25.发明授权公开(公告)号：US08220291B2
公开(公告)日：2012-07-17
申请号：US12063311
申请日：2006-08-09
Applicant: Nicolas Docquier
Inventor： Nicolas Docquier
CPC classification number: G01N21/3504 , C03B18/20 , C03B18/22 , G01N21/15 , G01N2021/151 , G01N2021/3513 , G01N2201/0231 , G01N2201/0233
Abstract: The invention relates to a method for controlling flat glass forming by flowing a molten glass over a liquid tin layer contained in a forming vat wherein a forming characteristic quantity is measured above the glass surface during forming by means of beams generated by at least one absorption spectroscopy-based analyser, wherein the light beams generated by said analyser form a net above the glass surface. A device for carrying out the inventive method comprising an arm for supporting a vessel which comprises a retroreflecting means for receiving a light beam and transmitting it in an opposite direction parallel to an incident optical path is also disclosed.
Abstract translation: 本发明涉及一种用于通过使熔融玻璃流过包含在成形槽中的液体锡层上来控制平板玻璃形成的方法，其中在成形期间通过至少一个吸收光谱产生的光束在玻璃表面上测量成形特征量 其中由所述分析器产生的光束在玻璃表面上形成网。 还公开了一种用于实施本发明的方法的装置，其包括用于支撑容器的臂，该臂包括用于接收光束并沿与入射光路平行的相反方向透射的后向反射装置。
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Patent Agency Ranking
公开(公告)号：US20100201978A1
公开(公告)日：2010-08-12
申请号：US12450402
申请日：2008-03-24
Applicant: Masaru Hori , Hiroyuki Kano , Shoji Den
Inventor： Masaru Hori , Hiroyuki Kano , Shoji Den
IPC: G01N21/31
CPC classification number: H05H1/0025 , G01N21/15 , G01N21/3103 , G01N2021/158 , G01N2201/023 , G01N2201/0233 , G01N2201/061
Abstract: To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere.The light source of the invention includes a tubular casing 12; a cooling medium passage 30 for causing a cooling medium to flow therethrough, the passage being provided along the inner wall of the casing; a lens 50 provided at a tip end of the casing; a first electrode 44 and a second electrode 45 which are provided in the casing and before the lens so as to be vertical to the axis of the casing and parallel to each other; and an insulating spacer 46 provided between the first electrode and the second electrode. The light source further includes a hole 47 axially penetrating the center portions of the first electrode, the insulating spacer, and the second electrode; and an electric discharge gas passage for introducing an electric discharge gas, along the inner wall of the cooling medium passage, to the back surface of the lens so that the electric discharge gas is reflected by the lens and flows through the hole.
Abstract translation: 提供一种实现等离子体气氛的粒子密度的精确测定而不干扰等离子体气氛的状态的光源。 本发明的光源包括管状壳体12; 用于使冷却介质流过其中的冷却介质通道30，所述通道沿着所述壳体的内壁设置; 设置在所述壳体的前端的透镜50; 第一电极44和第二电极45，其设置在壳体内并且在透镜之前垂直于壳体的轴线并且彼此平行; 以及设置在第一电极和第二电极之间的绝缘间隔件46。 光源还包括轴向穿过第一电极，绝缘间隔物和第二电极的中心部分的孔47; 以及放电气体通道，用于沿着冷却介质通道的内壁将放电气体引导到透镜的背面，使得放电气体被透镜反射并流过孔。
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27.发明申请PURGE GAS FLOW CONTROL FOR HIGH-PRECISION FILM MEASUREMENTS USING ELLIPSOMETRY AND REFLECTOMETRY 有权用于高精度电泳测量的气体流量控制使用ELLIPSOMETRY和REFLECTOMETRY公开(公告)号：US20080180698A1
公开(公告)日：2008-07-31
申请号：US12019592
申请日：2008-01-24
Applicant: Hidong Kwak , Shankar Krishnan
Inventor： Hidong Kwak , Shankar Krishnan
CPC classification number: G01B11/0625 , G01B11/0633 , G01B11/0641 , G01J3/02 , G01J3/0224 , G01J3/0294 , G01J3/447 , G01N21/211 , G01N21/33 , G01N2021/213 , G01N2201/0233
Abstract: An optical method and system for measuring characteristics of a sample using a broadband metrology tool in a purge gas flow environment are disclosed. In the method a beam path for the metrology tool is purged with purge gas at a first flow rate. A surface of the sample is illuminated by a beam of source radiation having at least one wavelength component in a vacuum ultraviolet (VUV) range and/or at least one wavelength component in an ultraviolet-visible (UV-Vis) range. A flow rate of a purge gas is adjusted between the first flow rate for metrology measurements made when the source radiation is in the VUV spectral region and a second flow rate for metrology measurements made when the source radiation is in the UV-Vis spectral region. The system includes a light source, illumination optics, collection optics, detector, a purge gas source and a controller. The purge gas source is configured to supply a flow of purge gas to a beam path in the light source and/or illumination optics and/or sample and/or collection optics and/or detector. The controller is configured to control a flow rate of the purged gas flow in response to an output signal from the detector.
Abstract translation: 公开了一种用于在吹扫气体流动环境中使用宽带测量工具测量样品的特性的光学方法和系统。 在该方法中，用第一流量的吹扫气体吹扫计量工具的光束路径。 通过在紫外 - 可见（UV-Vis）范围内具有真空紫外（VUV）范围和/或至少一个波长分量的至少一个波长分量的源辐射束照射样品的表面。 当源辐射处于VUV光谱区域时进行的度量测量的第一流量和当源辐射处于UV-Vis光谱区域时进行度量测量的第二流量时，净化气体的流量被调节。 该系统包括光源，照明光学器件，收集光学器件，检测器，吹扫气体源和控制器。 吹扫气体源被配置为向光源和/或照明光学器件和/或样品和/或收集光学元件和/或检测器中的光束路径提供净化气体流。 控制器被配置为响应于来自检测器的输出信号来控制净化气体流量的流量。
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公开(公告)号：US07047819B2
公开(公告)日：2006-05-23
申请号：US10683072
申请日：2003-10-10
Applicant: Paul D. Hayford , David W. Long
Inventor： Paul D. Hayford , David W. Long
IPC: G01L1/24
CPC classification number: G01N21/01 , G01N3/02 , G01N2201/0233 , G01N2203/0017 , G01N2203/0025 , G01N2203/0238 , G01N2203/0242 , G01N2203/0647
Abstract: Test apparatus comprising means for holding a sample to be tested, means for altering the strain in the sample, an optical arrangement for monitoring the sample to be tested, and processing means for processing the signals resulting from the monitoring of the sample under test, wherein the environment between the optical arrangement and the sample under test is controlled, and wherein the sample to be tested is located in a position external to the controlled environment.
Abstract translation: 包括用于保持待测试样品的装置的测试装置，用于改变样品中的应变的装置，用于监测待测试样品的光学装置，以及用于处理由待测试样品监测产生的信号的处理装置，其中 控制光学布置和被测试样品之间的环境，并且其中待测试的样品位于受控环境外部的位置。
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公开(公告)号：US20040145724A1
公开(公告)日：2004-07-29
申请号：US10683072
申请日：2003-10-10
Inventor： Paul D. Hayford , David W. Long
IPC: G01B011/16
CPC classification number: G01N21/01 , G01N3/02 , G01N2201/0233 , G01N2203/0017 , G01N2203/0025 , G01N2203/0238 , G01N2203/0242 , G01N2203/0647
Abstract: Test apparatus comprising means for holding a sample to be tested, means for altering the strain in the sample, an optical arrangement for monitoring the sample to be tested, and processing means for processing the signals resulting from the monitoring of the sample under test, wherein the environment between the optical arrangement and the sample under test is controlled, and wherein the sample to be tested is located in a position external to the controlled environment.
Abstract translation: 包括用于保持待测试样品的装置的测试装置，用于改变样品中的应变的装置，用于监测待测试样品的光学装置，以及用于处理由待测试样品监测产生的信号的处理装置，其中 控制光学布置和被测试样品之间的环境，并且其中待测试的样品位于受控环境外部的位置。
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公开(公告)号：US5164603A
公开(公告)日：1992-11-17
申请号：US731038
申请日：1991-07-16
Applicant: Nile F. Hartman , James W. Larsen , Carl M. Verber
Inventor： Nile F. Hartman , James W. Larsen , Carl M. Verber
CPC classification number: G01N21/8901 , G01N2021/4711 , G01N2021/5961 , G01N2021/8627 , G01N2201/0233 , G01N2201/04 , G01N2201/1085
Abstract: An apparatus 10 for inspecting the surface of an object S moving in the direction of travel 23 relative to the apparatus comprises a modular sensing head assembly 11 including a plurality of sensing head modules 12, 13, each of which includes a number of sensing stations 16-21. Each sensing station includes a light source 77, 81, 84 for generating a line of light extending across substantially the width of the surface of the object and a plurality of optical detector means for detecting light scattered from the line of light by the surface of the object. The optical detectors are positioned and oriented to receive scattered light scattered along paths lying in detection planes which are perpendicular to each other and perpendicular to the surface of the object. Signal processing electronics are provided to convert the light received by the detectors into analog signals which are multiplexed, converted to digital signals, filtered and then compared to preselected thresholds to determine the existence of any defects in the surface.
Abstract translation: 用于检查在行进方向23相对于设备移动的物体S的表面的装置10包括：模块化感测头组件11，包括多个感测头模块12,13，每个检测头模块12,13包括多个感测站16 -21。 每个感测站包括用于产生延伸穿过物体表面的宽度的光线的光源77,81,84;以及多个光学检测器装置，用于检测从该光线的表面散射的光 目的。 光学检测器被定位和定向成接收沿着彼此垂直并且垂直于物体表面的检测平面中的路径散射的散射光。 提供信号处理电子设备以将由检测器接收的光转换成模拟信号，该模拟信号被多路复用，转换成数字信号，经过滤波，然后与预先选择的阈值进行比较，以确定表面存在任何缺陷。
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