公开(公告)号：US09224571B2

公开(公告)日：2015-12-29

申请号：US13825918

申请日：2011-09-26

Applicant: Junji Urakawa ,  Nobuhiro Terunuma ,  Toshikazu Takatomi

Inventor： Junji Urakawa ,  Nobuhiro Terunuma ,  Toshikazu Takatomi

IPC: H01J23/20 ,  H01J29/48 ,  H05H7/08 ,  H01J3/02 ,  H01J3/36 ,  H05G2/00

CPC classification number: H01J29/481 ,  H01J3/021 ,  H01J3/36 ,  H01J23/06 ,  H01J25/04 ,  H01J2237/0432 ,  H01J2237/04735 ,  H01J2237/062 ,  H01J2237/06333 ,  H05G2/00 ,  H05H7/08 ,  H05H2007/084

Abstract: A photocathode high-frequency electron-gun cavity apparatus of the present invention is provided with a high-frequency acceleration cavity (1), a photocathode (8, 15), a laser entering port (9), a high-frequency power input coupler port (10), and a high-frequency resonant tuner (16). Here, the apparatus adopts an ultra-small high-frequency accelerator cavity which contains a cavity cell formed only with a smooth and curved surface at an inner face thereof without having a sharp angle part for preventing discharging, obtaining higher strength of high-frequency electric field, and improving high-frequency resonance stability. Further, the photocathode is arranged at an end part of a half cell (5) of the high-frequency acceleration cavity for maximizing electric field strength at the photocathode face, perpendicular incidence of laser is ensured by arranging a laser entering port at a position facing to the photocathode behind an electron beam extraction port of the high-frequency acceleration cavity for maximizing quality of short-bunch photoelectrons, and a high-frequency power input coupler port is arranged at a side part of the cell of the high-frequency acceleration cavity for enhancing high-frequency electric field strength. According to the above, it is possible to provide a small photocathode high-frequency electron-gun cavity apparatus capable of generating a high-strength and high-quality electron beam.

Abstract translation: 本发明的光电阴极高频电子枪腔装置设置有高频加速腔（1），光电阴极（8,15），激光进入口（9），高频电力输入耦合器 端口（10）和高频谐振调谐器（16）。 这里，该装置采用超小型高频加速器腔，其包含在其内表面上仅形成有平滑且曲面的空腔，而不具有用于防止放电的锐角部，从而获得较高强度的高频电 场，提高高频共振稳定性。 此外，光电阴极被布置在高频加速腔的半电池（5）的端部，用于使光电阴极面的电场强度最大化，通过将激光进入端口布置在面对的位置来确保激光的垂直入射 到高频加速腔的电子束提取口后面的光电阴极，用于使短束光电子的质量最大化，并且高频电力输入耦合器端口布置在高频加速腔的单元的侧面 用于提高高频电场强度。 根据上述，可以提供能够产生高强度和高质量电子束的小型光电阴极高频电子枪腔装置。

公开(公告)号：US08835848B2

公开(公告)日：2014-09-16

申请号：US14180350

申请日：2014-02-13

Applicant: Industry-University Cooperation Foundation Sunmoon University

Inventor： Tae Sik Oh ,  Ho Seob Kim ,  Dae Wook Kim ,  Seung-Joon Ahn

IPC: H01J29/46 ,  H01J3/36 ,  H01J3/14 ,  H01J3/26

CPC classification number: H01J3/26 ,  H01J3/021 ,  H01J3/12 ,  H01J3/14 ,  H01J3/18 ,  H01J3/30 ,  H01J37/04 ,  H01J2237/1205

Abstract: An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an extraction electrode causing the emission of electrons from the electron-emitting source, a focusing electrode to which voltage is flexibly applied in response to a working distance to a target for regulating a focusing force of electron beams emitted from the electron-emitting source, an acceleration electrode accelerating electrons emitted by the extraction electrode, a limit electrode regulating an amount and a size of electron beams using electrons accelerated by the acceleration electrode, and a deflector deflecting electron beams towards the target.

Abstract translation: 提供超小型电子光学微柱。 电子光学微柱包括使用场致发射原理发射电子的电子发射源，引起来自电子发射源的电子的引出电极，响应于工作距离而被柔性施加电压的聚焦电极 用于调节从电子发射源发射的电子束的聚焦力的目标，加速由引出电极发射的电子的加速电极，限制电极使用由加速电极加速的电子来调节电子束的量和尺寸，以及 偏转器偏转电子束朝向目标。

公开(公告)号：US20120200613A1

公开(公告)日：2012-08-09

申请号：US13500312

申请日：2010-02-23

Applicant: Masakazu Sagawa ,  Shin Imamura ,  Toshiaki Kusunoki

Inventor： Masakazu Sagawa ,  Shin Imamura ,  Toshiaki Kusunoki

IPC: G09G5/10 ,  H01J3/36 ,  H01J63/04

CPC classification number: H01J17/00 ,  H01J11/22 ,  H01J11/34 ,  H01J11/50 ,  H01J17/04 ,  H01J17/066 ,  H01J17/20 ,  H01J17/49 ,  H01J61/16 ,  H01J65/04

Abstract: To obtain effective luminance and light efficiency while avoiding discharge, it is necessary to sufficiently increase a current luminous efficiency of gas and an electron emission efficiency of an electron source. In a fluorescent lamp, an anode electric field is increased by setting a pressure of a noble gas or a molecular gas enclosed to 10 kPa or higher, setting an anode voltage to 240 V or lower, and setting a substrate distance to 0.4 mm or smaller. Furthermore, the resulting effect that the current luminous efficiency is increased in proportion to the electric field is used. Also, by applying a MIM electron source having an electron emission efficiency exceeding 10% as an electron source, a non-discharge fluorescent lamp having a light emission luminance equal to or larger than 104 [cd/m2] and a light emission efficiency equal to or larger than 120 [lm/W] is achieved.

Abstract translation: 为了在避免放电的同时获得有效的亮度和光效率，必须充分提高气体的电流发光效率和电子源的电子发射效率。 在荧光灯中，通过将惰性气体或分子气体的压力设定为10kPa以上，将阳极电压设定为240V以下，将基板的距离设定为0.4mm以下，来增大阳极电场 。 此外，使用与电场成比例地增加当前发光效率的结果。 此外，通过应用电子发射效率超过10％的MIM电子源作为电子源，具有等于或大于104 [cd / m 2]的发光亮度和等于或等于的发光效率的非放电荧光灯 或大于120 [lm / W]。

公开(公告)号：US08089050B2

公开(公告)日：2012-01-03

申请号：US12621689

申请日：2009-11-19

Applicant: Kenneth Harry Purser ,  William H. Park

Inventor： Kenneth Harry Purser ,  William H. Park

IPC: H01J3/36

CPC classification number: G21K1/093 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3171 ,  H01J2237/1405 ,  H01J2237/1534 ,  H01J2237/30477

Abstract: A ribbon-shaped ion beam is modified using multiple coil structures on a pair of opposed ferromagnetic bars. The coil structures comprise continuous windings which have predetermined variations along the length of the bar of turns per unit length. In an example, one coil structure may have uniform turns per unit length along the bar, so that energizing the coil structures forms a magnetic field component extending across the gap between the bars with a quadrupole intensity distribution. A second coil structure may have turns per unit length varying to produce a hexapole magnetic field intensity distribution. Further coil structures may be provided to produce octopole and decapole magnetic field distributions. The coil structures may be energized to produce magnetic fields parallel to the bars which vary along the length of the bars, to twist or flatten the ribbon-shaped beam.

Abstract translation: 在一对相对的铁磁条上使用多个线圈结构修改带状离子束。 线圈结构包括沿着每单位长度的匝数的长度具有预定变化的连续绕组。 在一个示例中，一个线圈结构可以具有沿着棒的每单位长度的均匀匝数，使得对线圈结构的通电形成一个以四极强度分布延伸穿过棒之间的间隙的磁场分量。 第二线圈结构可以具有每单位长度的转弯以产生六极磁场强度分布。 可以提供另外的线圈结构以产生八极和十极磁场分布。 线圈结构可以被激励以产生平行于棒的磁场，其沿着杆的长度变化，以扭曲或平坦化带形梁。

公开(公告)号：US20050285541A1

公开(公告)日：2005-12-29

申请号：US10875489

申请日：2004-06-23

Applicant: Robert LeChevalier

Inventor： Robert LeChevalier

IPC: G09G3/10 ,  H01J3/36 ,  H01J21/24

CPC classification number: H01J3/36 ,  H01J21/24

Abstract: RF field is sensed to produce an incoming voltage that drives a microarray of electron guns in a sweep pattern towards a detector array. The electron guns emit a beam current that may amplify the incoming voltage signal, and the detector material may be selected to amplify the beam current at the detector, for example, by avalanche and/or cascade in a Schottky material, to provide a low current, high gain amplification. The microarrays may be arranged in various combinations to produce successive amplifications, frequency multipliers, transmit-receive amplifiers, crossbar switches, mixers, beamformers, and selective polarization devices, among other such devices.

Abstract translation: RF场被感测以产生输入电压，其以扫描图案朝向检测器阵列驱动电子枪的微阵列。 电子枪发射可以放大输入电压信号的束电流，并且可以选择检测器材料以放大检测器处的​​电流，例如通过雪崩和/或级联在肖特基材料中以提供低电流 ，高增益放大。 可以以各种组合布置微阵列以产生连续的放大，倍频器，发射 - 接收放大器，交叉开关，混频器，波束形成器和选择性极化器件等。

公开(公告)号：US10971347B2

公开(公告)日：2021-04-06

申请号：US16306911

申请日：2016-06-23

Applicant: Hitachi High-Technologies Corporation

Inventor： Mitsuhiro Nakamura ,  Hironori Itabashi ,  Hirofumi Satou ,  Tsutomu Saito ,  Masahiro Sasajima ,  Natsuki Tsuno ,  Yohei Nakamura

IPC: H01J49/08 ,  H01J3/26 ,  H01J3/36 ,  H01J37/147 ,  H01J49/10

Abstract: In order to provide a charged particle beam apparatus capable of stably detecting secondary particles and electromagnetic waves even for a non-conductive sample under high vacuum environment and enabling excellent observation and analysis, the charged particle beam apparatus includes a charged particle gun (12), scanning deflectors (17 and 18) configured to scan a charged particle beam (20) emitted from the charged particle gun (12) onto a sample (21), detectors (40 and 41) configured to detect a scanning control voltage input from an outside into the scanning deflectors, an arithmetic unit (42) configured to calculate, based on the detected scanning control voltage, irradiation pixel coordinates for the charged particle beam; and an irradiation controller (45) configured to control irradiation of the sample with the charged particle beam according to the irradiation pixel coordinates.

公开(公告)号：US20210020422A1

公开(公告)日：2021-01-21

申请号：US16306911

申请日：2016-06-23

Applicant: Hitachi High-Technologies Corporation

Inventor： Mitsuhiro NAKAMURA ,  Hironori ITABASHI ,  Hirofumi SATOU ,  Tsutomu SAITO ,  Masahiro SASAJIMA ,  Natsuki TSUNO ,  Yohei NAKAMURA

IPC: H01J49/08 ,  H01J37/147 ,  H01J49/10 ,  H01J3/36 ,  H01J3/26

Abstract: In order to provide a charged particle beam apparatus capable of stably detecting secondary particles and electromagnetic waves even for a non-conductive sample under high vacuum environment and enabling excellent observation and analysis, the charged particle beam apparatus includes a charged particle gun (12), scanning deflectors (17 and 18) configured to scan a charged particle beam (20) emitted from the charged particle gun (12) onto a sample (21), detectors (40 and 41) configured to detect a scanning control voltage input from an outside into the scanning deflectors, an arithmetic unit (42) configured to calculate, based on the detected scanning control voltage, irradiation pixel coordinates for the charged particle beam; and an irradiation controller (45) configured to control irradiation of the sample with the charged particle beam according to the irradiation pixel coordinates.

公开(公告)号：US20190355561A1

公开(公告)日：2019-11-21

申请号：US16406008

申请日：2019-05-08

Applicant: Kristin Cortella Sampayan

Inventor： Kristin Cortella Sampayan

IPC: H01J40/06 ,  H01J3/36

Abstract: An electron source system utilizing photon enhanced thermionic emission to create a source of well controlled electrons for injection into a series of lenses so that the beam can be fashioned to meet the particular specification for a given use is disclosed. Because of the recent increased understanding and characterization of the bandgap in certain materials, a simplified system can now be realized to overcome the potential barrier at the surface. With this system, only low electric fields with moderate temperatures (˜500 ° C.) are required. The resulting system enables much easier focusing of the electron beam because the random component of the energy of the electrons is much lower than that of a conventional system. The system comprises an emitter of wide bandgap material, a first light source and a heating element wherein the heating element provides moderate warming to the wide bandgap material and the light source provides photonic excitation to the material, causing electrons to be emitted into an optical system to manipulate the emitted electrons.

公开(公告)号：US09515483B2

公开(公告)日：2016-12-06

申请号：US13988936

申请日：2011-11-22

Applicant: Rainer Marquardt

Inventor： Rainer Marquardt

IPC: H02J1/00 ,  H01H33/59 ,  H02H3/087 ,  H01J3/36

CPC classification number: H02J1/00 ,  H01H33/596 ,  H01J3/36 ,  H02H3/087 ,  H02J3/36 ,  Y02E60/60

Abstract: Switching and switchover devices for DC networks make it possible to realize, particularly in the event of faults, rapid and reliable switching processes in combination with good overvoltage damping and low energy losses during normal operation. The switching devices furthermore have short turn-off times and require no cooling since they have no on-state power losses during normal operation.

Abstract translation: 直流网络的切换和切换设备使得特别是在发生故障的情况下，可以实现快速可靠的切换过程以及良好的过压阻尼和正常运行期间的低能量损耗。 开关装置还具有短的关断时间，并且不需要冷却，因为它们在正常操作期间没有导通状态的功率损耗。

公开(公告)号：US4752714A

公开(公告)日：1988-06-21

申请号：US837912

申请日：1986-03-10

Applicant: John H. Sonneborn ,  Kenneth W. Hawken

Inventor： John H. Sonneborn ,  Kenneth W. Hawken

IPC: H01J29/80 ,  H01J1/46 ,  H01J3/36

CPC classification number: H01J29/803

Abstract: An electrostatic decelerating and scan expansion lens system (10) includes a mesh element (56) and operates in a cathode-ray tube (12) that incorporates a microchannel plate (24). The lens system is positioned downstream of the deflection structure (42 and 44) and provides linear magnification of the electron beam deflection angle. The mesh element is formed in the shape of a convex surface as viewed in the direction of travel of the electron beam (40) to provide a field with equipotential surfaces (100) of decreasing potential in the direction of electron beam travel. Secondary emission electrons generated by the mesh element as it intercepts the electron beam, are therefore, directed back toward the lens system and not toward the microchannel plate. Only the beam electrons strike the microchannel plate, which provides on the phosphorescent display (20) an image of high brightness, free from spurious light patterns.

Abstract translation: 静电减速和扫描扩展透镜系统（10）包括网状元件（56）并且在包括微通道板（24）的阴极射线管（12）中操作。 透镜系统位于偏转结构（42和44）的下游，并提供电子束偏转角的线性放大率。 网状元件形成为从电子束（40）的行进方向观察的凸面的形状，以提供具有电子束行进方向上的电位降低的等电位面（100）的场。 因此，当网状元件截取电子束时，二次发射电子被引导回到透镜系统而不是朝向微通道板。 仅电子束电子撞击微通道板，其在磷光显示器（20）上提供高亮度，无伪光图案的图像。