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公开(公告)号：KR1019910005305B1
公开(公告)日：1991-07-24
申请号：KR1019880017975
申请日：1988-12-30
Abstract: The apparatus is for auto fault detection of ultra red lamps used in system as a heat source. The apparatus includes relays connected to the lamps of each reactor in common, electronic switches providing common terminal to the lamps in each reactors, a SCR power converter for providing controlled power to the lamps, test relays for switching on the lamps in order to test the lamps, an ultra red ray sensor for detecting the on/off state of the lamps and a lamp on/off controlcircuit drived by 8-bit data comprises lamp selection bits (D0-D3), reactor selection bits (D4,D5), operating or tested mode selecting bit (D6) and watch dog bit (D7).
Abstract translation: 该装置用于系统中用作热源的超红灯的自动故障检测。 该装置包括连接到每个反应堆的灯的继电器，每个反应器的电子开关提供公共端子到每个反应器中的灯，用于向灯提供受控电力的SCR功率转换器，用于接通灯的测试继电器，以便测试 灯，用于检测灯的开/关状态的超红光传感器和由8位数据驱动的灯开/关控制电路包括灯选择位（D0-D3），电抗器选择位（D4，D5），操作 或测试模式选择位（D6）和看门狗位（D7）。
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公开(公告)号：KR1019900006259B1
公开(公告)日：1990-08-27
申请号：KR1019870014926
申请日：1987-12-24
Abstract: The vacuum system of photo CVD apparatus for forming a silicon insulating thin film, comprises: a vibration absorber (18) for relaxing a misalignment in piping, and absorbing a vibration generated by a vacuum pump (1); an U type pipe (19) for enlarging an effective pumping speed to reduce the pumping speed; a trap (21) for relaxing an abrupt variation of pressure and filtering a generating dust in the main exhaust pipe; an oil filter (17) for preventing a sub-generating and unreacting gas and oil from being dispersed; an oil filtration system (8) for preventing the oil from being contaminated; and a pressure controlling means for opening and shutting a throttle valve.
Abstract translation: 用于形成硅绝缘薄膜的光CVD装置的真空系统包括：用于放松管道中的未对准并吸收由真空泵（1）产生的振动的减振器（18）。 用于增加有效泵送速度以降低泵送速度的U型管道（19）; 用于放松压力的突然变化并过滤主排气管中的产生灰尘的阱（21）; 用于防止副产物和不起反应的气体和油分散的油过滤器（17）; 油过滤系统（8），用于防止油被污染; 以及用于打开和关闭节流阀的压力控制装置。
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公开(公告)号：KR1020090053672A
公开(公告)日：2009-05-27
申请号：KR1020080066001
申请日：2008-07-08
Applicant: 한국전자통신연구원 , 주식회사 씬멀티미디어
IPC: H04N19/51 , H04N19/105
CPC classification number: H04N19/51 , H04N19/105 , H04N19/176
Abstract: 본 발명에 따른 움직임 보상기의 움직임 보상 방법은, 참조 프레임 정보를 입력받는 단계, 상기 참조 프레임 정보의 코덱에 따라 사용될 저장소의 크기 패턴을 결정하는 단계, 및 상기 결정된 저장소의 크기 패턴에 따라 상기 참조 프레임 정보에 대한 움직임 보상을 수행하는 단계를 포함한다.
H.264, 통합코덱, 저장소-
Patent Agency Ranking
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公开(公告)号：KR1019920004963B1
公开(公告)日：1992-06-22
申请号：KR1019880017969
申请日：1988-12-30
IPC: H01L21/20
Abstract: The gas supply system is used for forming SiO2 or SiOxNy insulating thin film on Si or GaAs base in the process of manufacturing semiconducting elements by using the photo-chemical vapor deposition. And the system safely supplies the raw material and the surrounding gases, i.e. nitrogen oxide, oxygen, ammonia, argon and SiH4, to the deposition reactor. The gas supply system comprises the raw material gas lines having a manually operated valve (9), a bulk head union (10), a check valve (11), a pneumatic valve (12) sequentially provided; a main line (1) having a pneumatic valve (5) and a bellows (23); a nitrogen inducing line (13) connected between the nitrogen and the SiH4 supply line; an air line having a solenoid valve.
Abstract translation: 在使用光化学气相沉积制造半导体元件的过程中，气体供给系统用于在Si或GaAs基底上形成SiO2或SiOxNy绝缘薄膜。 并且该系统将原料和周围的气体即氮氧化物，氧气，氨，氩气和SiH4安全地供应到沉积反应器。 气体供给系统包括原料气体管线，其具有手动操作的阀（9），散装头联接件（10），止回阀（11），依次设置的气动阀（12） 具有气动阀（5）和波纹管（23）的主管线（1）; 连接在氮气和SiH4供应管线之间的氮气诱导管线（13） 具有电磁阀的空气管路。
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