Abstract:
Known synthetic quartz glass tubes for the production of a preform have an inner bore with a surface layer produced without using tools in the molten state and an inner zone. The aim of the invention is to provide a tube which does not release any OH groups to the surroundings. For this purpose, the surface layer (30) has a thickness of 10 μm and an average OH content of not more than 5 ppm by weight and an average surface roughness Ra of not more than 0.1 μm. The inner zone (34) that starts on the surface layer (30) and terminates 10 μm before the outer wall has an average OH content of not more than 0.2 ppm by weight. A simple and inexpensive method for producing a quartz tube of the above type is to continuously draw a tube strand from a softened quartz glass mass in a vertical drawing process. A scavenging gas is circulated through the inner bore of the tube, said gas having a water content of less than 100 ppb per weight. The front end of the tube strand (19) is closed by a flow obstacle (26) that is permeable the scavenging gas and that reduces the amount of scavenging gas (23) flowing through.
Abstract:
Disclosed are high purity synthetic silica material having an internal transmission at 193 nm of at least 99.65%/cm and method of preparing such material. The material is also featured by a high compositional homogeneity in a plane transverse to the intended optical axis. The soot-to-glass process for making the material includes a step of consolidating the soot preform in the presence of H2O and/or O2.
Abstract translation:公开了具有193nm以上的内透射率为至少99.65%/ cm 3的高纯度合成二氧化硅材料及其制备方法。 该材料的特征还在于横向于预期光轴的平面中具有高的组成均匀性。 用于制造材料的烟灰对玻璃工艺包括在H 2 O 2和/或O 2 2的存在下固化烟灰预制件的步骤。
Abstract:
Optical waveguide fiber having low water peak as well as optical waveguide fiber preforms and methods of making optical waveguide fiber preforms from which low water peak and/or low hydrogen aged attenuation optical waveguide fibers are formed, including optical waveguide fiber and preforms made via OVD. The fibers may be hydrogen resistant, i.e. exhibit low hydrogen aged attenuation. A low water peak, hydrogen resistant optical waveguide fiber is disclosed which exhibits an optical attenuation at a wavelength of about 1383 nm which is less than or equal to an optical attenuation exhibited at a wavelength of about 1310 nm.
Abstract:
Disclosed is a synthetic silica glass for use with light having a wavelength of 150 to 200 nm, which has an OH group at a concentration of less than 1 ppm, an oxygen-excess type defect at a concentration of 1×1016 defects/cm3 or less, a hydrogen molecule at a concentration of less than 1×1017 molecules/cm3, and a non-bridging oxygen radical at a concentration of 1×1016 radicals/cm3 or less in the state after the synthetic silica glass is irradiated with light of a xenon excimer lamp having an energy density of 10 mW/cm2 and 3 kJ/cm2 or with light of an F2 laser by 107 pulses at an energy density of 10 mJ/cm2/pulse. The synthetic silica glass can exhibit excellent resistance to ultraviolet light with a wavelength of 150 to 190 nm when incorporated in a device using ultraviolet light with a wavelength of 150 to 190 nm as a light source.
Abstract translation:公开了一种合成石英玻璃,其用于波长为150至200nm的光,其具有浓度小于1ppm的OH基,浓度为1×10 16的氧过量型缺陷, SUP>缺陷/ cm 3以下,浓度小于1×10 17分子/ cm 3的氢分子, 在合成石英玻璃用具有能量密度的氙准分子灯的光照射之后的状态下,以1×10 16个/ cm 3以下的浓度桥接氧自由基 10mW / cm 2和3kJ / cm 2的光,或者具有10 2激光的光的10 / >脉冲,能量密度为10mJ / cm 2 /脉冲。 合成石英玻璃当掺入使用波长为150〜190nm的紫外光的装置中作为光源时,可以表现出优异的抗紫外线,波长为150〜190nm。
Abstract:
The present invention relates to a method for manufacturing a preform for optical fibres, wherein deposition of glass-forming compounds on the substrate takes place. The present invention furthermore relates to a method for manufacturing optical fibres, wherein one end of a solid preform is heated, after which an optical fibre is drawn from said heated end.
Abstract:
Methods of fabricating an optical fiber preform and a method of fabricating an optical fiber of the invention realize the fabrication of an optical fiber having desirable transmission characteristics in the entire wavelength rage of about 1.3 to 1.6 &mgr;m. The fabrication method comprises a porous core rod producing step of depositing a first cladding (3) having an outer diameter D so as to surround a core (2) having an outer diameter d to produce a porous core rod (1) of D/d≧4.0 by VAD. Then, the porous core rod (1) is dehydrated to reduce the OH group concentration to 0.8 ppb or less by weight ratio. The porous core rod (1) is formed to be transparent for a vitrified core rod (4) and is heated and stretched. Thereafter, a second cladding is obtained by depositing a second porous cladding (5) around the vitrified core rod (4) by VAD to be dehydrated, transparent and vitrified. The optical fiber preform thus fabricated is drawn to form into an optical fiber and is then allowed to stand in a deuterium gas atmosphere for a predetermined period.
Abstract:
A process for producing fluorine-containing glass. An SiO2 soot is synthesized by hydrolyzing SiCl4. The soot is heated in a chlorine-compound-free atmosphere containing a fluorine compound gas to form a fluorine-containing silica glass. The glass contains not more than 10 ppm OH group, not more than 10 ppm Cl, and not less than 1,000 ppm F. The concentration ratio of F/Cl is 10,000 or more.
Abstract:
The present invention relates to a method of making a soot particle and apparatus for making such soot particle. Preferably the method of making the soot particle is substantially free of the step of combusting a fuel and substantially free of the step of forming a plasma. Preferably, the apparatus is devoid of a heating element associated with both combustion and formation of a plasma. A preferred technique for at least one heating step for forming the doped soot particle is induction heating.
Abstract:
A method for manufacturing a fluorine-doped quartz glass article by sintering a porous glass preform moving in a heat zone in an atmosphere of a fluorine gas is disclosed, wherein a fluorine gas process is performed by setting a moving speed of the porous glass preform in the heat zone heated at 1000null C. or more in order that L/V is 40 minutes or more, where L is the length (mm) of a heater, and V is the moving speed (mm/min). The temperature of the heat zone may be vitrification temperature. The fluorine gas process may be performed in the heat zone which is at 1000null C. or more not to perform a vitrification process, and then the vitrification process maybe performed by increasing the temperature of the heat zone.
Abstract:
The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.