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公开(公告)号：US20160085161A1
公开(公告)日：2016-03-24
申请号：US14956075
申请日：2015-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Felix Godfried Peter PEETERS , Bob STREEFKERK , Franciscus Johannes Herman Maria TEUNISSEN , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
Abstract translation: 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。
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公开(公告)号：US20150015858A1
公开(公告)日：2015-01-15
申请号：US14504191
申请日：2014-10-01
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT AG
Inventor： Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Bob STREEFKERK , Bernhard GELLRICH , Andreas WURMBRAND
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
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公开(公告)号：US20200049203A1
公开(公告)日：2020-02-13
申请号：US16494200
申请日：2018-02-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Maarten Hartger KIMMAN , Hans BUTLER , Olof Martinus Josephus FISCHER , Christiaan Alexander HOOGENDAM , Theodorus Mattheus Joannus Maria HUIZINGA , Johannes Marinus Maria ROVERS , Eric Pierre-Yves VENNAT , Maurice Willem Jozef Etiënne WIJCKMANS
Abstract: The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator. The magnetic gravity compensator comprises:a first permanent magnet assembly mounted to one of the first part and the second part and comprising at least a first column of permanent magnets, the first column extending in the vertical direction, wherein the permanent magnets have a polarization direction in a first horizontal direction or in a second horizontal direction opposite to the first horizontal direction, wherein vertically adjacent permanent magnets have opposite polarization directions,a second permanent magnet assembly mounted to the other of the first part and the second part and comprising at least one other column of permanent magnets, the at least one other column extending in the vertical direction, wherein vertically adjacent permanent magnets of the at least one other column have opposite polarization directions in the first horizontal direction or the second horizontal direction,wherein the first permanent magnet assembly at least partially encloses the second permanent magnet assembly.
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公开(公告)号：US20190317411A1
公开(公告)日：2019-10-17
申请号：US16454126
申请日：2019-06-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS
Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
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公开(公告)号：US20190227445A1
公开(公告)日：2019-07-25
申请号：US16326948
申请日：2017-08-11
Applicant: ASML Netherlands B.V.
Inventor： Frits VAN DER MEULEN , Erik Johan ARLEMARK , Hendrikus Herman Marie COX , Martinus Agnes Willem CUIJPERS , Joost DE HOOGH , Gosse Charles DE VRIES , Paul Comé Henri DE WIT , Sander Catharina Reinier DERKS , Ronald Comelis Gerardus GIJZEN , Dries Vaast Paul HEMSCHOOTE , Christiaan Alexander HOOGENDAM , Adrianus Hendrik KOEVOETS , Raymond Wilhelmus Louis LAFARRE , Alain Louis Claude LEROUX , Patrick Willem Paul LIMPENS , Jim Vincent OVERKAMP , Christiaan Louis VALENTIN , Koos VAN BERKEL , Stan Henricus VAN DER MEULEN , Jacobus Comelis Gerardus VAN DER SANDEN , Harmen Klaas VAN DER SCHOOT , David Ferdinand VLES , Evert Auke Rinze WESTERHUIS
IPC: G03F7/20
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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Patent Agency Ranking
公开(公告)号：US20190227444A1
公开(公告)日：2019-07-25
申请号：US16369721
申请日：2019-03-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Bob STREEFKERK , Johannes Catharinus Hubertus MULKENS , Erik Theodorus Maria BIJLAART , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Bernardus Antonius SLAGHEKKE , Patricius Aloysius Jacobus TINNEMANS , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/70808
Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
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公开(公告)号：US20180081282A1
公开(公告)日：2018-03-22
申请号：US15823188
申请日：2017-11-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Felix Godfried Peter PEETERS , Bob STREEFKERK , Franciscus Johannes Herman Maria TEUNISSEN , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
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公开(公告)号：US20180039188A1
公开(公告)日：2018-02-08
申请号：US15694537
申请日：2017-09-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Antonius Johannus VAN DER NET , Franciscus Johannes Herman Maria TEUNISSEN , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Edwin Augustinus Matheus VAN GOMPEL
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
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公开(公告)号：US20170357165A1
公开(公告)日：2017-12-14
申请号：US15687938
申请日：2017-08-28
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjored Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Stefan Philip Christiaan BELFROID , Johannes Petrus Maria SMEULERS , Herman VOGEL
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US20170248854A1
公开(公告)日：2017-08-31
申请号：US15470491
申请日：2017-03-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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