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公开(公告)号：US20240288783A1
公开(公告)日：2024-08-29
申请号：US18570242
申请日：2022-05-27
Applicant: ASML Netherlands B.V.
IPC: G03F7/00
CPC classification number: G03F7/70875 , G03F7/70358
Abstract: Systems, apparatuses, and methods are provided for removing heat from a reticle. An example method can include generating, by a cooling controller, a cooling control signal based on timing data for a projection of a patterned radiation beam formed by illuminating an exposed area on a reticle supported by a reticle table, absorption data for the exposed area, and a target heat transfer rate. The cooling control signal can instruct a reticle cooling apparatus to actuate actuators to modify a distance between the reticle and a roof of the reticle cooling apparatus. The method can further include modifying, by the actuators based on the cooling control signal, the distance between the reticle and the roof to modify a heat transfer rate associated with a removal of heat from the reticle towards the target heat transfer rate.
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公开(公告)号：US20240027925A1
公开(公告)日：2024-01-25
申请号：US18375281
申请日：2023-09-29
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF
CPC classification number: G03F7/70925 , G03F1/38 , G03F1/82 , H01L21/67028
Abstract: A method of protecting a component of a lithographic apparatus, the method including the steps of: providing a protective cover which is shaped to protect at least part of said component, the protective cover having a contact surface which is arranged to adhere to a first surface of at least part of said lithographic apparatus or said component; and bringing the protective cover into proximity with the component so as to cause the contact surface to adhere to the lithographic apparatus or said component and remain adhered without the application of external force. It is also provided a patterning device for use in a lithographic apparatus and a lithographic apparatus.
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公开(公告)号：US20230008474A1
公开(公告)日：2023-01-12
申请号：US17773004
申请日：2020-10-05
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Victor Antonio PEREZ-FALCON , Marcus Adrianus VAN DE KERKHOF , Daniel Leslie HALL , Christopher John MASON , Arthur Winfried Eduardus MINNAERT , Johannes Hubertus Josephina MOORS , Samir A. NAYFEH
Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.
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公开(公告)号：US20220276573A1
公开(公告)日：2022-09-01
申请号：US17624901
申请日：2020-06-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Manish RANJAN
IPC: G03F7/20
Abstract: A lithographic apparatus including a substrate stage for supporting a structure in a compartment, the compartment having a compartment surface facing a top surface of the substrate in at least one operational configuration; and a soft coating on the compartment surface for capturing particles. A heat shield or component thereof for a lithographic apparatus, the heat shield or component thereof including a soft coating on at least one surface for capturing particles and a lithographic apparatus including such a heat shield.
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公开(公告)号：US20210382209A1
公开(公告)日：2021-12-09
申请号：US17282559
申请日：2019-09-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey NIKIPELOV , Marcus Adrianus VAN DE KERKHOF , Pieter-Jan VAN ZWOL , Laurentius Cornelius DE WINTER , Wouter Joep ENGELEN , Alexey Olegovich POLYAKOV
Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.
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Patent Agency Ranking
公开(公告)号：US20210257181A1
公开(公告)日：2021-08-19
申请号：US17179165
申请日：2021-02-18
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Jing ZHANG , Martijn Petrus Christianus VAN HEUMEN , Patriek Adrianus Alphonsus Maria BRUURS , Erheng WANG , Vineet SHARMA , Makfir SEFA , Shao-Wei FU , Simone Maria SCOLARI , Johannes Andreas Henricus Maria JACOBS
Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.
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公开(公告)号：US20200096875A1
公开(公告)日：2020-03-26
申请号：US16698868
申请日：2019-11-27
Applicant: ASML Netherlands B.V.
Abstract: A patterning device for use with a lithographic apparatus, the device comprising an absorber portion configured to absorb incident radiation and to reflect a portion of incident radiation, the absorber portion comprising a first layer and a second layer, the first layer of the absorber portion comprising a first material that is different from a second material of the second layer of the absorber portion; a reflector portion arranged beneath the absorber portion, the reflector portion being configured to reflect incident radiation; and a phase tune portion arranged between the reflector portion and the absorber portion, the phase tune portion being configured to induce a phase shift between the radiation reflected by the reflector portion and the portion of radiation reflected by the absorber portion such that the radiation reflected by the reflector portion destructively interferes with the portion of radiation reflected by the absorber portion.
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公开(公告)号：US20200057166A1
公开(公告)日：2020-02-20
申请号：US16344661
申请日：2017-10-02
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF
Abstract: A radiation analysis system comprising a target comprising two marks which are separated from each other, the target being configured to undergo thermal expansion when illuminated with radiation; a position measurement system configured to measure a change in the separation of the marks; and a processor configured to determine a power of the radiation using the measured change in separation of the marks.
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公开(公告)号：US20190129299A1
公开(公告)日：2019-05-02
申请号：US16093537
申请日：2017-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Maxim Aleksandrovich NASALEVICH , Erik Achilles ABEGG , Nirupam BANERJEE , Michiel Alexander BLAUW , Derk Servatius Gertruda BROUNS , Paul JANSSEN , Matthias KRUIZINGA , Egbert LENDERINK , Nicolae MAXIM , Andrey NIKIPELOV , Arnoud Willem NOTENBOOM , Claudia PILIEGO , Mária PÉTER , Gijsber RISPENS , Nadja SCHUH , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Antonius Willem VERBURG , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN , Aleksandar Nikolov ZDRAVICOV
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：US20180364561A1
公开(公告)日：2018-12-20
申请号：US16062017
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
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