公开(公告)号：US20030195107A1

公开(公告)日：2003-10-16

申请号：US10317068

申请日：2002-12-12

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

IPC: C03C010/16 ,  C03C003/112

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cmnull1 (I2250) to the scattering peak intensity of 800 cmnull1 (I800), i.e. I2250/I800, of at most 1null10null4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2null10null3 cmnull1.

Abstract translation: 一种用于光学用的合成石英玻璃，其用于通过在含有氟的紫外线区域至真空紫外线区域的范围内的光照射而使用，该散射峰强度比例为2250cm <上标> -1 >（I <下标> 2250 ）到800 cm <上标> -1>（I <下标> 800 ）的散射峰强度，即I <下标> 2250 / I 在激光拉曼光谱中，最多为1×10 <上标> -4>的<下标> 800 ，其吸光系数为245nm，最多为2×10 <上标> -3> cm -1>。

公开(公告)号：US06550277B1

公开(公告)日：2003-04-22

申请号：US09709168

申请日：2000-11-10

Applicant: Bruno Uebbing ,  Jan Vydra

Inventor： Bruno Uebbing ,  Jan Vydra

IPC: C03B1906

CPC classification number: C03C4/0085 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/075 ,  C03C3/06 ,  C03C2201/06 ,  C03C2201/08 ,  C03C2201/23 ,  C03C2203/40 ,  Y10S65/08 ,  Y10S65/16 ,  Y10S501/905

Abstract: The invention concerns a quartz glass body for an optical component for the transmission of UV radiation with a wavelength of 250 nm and less, especially for a wavelength of 157 nm, as well as a process for the manufacture of the quartz glass body where fine quartz glass particles are formed by flame hydrolysis of a silicon compound, deposited and vitrified. Suitability of a quartz glass as represented by high base transmission and radiation resistance depends on structural properties caused by local stoichiometric deviations, and on the chemical composition. The quartz glass body according to the inventions is distinguished by a uniform base transmission (relative change of base transmission ≦1%) in the wavelength range from 155 nm to 250 nm (radiation penetration depth of 10 mm) of at least 80%, a low OH content (less than 10 ppm by weight) and a glass structure substantially free from oxygen defect centers. A quartz glass body of this kind is manufactured by a process which allows bulk embedding of hydrogen or oxygen into the glass network in that at least a two stage heat treatment takes place at temperatures ranging from 850° C. to 1600° C. before the vitrification, the last stage comprising sintering at a temperature between 1300° C. and 1600° C. in an atmosphere containing hydrogen or oxygen, or a nonflammable mixture of these substances.

Abstract translation: 本发明涉及一种用于传输波长为250nm以下，特别是波长为157nm的紫外线的光学部件的石英玻璃体，以及用于制造石英玻璃体的方法，其中精细的石英 通过硅化合物的火焰水解形成玻璃颗粒，沉积并玻璃化。 由高碱性透射和耐辐射性表示的石英玻璃的适用性取决于由局部化学计量偏差引起的结构特性以及化学成分。 根据本发明的石英玻璃体的特征在于在155nm至250nm（辐射穿透深度为10mm）的波长范围内的均匀的基底透射率（基底透射率的相对变化<= 1％）为至少80％ 低OH含量（小于10ppm重量）和基本上不含氧缺陷中心的玻璃结构。 这种石英玻璃体是通过允许将氢气或氧气大量嵌入玻璃网络的方法来制造的，因为至少在两个阶段之间的热处理在850℃至1600℃之间的温度下进行 玻璃化，最后阶段包括在含有氢气或氧气的气氛中在1300℃和1600℃之间的温度下烧结，或这些物质的不可燃混合物。

公开(公告)号：US06502426B2

公开(公告)日：2003-01-07

申请号：US09997782

申请日：2001-11-28

Applicant: Lisa A. Moore ,  Charlene M. Smith

Inventor： Lisa A. Moore ,  Charlene M. Smith

IPC: C03B3200

CPC classification number: G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  G03F1/60

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which contains doped O2 molecules and which exhibits very high transmittance and laser transmission durability in the vacuum ultraviolet (VUV) wavelength region. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm contains intersticial O2 molecules which provide improved endurance to laser exposure. Preferably the O2 doped silicon oxyfluoride glass is characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模衬底是含有掺杂的O 2分子并且在真空紫外（VUV）波长区域中显示非常高的透射率和激光透射耐久性的“干式”氟氧化硅玻璃。 除了含氟并且具有很少或不具有OH含量之外，本发明的适用于157nm的光掩模衬底的氟氧化硅玻璃含有间隔的O 2分子，其提供了对激光曝光的改善的耐久性。 优选地，掺杂氧的氟氧化硅玻璃的特征在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US06477305B1

公开(公告)日：2002-11-05

申请号：US09547598

申请日：2000-04-11

Applicant: George E. Berkey ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Cynthia B. Giroux ,  Daniel W. Hawtof ,  Dale R. Powers ,  V. Srikant

Inventor： George E. Berkey ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Cynthia B. Giroux ,  Daniel W. Hawtof ,  Dale R. Powers ,  V. Srikant

IPC: G02B602

CPC classification number: C03B37/01486 ,  C03B37/0124 ,  C03B37/01446 ,  C03B37/01473 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2201/31 ,  C03C3/06 ,  C03C13/047 ,  C03C2201/22 ,  C03C2203/54 ,  G02B6/02

Abstract: A cylindrical glass body having a low water content centerline region and method of manufacturing such a cylindrical glass body for use in the manufacture of optical waveguide fiber is disclosed. The centerline region of the cylindrical glass body has a water content sufficiently low such that an optical waveguide fiber made from the cylindrical glass body of the present invention exhibits an optical attenuation of less than about 0.35 dB/km, and preferably less than about 0.31 dB/km at a measured wavelength of 1380 nm. A low water content plug used in the manufacture of such a cylindrical glass body, an optical waveguide fiber having a low water peak, and an optical fiber communication system incorporating such an optical waveguide fiber is also disclosed.

Abstract translation: 公开了一种具有低含水率中心线区域的圆柱形玻璃体及其制造用于制造光波导纤维的圆柱形玻璃体的方法。 圆柱形玻璃体的中心线区域的水含量足够低，使得由本发明的圆柱形玻璃体制成的光波导纤维的光衰减小于约0.35dB / km，优选小于约0.31dB / km，测量波长为1380 nm。 还公开了用于制造这种圆柱形玻璃体的低含水量塞子，具有低水峰的光波导纤维和包含这种光波导纤维的光纤通信系统。

公开(公告)号：US06376401B1

公开(公告)日：2002-04-23

申请号：US09387773

申请日：1999-09-01

Applicant: Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

Inventor： Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

IPC: C03B2000

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2203/44

Abstract: A synthetic silica glass having a high transmittance for vacuum ultraviolet rays, for example F2 excimer laser beam with a wavelength of 157 nm, a high uniformity and a high durability and useful for ultraviolet ray-transparent optical glass materials is produced from a high-purity silicon compound, for example silicon tetrachloride, by heat treating an accumulated porous silica material at a temperature not high enough to convert the porous silica material to a transparent silica glass in an inert gas atmosphere for a time sufficient to cause the OH groups to be condensed and removed from the glass, and exhibits substantially no content of impurities other than OH group a difference between highest and lowest fictional temperatures of 50° C. or less and a transmittance of 157 nm ultraviolet rays through a 10 mm optical path of 60% or more, and optically a OH group content of 1 to 70 ppm, a Cl content less than 1 ppm, a total content of impurity metals of 50 ppb or less, a content of each individual impurity metal less than 10 ppb, and an ultraviolet ray-transmittance at 172 to 200 nm of 40% or more even after the glass is exposed to an irradiation of ultraviolet rays at 160 to 300 nm for one hour.

Abstract translation: 对于真空紫外线具有高透射率的合成二氧化硅玻璃，例如波长为157nm的F2准分子激光束，高均匀性和高耐久性并且可用于紫外线透明光学玻璃材料由高纯度 硅化合物，例如四氯化硅，通过在不足够高的温度下热处理积聚的多孔二氧化硅材料，以在惰性气体气氛中将多孔二氧化硅材料转化为透明的石英玻璃足以使OH基团冷凝的时间 并且从玻璃中除去，并且基本上不含OH基团中的杂质含量，最高和最低虚构温度之间的差别为50℃或更低，通过10mm光路的157nm紫外线的透射率为60％或 更多地，光学地含有1至70ppm的OH基含量，小于1ppm的Cl含量，50ppb以下的杂质金属的总含量， 即使玻璃暴露于160〜300nm的紫外线照射1小时，每一种杂质金属小于10ppb，而在172〜200nm的紫外线透射率为40％以上。

公开(公告)号：US06265115B1

公开(公告)日：2001-07-24

申请号：US09397577

申请日：1999-09-16

Applicant: George Edward Berkey ,  Lisa Anne Moore ,  Charles Chunzhe Yu

Inventor： George Edward Berkey ,  Lisa Anne Moore ,  Charles Chunzhe Yu

IPC: G03F900

CPC classification number: C03C4/0085 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/02 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/32 ,  C03B2207/52 ,  C03B2207/54 ,  C03B2207/66 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  G03F1/60

Abstract: The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.

Abstract translation: 本发明包括制造光刻光掩模坯料的方法。 本发明还包括光刻光掩模坯料和用于生产光刻光掩模的预成型件。 制造光刻光掩模坯料的方法包括提供烟灰沉积表面，产生SiO 2烟灰颗粒并将SiO 2烟灰颗粒投射到烟灰沉积表面。 该方法包括在沉积表面上依次沉积SiO 2烟灰颗粒的层，以形成由SiO 2烟灰颗粒的连续层组成的粘结SiO 2多孔玻璃预制体，并使相干的SiO 2玻璃预制体脱水以从预成型体中去除OH。 将SiO 2暴露于含氟化合物并与其反应，并固化成具有平行的条纹层的无孔氟氧化硅玻璃体。 该方法还包括将固化的氟氧化硅玻璃体形成为具有平坦表面的光掩模坯料，其中条纹层的取向平行于光掩模坯料平面。

公开(公告)号：US6143676A

公开(公告)日：2000-11-07

申请号：US214894

申请日：1999-01-14

Applicant: Norio Ohashi ,  Michiyo Kuriyama ,  Shigeru Yamagata ,  Shigemasa Sunada

Inventor： Norio Ohashi ,  Michiyo Kuriyama ,  Shigeru Yamagata ,  Shigemasa Sunada

IPC: C03B19/14 ,  C03B23/047 ,  C03B32/00 ,  C03C3/06 ,  C03B9/10 ,  G02B1/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B23/047 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/52

Abstract: An object of the present invention is to provide a synthetic silica glass optical material which exhibits excellent transmittance as well as durability for high output power vacuum ultraviolet rays, being emitted from, for example, ArF excimer lasers and Xe.sub.2 excimer lamps, and to provide a method for producing the same. A synthetic silica glass optical material for high output power vacuum ultraviolet rays made from ultra high purity synthetic silica glass for use in the wavelength region of from 165 to 195 nm, containing OH groups at a concentration of from 5 to 300 wtppm with a fluctuation width in OH group concentration (.DELTA.OH/cm) of 10 wtppm or less, containing hydrogen molecules at a concentration of from 1.times.10.sup.17 to 1.times.10.sup.19 molecule/cm.sup.3 with a fluctuation width in hydrogen molecule concentration (.DELTA.H.sub.2 /cm) of 1.times.10.sup.17 molecule/cm.sup.3 or lower, and containing chlorine at a concentration of 50 wtppm or lower. Also claimed is a method for producing the same.

Abstract translation: PCT No.PCT / EP98 / 02965 Sec。 371日期1999年1月14日第 102（e）日期1999年1月14日PCT提交1998年5月20日PCT公布。 第WO98 / 52879号公报 日期：1998年11月26日本发明的目的是提供一种合成石英玻璃光学材料，其表现出优异的透射率以及从例如ArF准分子激光器和Xe2准分子灯发射的高输出功率真空紫外线的耐久性 并提供其制造方法。 一种用于高浓度合成石英玻璃的高输出功率真空紫外线的合成二氧化硅玻璃光学材料，用于波长范围为165至195nm的OH基，其浓度为5至300重量ppm，具有波动宽度 OH分子浓度（DELTA OH / cm）为10重量ppm以下，含有浓度为1×10 17〜1×10 19分子/ cm 3的氢分子，氢分子浓度的波动宽度（DELTA H2 / cm）为1×10 17分子/ cm 3， 较低，含有浓度为50重量ppm以下的氯。 还要求保护其的方法。

公开(公告)号：US6131415A

公开(公告)日：2000-10-17

申请号：US879348

申请日：1997-06-20

Applicant: Kai Huei Chang ,  David Kalish ,  Thomas John Miller ,  Michael L. Pearsall

Inventor： Kai Huei Chang ,  David Kalish ,  Thomas John Miller ,  Michael L. Pearsall

IPC: G02B6/00 ,  C03B37/012 ,  C03B37/014 ,  C03C25/10 ,  C03C25/12 ,  G02B6/02 ,  G02B6/036 ,  C03B37/027

CPC classification number: C03B37/01211 ,  C03B37/01228 ,  C03B37/01237 ,  C03B37/01248 ,  C03B37/01446 ,  C03C25/106 ,  C03C25/12 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/31 ,  C03B2203/24 ,  G02B6/02 ,  Y02P40/57

Abstract: A singlemode optical fiber 700 having very low loss at 1385 nm, and a practical method for making same are disclosed. A core rod 20 is fabricated using vapor axial deposition to have a deposited cladding/core ratio (D/d) that is less than 7.5. The core rod is dehydrated in a chlorine- or fluorine-containing atmosphere at about 1200.degree. C. to reduce the amount of OH present to less than 0.8 parts per billion by weight, and then consolidated in a helium atmosphere at about 1500.degree. C. to convert the porous soot body into a glass. The consolidated core rod is elongated using an oxygen-hydrogen torch that creates a layer of OH ions on the surface of the rod that are largely removed by plasma etching. Finally, the core rod is installed in a glass tube 40 having a suitably low OH content. Thereafter, the tube is collapsed onto the rod to create a preform 60. Conventional methods are employed for drawing an optical fiber from the preform and applying one or more protective coatings 75, 76. The disclosed method is suitable for commercial production of low-OH fiber. Significantly, the fiber's loss at 1385 nm is reduced to a level that is less than its loss at 1310 nm, thereby rendering the entire wavelength region 1200-1600 nm suitable for optical transmission. In particular, wave-division-multiplex systems are now available to transmit optical signals over distances greater than 10 km in the wavelength region between 1360 nm and 1430 nm.

Abstract translation: 公开了在1385nm具有非常低的损耗的单模光纤700及其制造方法。 使用蒸汽轴向沉积制造芯棒20以具有小于7.5的沉积包层/芯部比（D / d）。 芯棒在约1200℃的含氯或含氟气氛中脱水，以将OH的存在量减少到小于0.8重量％，然后在约1500℃的氦气氛中固结。 将多孔烟炱体转化为玻璃。 使用氧 - 氢焰炬拉长固结的芯棒，其在杆的表面上产生通过等离子体蚀刻大量去除的OH离子层。 最后，将芯棒安装在具有适当低的OH含量的玻璃管40中。 此后，管被折叠到杆上以产生预制件60.采用常规方法从预成型件拉制光纤并施加一个或多个保护涂层75,76。所公开的方法适用于低OH的商业生产 纤维。 值得注意的是，1385nm处的光纤损耗降低到1310nm以下的损耗，从而使整个波长范围为1200-1600nm，适合于光传输。 特别地，波分复用系统现在可用于在1360nm和1430nm之间的波长区域中发射超过10km的距离的光信号。

公开(公告)号：US5790736A

公开(公告)日：1998-08-04

申请号：US598925

申请日：1996-02-09

Applicant: Heinz Fabian

Inventor： Heinz Fabian

IPC: G02B6/00 ,  C03B37/023 ,  C03B37/027 ,  C03C13/04 ,  G02B1/00 ,  G02B6/02 ,  G02B6/036

CPC classification number: C03B37/027 ,  G02B6/02 ,  C03B2201/075 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/32 ,  C03B2203/224

Abstract: In an optical component having a cylindrical core of quartz glass and a coaxial jacket of quartz glass containing a dopant which decreases the index of refraction, the jacket glass contains a viscosity-increasing stiffening agent to reduce tensile strength on the core at drawing temperature of 1000.degree. to 2500.degree. C. or a relaxation agent for lowering the viscosity of the quartz glass in a concentration which is lower than that present in the core glass.

Abstract translation: 在具有石英玻璃的圆柱形芯和含有掺杂剂的同轴套管的光学部件中，该玻璃包含降低折射率的掺杂剂，夹套玻璃含有增粘硬化剂，以在拉伸温度为1000℃时降低芯上的拉伸强度 DEG至2500℃或用于降低石英玻璃的粘度的松弛剂，其浓度低于芯玻璃中存在的浓度。

公开(公告)号：US5364428A

公开(公告)日：1994-11-15

申请号：US203750

申请日：1994-03-01

Applicant: Michihisa Kyoto ,  Yoichi Ishiguro ,  Akira Urano ,  Hideo Kakuzen

Inventor： Michihisa Kyoto ,  Yoichi Ishiguro ,  Akira Urano ,  Hideo Kakuzen

IPC: C03B37/014 ,  C03B37/023

CPC classification number: C03B37/01446 ,  C03B37/0146 ,  C03B2201/075 ,  C03B2201/12 ,  Y10S65/16 ,  Y10S65/90

Abstract: A glass preform which is used for fabricating an optical fiber, has substantially no bubbles therein and contains sufficient amount of fluorine is produced by a method comprising steps of: forming a porous glass soot body from a glass-forming raw material, removing trapped gas and water from pores of the soot body by heating the soot body under pressure lower than several ten Torr. at a temperature at which the soot body is not vitrified, filling the pores of the soot body with a gas containing SiF.sub.4 and uniformly adding fluorine to the soot body, vitrifying the fluorine-added soot body into a transparent glass body, boring said transparent glass body to form a bore therein, and inserting a highly pure quartz rod in said bore to form a glass preform, or a method forming a glass soot composite body having a core portion consisting of a solid glass and a peripheral portion consisting of a porous glass mass, removing trapped gas and water from pores of the soot composite body by heating the soot composite body under a pressure lower than several ten Torr. at a temperature at which the porous glass mass is not vitrified, filling the pores in the porous glass mass of the soot composite body with a gas containing SiF.sub.4 and uniformly adding fluorine to the soot glass mass, and vitrifying the fluorine-added soot glass mass into a transparent glass mass to form a glass preform.

Abstract translation: 用于制造光纤的玻璃预成型体在其中基本上没有气泡并且通过包括以下步骤的方法制造含有足够量的氟：从玻璃形成原料形成多孔玻璃烟炱体，除去被捕获的气体和 通过在低于几十乇的压力下加热烟灰体，从烟灰体的孔中吸收水分。 在烟灰体未被玻璃化的温度下，用含有SiF 4的气体填充烟灰体的孔，并将氟均匀地添加到烟炱体中，将氟化烟炱体玻璃化成透明玻璃体，使透明玻璃镗孔 在其中形成孔，并且将高纯石英棒插入所述孔中以形成玻璃预制件，或者形成玻璃烟灰复合体的方法，所述玻璃烟灰复合体具有由实心玻璃构成的芯部和由多孔玻璃构成的周边部 通过在低于几十乇的压力下加热烟灰复合体，从烟灰复合体的孔中除去捕获的气体和水。 在多孔玻璃体未被玻璃化的温度下，用含有SiF 4的气体填充烟灰复合体的多孔玻璃块中的孔，并向烟灰玻璃块均匀地加入氟，并且将添加氟的烟灰玻璃块 变成透明玻璃块以形成玻璃预制件。