Abstract:
PURPOSE: A deposition device and method for manufacturing organic light emitting element using the same are provided to improve the deposition property and deposition film uniformity by using a vacuum deposition method. CONSTITUTION: A deposition device comprises a base(101), a thermal insulating layer(102), a heating layer(103) and a partition wall(104). The thermal insulating layer is formed on the base. A heating layer is formed on the thermal insulating layer as stripe pattern in order to heat the depositing target material. The partition wall is formed on the thermal insulating layer and performs patterning the space which can arrange the depositing material on the heating layer. The thermal insulating layer comprises one selected from the group consisting of ZrO2, SiO2 and Al2O3. The thermal insulating layer is formed on the surface of which the base faces to the heating layer. The heating layer has a plurality of stripe patterns.
Abstract:
PURPOSE: A thin film deposition apparatus having a deposition mask is provided to minimize the phenomenon that the deposition material is deposited on a non-deposition area of a substrate by installing a deposition mask on an interval. CONSTITUTION: A first nozzle(120) is installed in front of an evaporation source(110). A first blocking assembly(130) is installed in front of the first nozzle. A second blocking assembly(140) is installed in front of the first blocking assembly. A second nozzle(150) is installed in front of the second blocking assembly. A substrate(160) is installed in front of the second nozzle.
Abstract:
PURPOSE: A method for cleaning an organic and a cleaning system are provided to increase the preventive maintenance cycle of a deposition process by cleaning a mask while an organic deposition process is implemented. CONSTITUTION: A mask and a substrate are arranged in a deposition chamber(a1). An organic deposition process with respect to the substrate is repeatedly implemented(a2). The mask is transferred to a stock chamber. An organic accumulated on the mask is cleaned in the stock chamber(b). A scanning process is implemented along the boundary of a slot formed in the mask(c).
Abstract:
PURPOSE: An apparatus for thin layer deposition is provided to improve the recycling ratio of deposition material by easily implementing the recycling work of deposition material by separating a first shielding wall from a second shielding wall assembly and a second nozzle. CONSTITUTION: A first nozzle(120) is arranged on a side facing a substrate(160) in an evaporation source(110). A second nozzle(150) is arranged to face the evaporation source. A first shielding assembly(130) comprising a first shielding wall(131) is arranged on one side of the first nozzle. A second shielding wall assembly(140) comprising a second shielding wall(141) is arranged on one side of the first shielding wall assembly.
Abstract:
본 발명은 유기물 패턴을 증착하는 유기물 증착 공정에 사용되는 마스크의 세정 주기를 늘림으로써, 증착 공정의 PM 주기를 늘릴 수 있는 유기물 세정 방법 및 세정 시스템을 제공하는 것을 목적으로 한다. 본 발명의 일 측면은, 기판에 유기물 패턴을 증착하는데 사용되는 마스크의 표면에 축적된 유기물을 세정하는 방법으로서, (a) 증착원이 구비된 증착 챔버에서 복수 개의 슬롯이 구비된 마스크를 이용하여 상기 기판에 유기물 패턴을 증착하는 단계; (b) 상기 증착 챔버와 인접하며 진공이 유지되는 스톡 챔버로 상기 마스크를 이송하는 단계; 및 (c) 상기 스톡 챔버에서 상기 마스크에 구비된 슬롯의 경계면을 따라 상기 슬롯의 경계면에 축적된 유기물을 부분 세정하는 단계;를 포함하는 유기물 세정 방법을 제공한다.
Abstract:
유기 발광 소자가 형성된 제1 기판과, 제1 기판에 합착되는 제2 기판을 포함하는 유기 발광 표시 장치의 제조 장치에 있어서, 제1 기판 및 제2 기판 중 적어도 하나의 기판에 장착되어, 적어도 하나의 기판과의 사이에 밀폐 공간을 형성하는 캐비티 부재와, 캐비티 부재에 연결되어 밀폐 공간의 압력을 조절하는 압력 조절 부재를 포함한다.
Abstract:
PURPOSE: A mask frame assembly is provided to stably make a minute patterning using for a vapor deposition by preventing a wrinkle even if a mask is stretched and is fixed on a frame. CONSTITUTION: A mask frame assembly comprises a frame, a mask(10) and a tension applying unit(12). The mask equips a deposition pattern and is extendedly installed in the frame in a first direction(A). The tension applying unit is installed in the mask in order that the tension is acted to the first direction and the second direction. The tension applying unit adds a tension to the mask in the second direction(B) through the tension of first direction. The tension applying unit is a negative Poisson's ratio member.