中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

485 records (took 0.028 seconds)

    PROCESS FOR MANUFACTURING GLASS
    313.
    发明公开
    PROCESS FOR MANUFACTURING GLASS 失效
    制造玻璃的工艺

    公开(公告)号：EP0258456A1

    公开(公告)日：1988-03-09

    申请号：EP87901657.4

    申请日：1987-02-27

    Applicant: JAPAN OXYGEN CO. LTD.

    Inventor： MORISHITA, Hiroshi ,  IMAYOSHI, Terukazu ,  KIKUCHI, Hitoshi ,  NAKAMURA, Akihiro

    IPC: C03B20/00 ,  C03C3/06 ,  C03C1/02

    CPC classification number: C03C3/06 ,  C03B20/00 ,  C03C2201/02 ,  C03C2203/10 ,  Y02P40/57 ,  Y10S65/08

    Abstract: process for manufacturing glass from silicon dioxide by vacuum melting, which comprises uniformly pre-heating a silicon dioxide powder containing a phase conversion promoter to about 800°C. filling it in a vessel while substantially keeping that temperature, re-heating it to form a sintered molding having a cristobalite crystal phase, and heat-melting the molding in vacuo to effect vitrification. This process makes it possible to increase the conversion of the starting material and the productivity by shortening the heating time, and nearly completely prevent formation of cracks on the surface of the sintered molding, thus suppressing the formation of defectives.

    Abstract translation: 通过真空熔化由二氧化硅制造玻璃的方法，其包括将含有相转化促进剂的二氧化硅粉末均匀预热至约800℃。 在基本上保持该温度的同时将其充入容器中，将其再加热以形成具有方石英结晶相的烧结模制品，并且在真空下加热熔化模制品以实现玻璃化。 通过该工序，能够缩短加热时间，提高原料的转化率和生产率，几乎完全防止烧结成型体表面产生裂纹，抑制不合格品的产生。

    Method for producing silica glass
    315.
    发明公开
    Method for producing silica glass 失效
    一种用于制备二氧化硅玻璃的过程。

    公开(公告)号：EP0032594A2

    公开(公告)日：1981-07-29

    申请号：EP80108254.6

    申请日：1980-12-30

    Applicant: Hitachi, Ltd.

    Inventor： Susa, Kenzo ,  Matsuyama, Iwao ,  Satoh, Shin ,  Suganuma, Tsuneo

    IPC: C03C3/06 ,  C03B37/025 ,  C03C13/00

    CPC classification number: C03B19/12 ,  C03B37/016 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/26 ,  C03C2203/50 ,  Y10S65/901

    Abstract: A method for producing silica glass wherein a dry silica gel subjected to a water desorption treatment and a carbon removal treatment is heated and has its temperature raised in an atmosphere containing chlorine, to perform a hydroxyl group removal treatment, the resultant silica gel is thereafter heated to a temperature of approximately 1,000-1,100°C in an atmosphere containing at least 1 % of oxygen, to perform a chlorine removal treatment, and the resultant silica gel is further heated do a temperature of 1,050-1,300` C in He or in vacuum, to perform a sintering treatment. The silica glass thus produced forms quite no bubble even when heated to high temperatures of or above 1300° C. Therefore, it is easy of working and it is free from the lowering of transparency attributed to the bubble formation.

    Method of manufacturing a synthetic quartz glass
    317.
    发明专利
    Method of manufacturing a synthetic quartz glass 有权

    公开(公告)号：JP5299477B2

    公开(公告)日：2013-09-25

    申请号：JP2011127685

    申请日：2011-06-07

    Applicant: 株式会社ニコン

    Inventor： 昭司 矢島 ,  弘之 平岩 ,  安司 石田

    IPC: C03B20/00 ,  C03B8/04 ,  C03B19/14 ,  C03B25/02 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00

    CPC classification number: C03B19/1484 ,  C03B19/1453 ,  C03B25/02 ,  C03B32/00 ,  C03C3/06 ,  C03C23/007 ,  C03C2201/02 ,  C03C2203/40 ,  C03C2203/52

    Abstract: A production method of synthetic silica glass according to the present invention comprises a first step of ejecting a silicon compound and a combustion gas containing oxygen and hydrogen from a burner to effect hydrolysis of the silicon compound in oxyhydrogen flame to produce fine particles of silica glass, and thereafter depositing and vitrifying the fine particles of silica glass on a target opposed to the burner to obtain a synthetic silica glass ingot; a second step of heating the synthetic silica glass ingot or the like obtained in the first step up to a first retention temperature of not less than 900 DEG C, retaining the ingot or the like at the first retention temperature, and cooling the ingot or the like at a temperature decrease rate of not more than 10 DEG C/h down to a temperature of not more than 500 DEG C; and a third step of heating the synthetic silica glass ingot or the like obtained in the second step up to a second retention temperature of not less than 500 DEG C nor more than 1100 DEG C, retaining the ingot or the like thereat, and thereafter cooling the ingot or the like at a temperature decrease rate of not less than 50 DEG C/h down to a temperature 100 DEG C lower than the second retention temperature.

    Synthetic amorphous silica powder and method for producing the same
    319.
    发明专利
    Synthetic amorphous silica powder and method for producing the same 审中-公开
    合成无定形二氧化硅粉及其制造方法

    公开(公告)号：JP2011157259A

    公开(公告)日：2011-08-18

    申请号：JP2010262517

    申请日：2010-11-25

    Applicant: Mitsubishi Materials Corp ,  三菱マテリアル株式会社

    Inventor： UEDA TOSHIAKI

    IPC: C01B33/18

    CPC classification number: C01B33/181 ,  C01B33/14 ,  C01P2002/02 ,  C01P2002/82 ,  C01P2004/03 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2006/12 ,  C03B19/1025 ,  C03B19/1065 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/10 ,  C03C2203/27 ,  Y10T428/2982

    Abstract: PROBLEM TO BE SOLVED: To provide synthetic amorphous silica powder suitable for raw material for producing a synthetic silica glass product in which bubbles are little generated or little expanded even when the glass product is used in a high temperature and reduced pressure environment, and to provide a method for producing the synthetic amorphous silica powder. SOLUTION: The synthetic amorphous silica powder is obtained by subjecting a granulated silica powder to spheroidizing treatment and then cleaning and drying the resulting silica powder, and has an average particle diameter D 50 of 10 to 2,000 μm. The synthetic amorphous silica powder is characterized by having a value, which is obtained by dividing the BET specific surface area by the theoretical specific surface area as calculated from the average particle diameter D 50 , of 1.00 to 1.35, true density of 2.10 to 2.20 g/cm 3 , and intragranular porosity of 0 to 0.05, a circularity of 0.75 to 1.00, and a spheroidization ratio of 0.55 to 1.00. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供合适的无定形二氧化硅粉末，其适用于制造即使在玻璃制品在高温和减压环境中使用时几乎没有产生气泡或很少膨胀的合成二氧化硅玻璃制品的原料， 并提供合成无定形二氧化硅粉末的制造方法。 解决方案：合成的无定形二氧化硅粉末通过使粒状二氧化硅粉末进行球化处理，然后清洗和干燥所得二氧化硅粉末而获得，平均粒径D 50 为10至2,000 微米。 合成无定形二氧化硅粉末的特征在于具有通过将BET比表面积除以平均粒径D 50 计算的理论比表面积为1.00至1.35得到的值， 2.10〜2.20g / cm 3真空密度，0〜0.05的晶内孔隙率，0.75〜1.00的圆形度，0.55〜1.00的球化比。 版权所有（C）2011，JPO＆INPIT

Patent Agency Ranking