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公开(公告)号：US20190302631A1
公开(公告)日：2019-10-03
申请号：US16382483
申请日：2019-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Erik Theodorus Maria BIJLAART , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN , Antonius Theodorus Anna Maria DERKSEN , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US20150109593A1
公开(公告)日：2015-04-23
申请号：US14586518
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Antonius Johannus VAN DER NET , Franciscus Johannes Herman Maria TEUNISSEN , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Edwin VAN GOMPEL
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
Abstract translation: 公开了一种光刻设备，其包括液体供应系统，该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间，出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物， 液体供应系统和基材，以及构造成通过出口抽出混合物的抽空系统，排气系统具有分离器箱，其布置成将液体与混合物中的气体分离，分离器箱压力控制器连接到非液体 分离罐的填充区域，被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号：US20150056559A1
公开(公告)日：2015-02-26
申请号：US14504130
申请日：2014-10-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans JANSEN , Marco Koert STAVENGA , Jacobus Johannus Leonardus Hendricus VERSPAY , Franciscus Johannes Joseph JANSSEN , Anthonie KUIJPER
IPC: G03F7/20
CPC classification number: G03F7/70858 , G03F7/2041 , G03F7/70341
Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
Abstract translation: 提供了一种浸没液体，其包括离子形成组分，例如 酸或碱，其具有较高的蒸气压。 还提供了使用浸液的光刻工艺和光刻系统。
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4.发明申请公开(公告)号：US20180046090A1
公开(公告)日：2018-02-15
申请号：US15791317
申请日：2017-10-23
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70608 , G03F7/70808 , G03F7/70858
Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
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公开(公告)号：US20170242347A1
公开(公告)日：2017-08-24
申请号：US15448438
申请日：2017-03-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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Patent Agency Ranking
公开(公告)号：US20160124321A1
公开(公告)日：2016-05-05
申请号：US14993810
申请日：2016-01-12
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70608 , G03F7/70808 , G03F7/70858
Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
Abstract translation: 在浸没式光刻装置中，其中浸没液体被供应到局部空间，该空间基本上平行于基底平面呈多边形。 在一个实施例中，空间的两个角部具有不大于构造成容纳液体的空间与构造成不含液体的周围之间的过渡区域的宽度的曲率半径。
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公开(公告)号：US20150338748A1
公开(公告)日：2015-11-26
申请号：US14816997
申请日：2015-08-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Abstract translation: 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号：US20210375498A1
公开(公告)日：2021-12-02
申请号：US17395709
申请日：2021-08-06
Applicant: ASML Netherlands B.V.
Inventor： Pieter Willem Herman DE JAGER , Sipke Jacob BIJLSMA , Olav Waldemar Vladimir FRIJNS , Andrey Alexandrovich NIKIPELOV , Nicolaas TEN KATE , Antonius Theodorus Anna Maria DERKSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Robert Gabriël Maria LANSBERGEN , Aukje Arianne Annette KASTELIJN
Abstract: A radioisotope production apparatus comprising an electron source arranged to provide an electron beam. The electron source comprises an electron injector and an electron accelerator. The radioisotope production apparatus further comprises a target support structure configured to hold a target and a beam splitter arranged to direct the a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target.
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9.发明申请公开(公告)号：US20190258174A1
公开(公告)日：2019-08-22
申请号：US16398767
申请日：2019-04-30
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
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10.发明申请公开(公告)号：US20170219938A1
公开(公告)日：2017-08-03
申请号：US15488191
申请日：2017-04-14
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70608 , G03F7/70808 , G03F7/70858
Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
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