公开(公告)号：US11454892B2

公开(公告)日：2022-09-27

申请号：US17315650

申请日：2021-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11281115B2

公开(公告)日：2022-03-22

申请号：US16734579

申请日：2020-01-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Marinus Jan Remie ,  Johannes Henricus Wilhelmus Jacobs ,  Thibault Simon Mathieu Laurent ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US20220082948A1

公开(公告)日：2022-03-17

申请号：US17531953

申请日：2021-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Christian Gerardus Norbertus Hendricus Marie CLOIN ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michael Christiaan Van Der Wekken

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

公开(公告)号：US11029607B2

公开(公告)日：2021-06-08

申请号：US16330544

申请日：2017-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US10394141B2

公开(公告)日：2019-08-27

申请号：US15661888

申请日：2017-07-27

Applicant: ASML Netherlands B.V.

Inventor： Michel Riepen ,  Dzmitry Labetski ,  Wilbert Jan Mestrom ,  Wim Ronald Kampinga ,  Jan Okke Nieuwenkamp ,  Jacob Brinkert ,  Henricus Jozef Castelijns ,  Nicolaas Ten Kate ,  Hendrikus Gijsbertus Schimmel ,  Hans Jansen ,  Dennis Jozef Maria Paulussen ,  Brian Vernon Virgo ,  Reinier Theodorus Martinus Jilisen ,  Ramin Badie ,  Albert Pieter Rijpma ,  Johannes Christiaan Leonardus Franken ,  Peter Van Putten ,  Gerrit Van Der Straaten

IPC: H05G2/00 ,  G03F7/20 ,  G21K5/08 ,  G21K1/06 ,  F15D1/00

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

公开(公告)号：US10331047B2

公开(公告)日：2019-06-25

申请号：US15687938

申请日：2017-08-28

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC: G03F7/20

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US10018925B2

公开(公告)日：2018-07-10

申请号：US15452445

申请日：2017-03-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC: G03B27/52 ,  G03B27/58 ,  G03B27/60 ,  G03F7/20 ,  B01D19/00

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

公开(公告)号：US20180188661A1

公开(公告)日：2018-07-05

申请号：US15904946

申请日：2018-02-26

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Marco Polizzi ,  Edwin Augustinus Matheus Van Gompel ,  Johannes Petrus Maria Smeulers ,  Stefan Philip Christiaan Belfroid ,  Herman Vogel

IPC: G03F7/20

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US09983482B2

公开(公告)日：2018-05-29

申请号：US14775263

申请日：2014-02-26

Applicant: ASML Netherlands B.V. ,  Carl Zeiss SMT GmbH

Inventor： Erik Roelof Loopstra ,  Olav Waldemar Vladimir Frijns ,  Stig Bieling ,  Antonius Theodorus Wilhelmus Kempen ,  Ivo Vanderhallen ,  Nicolaas Ten Kate ,  Ruud Antonius Catharina Maria Beerens ,  Richard Henricus Adrianus Van Lieshout ,  Theodorus Petrus Maria Cadee ,  Sjoerd Nicolaas Lambertus Donders ,  Alexander Matthijs Struycken ,  Marcus Petrus Scheepers

IPC: G03B27/54 ,  G03F7/20 ,  G21K1/06 ,  G02B5/08 ,  G02B19/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G02B5/0891 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/067 ,  H05G2/003 ,  H05G2/008

Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

公开(公告)号：US09857696B2

公开(公告)日：2018-01-02

申请号：US15273416

申请日：2016-09-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Ten Kate ,  Raymond Wilhelmus Louis Lafarre

IPC: G03B27/52 ,  G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.