公开(公告)号：US09977349B2

公开(公告)日：2018-05-22

申请号：US15109427

申请日：2014-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Ingmar August Kerp ,  Pieter Johannes Gertrudis Meijers ,  Jeroen Pieter Starreveld ,  Derk Ten Hoopen ,  Martinus Van Duijnhoven ,  Edward Hage ,  Evert Hendrik Jan Draaijer ,  Wesley Ooms

IPC: G03F7/20 ,  F16F15/023

CPC classification number: G03F7/70866 ,  F16F15/0232 ,  G03F7/70733 ,  G03F7/70833 ,  G03F7/709

Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.

公开(公告)号：US09671702B2

公开(公告)日：2017-06-06

申请号：US14956110

申请日：2015-12-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Butler ,  Henrikus Herman Marie Cox

IPC: G03F7/20 ,  G03B27/53 ,  G03B27/58

CPC classification number: G03F7/70775 ,  G03B27/53 ,  G03B27/58 ,  G03F7/70725

Abstract: A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.

公开(公告)号：US20160377993A1

公开(公告)日：2016-12-29

申请号：US15258758

申请日：2016-09-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70716 ,  G05B19/418 ,  H02P25/06 ,  Y02P90/04

Abstract: A multi-stage system includes a stator including a plurality of electric coils; a first stage including a first magnet assembly, the first stage moveable relative to the stator; a second stage including a second magnet assembly, the second stage moveable relative to the stator; a controller configured to position the first and the second stage relative to the stator by activating, respectively, a first subset of the plurality of electric coils to interact with the first magnet assembly and a second subset of the plurality of electric coils to interact with the second magnet assembly, the controller adapted to prevent at least one electric coil, to be simultaneously shared by the first and the second subset to position the first and the second stage on the stator, from activating.

公开(公告)号：US20150098073A1

公开(公告)日：2015-04-09

申请号：US14395436

申请日：2013-03-18

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Marc Wilhemus Maria Van Der Wijst

IPC: G03F7/20 ,  G01D5/347

Abstract: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the support stage, relative to a reference frame by using the sensor part to interact with the reference part, wherein: the reference frame comprises N sub-frames coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.

Abstract translation: 公开了一种光刻设备和设备的制造方法。 光刻设备包括支撑台和包括传感器部分和参考部分的测量系统，该测量系统被配置为确定支撑台或安装在支撑台上的部件的位置和/或取向相对 通过使用传感器部分与参考部分相互作用而参考帧，其中：参考帧包括耦合在一起的N个子帧，以便相对于低于第一参考频率的振动主要表现为单个刚体，并且主要为 相对于高于第二参考频率的振动的N体系统，其中N是大于1的整数。

公开(公告)号：US20140340666A1

公开(公告)日：2014-11-20

申请号：US14357530

申请日：2012-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Butler ,  Arno Jan Bleeker ,  Pieter Renaat Marie Hennus ,  Martinus Hendricus Henricus Hoeks ,  Sven Antoin Johan Hol ,  Harmen Klaas Van Der Schoot ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Marc Wilhelmus Maria Van Der Wijst ,  Koen Jacobus Johannes Maria Zaal ,  Theodorus Petrus Maria Cadee ,  Ruud Antonius Catharina Maria Beerens ,  Olof Martinus Josephus Fischer ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Niels Johannes Maria Bosch

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70558 ,  G03F7/70816 ,  G03F7/709

Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Abstract translation: 一种曝光装置，包括被配置为将多个辐射束投影到目标上的投影系统; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。

公开(公告)号：US11789373B2

公开(公告)日：2023-10-17

申请号：US17602616

申请日：2020-03-10

Applicant: ASML Netherlands B.V.

Inventor： Bas Jansen ,  Samer Abdelmoeti Abuzeid Abdelmoeti ,  Hans Butler ,  Koen Johan Frederik Loonen ,  Aditya Singh ,  Ruben Etienne Johan Rinus Vandervelden

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70775

Abstract: The invention relates to an object positioning system including an actuator system and a measurement system. The actuator system includes an actuator made of a material with predominantly electrostrictive properties and substantially no net polarization in absence of an electric field. The actuator system is configured to apply an electric field to the actuator, which electric field includes a bias electric field and an actuation electric field superimposed on the bias electric field, a field strength of the actuation electric field being equal to or smaller than a field strength of the bias electric field. The measurement system is configured to measure an electrical property of the actuator which is representative for a mechanical state of the actuator. The measurement system includes a bridge circuit including an actuator and a reference element having electrical properties matched to the electrical properties of the actuator.

公开(公告)号：US11543756B2

公开(公告)日：2023-01-03

申请号：US16959702

申请日：2018-11-29

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler

IPC: G03F7/20

Abstract: A lithographic apparatus comprises a projection system comprising position sensors to measure a position of optical elements of the projection system. The positions sensors are referenced to a sensor frame. Damping actuators damp vibrations of the sensor frame. A control device drives the actuators and is configured to derive sensor frame damping force signals from at least one of the acceleration signals and the sensor frame position signals, derive an estimated line of sight error from the position signals, determine actuator drive signals from the sensor frame damping force signals and the estimated line of sight error, drive the actuators using the actuator drive signals to dampen the sensor frame and to at least partly compensate the estimated line of sight error.

公开(公告)号：US10788755B2

公开(公告)日：2020-09-29

申请号：US16229102

申请日：2018-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

IPC: G03B27/52 ,  G03F7/20

Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

公开(公告)号：US10678139B2

公开(公告)日：2020-06-09

申请号：US16245400

申请日：2019-01-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Johannes Catherinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Erik Theodorus Maria Bijlaart ,  Christiaan Alexander Hoogendam ,  Helmar Van Santen ,  Marcus Adrianus Van De Kerkhof ,  Mark Kroon ,  Arie Jeffrey Den Boef ,  Joost Jeroen Ottens ,  Jeroen Johannes Sophia Maria Mertens

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US20190171109A1

公开(公告)日：2019-06-06

申请号：US16257955

申请日：2019-01-25

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Anton Bernhard Van Oosten ,  Hans Butler ,  Erik Roelof Loopstra ,  Marc Wilhelmus Maria Van Der Wijst ,  Koen Jacobus Johannes Maria Zaal

IPC: G03F7/20 ,  G02B26/08 ,  G02B7/182

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.