Abstract:
본 발명은 탄성 중합체를 이용하여 유연 기판상에 무기물 태양전지를 전사시키는 공정으로 효율적인 태양전지의 제조가 가능하도록 한 유연 무기물 태양전지 및 그의 제조 방법에 관한 것으로, 그 구조는 유연 기판상에 형성된 후면 전극;상기 후면 전극 상에 형성되는 광흡수층;상기 광흡수층 상에 형성되는 완충층;상기 완충층 상에 형성된 n형 물질층 및 n형 물질층에 형성된 투명전극 및 상부 금속 전극층을 포함하는 것이다.
Abstract:
The present invention relates to a thin film solar cell having a current diffuse layer and a manufacturing method for the same and, specifically, to a thin film solar cell and a manufacturing method for the same to transmit a current to a second electrode using a current diffuse layer. The purpose of the present invention is to provide a structure with improved optical conversion efficiency by reducing resistance on a high resistance current path and effectively transmitting electron to the second electrode using the current diffuse layer in a manufacturing process for the thin film solar cell in order to resolve the problems of conventional techniques. [Reference numerals] (110) R_rear electrode;(130) R_absorption layer;(140) R_buffer layer;(150) R_window layer 1;(170) R_current diffusion layer
Abstract:
PURPOSE: A non-volatility resistance memory device is provided to secure the stable property of a thin film by using oxide semiconductor including four elements. CONSTITUTION: A lower electrode(120) is formed on a substrate. An oxide semiconductor thin film(130) including four elements is formed on the lower electrode. The oxide semiconductor thin film includes at least one metal selected among tantalum, hafnium, zirconium, titanium, vanadium, and yttrium. The oxide semiconductor thin film further includes a metal additive for electric conduction. An upper electrode(140) is formed on the oxide semiconductor thin film.
Abstract:
PURPOSE: A solar cell with an optical sensor to track the sun, a manufacturing method thereof, and a photovoltaic power generating system are provided to reduce manufacturing costs by including an optical sensor in a solar cell module. CONSTITUTION: A first electrode(200) is formed on a substrate. A light absorption layer(300) is formed on the first electrode. The light absorption layer and the first electrode are etched by an etching process. An etched part is formed by etching the first electrode and the light absorption layer to expose a part of the substrate. A buffer layer(400) is formed by a vacuum process and a solution process after the etching process. An optical sensor active layer(410) is formed on the etched part. An optical sensor electrode(510) is formed on the optical sensor active layer.