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公开(公告)号：US11454892B2
公开(公告)日：2022-09-27
申请号：US17315650
申请日：2021-05-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Pepijn Van Den Eijnden , Cornelius Maria Rops , Theodorus Wilhelmus Polet , Floor Lodewijk Keukens , Gheorghe Tanasa , Rogier Hendrikus Magdalena Cortie , Koen Cuypers , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Evert Van Vliet , Nicolaas Ten Kate , Mark Johannes Hermanus Frencken , Jantien Laura Van Erve , Marcel Maria Cornelius Franciscus Teunissen
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
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公开(公告)号：US11281115B2
公开(公告)日：2022-03-22
申请号：US16734579
申请日：2020-01-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Ten Kate , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US20220082948A1
公开(公告)日：2022-03-17
申请号：US17531953
申请日：2021-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Christian Gerardus Norbertus Hendricus Marie CLOIN , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Marco Koert Stavenga , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Olga Vladimirovna Elisseeva , Tijmen Wilfred Mathijs Gunther , Michael Christiaan Van Der Wekken
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
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公开(公告)号：US11029607B2
公开(公告)日：2021-06-08
申请号：US16330544
申请日：2017-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Pepijn Van Den Eijnden , Cornelius Maria Rops , Theodorus Wilhelmus Polet , Floor Lodewijk Keukens , Gheorghe Tanasa , Rogier Hendrikus Magdalena Cortie , Koen Cuypers , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Evert Van Vliet , Nicolaas Ten Kate , Mark Johannes Hermanus Frencken , Jantien Laura Van Erve , Marcel Maria Cornelius Franciscus Teunissen
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
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公开(公告)号：US10394141B2
公开(公告)日：2019-08-27
申请号：US15661888
申请日：2017-07-27
Applicant: ASML Netherlands B.V.
Inventor： Michel Riepen , Dzmitry Labetski , Wilbert Jan Mestrom , Wim Ronald Kampinga , Jan Okke Nieuwenkamp , Jacob Brinkert , Henricus Jozef Castelijns , Nicolaas Ten Kate , Hendrikus Gijsbertus Schimmel , Hans Jansen , Dennis Jozef Maria Paulussen , Brian Vernon Virgo , Reinier Theodorus Martinus Jilisen , Ramin Badie , Albert Pieter Rijpma , Johannes Christiaan Leonardus Franken , Peter Van Putten , Gerrit Van Der Straaten
Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
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Patent Agency Ranking
公开(公告)号：US10331047B2
公开(公告)日：2019-06-25
申请号：US15687938
申请日：2017-08-28
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
IPC: G03F7/20
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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37.发明授权公开(公告)号：US10018925B2
公开(公告)日：2018-07-10
申请号：US15452445
申请日：2017-03-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
CPC classification number: G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
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公开(公告)号：US20180188661A1
公开(公告)日：2018-07-05
申请号：US15904946
申请日：2018-02-26
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
IPC: G03F7/20
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US09983482B2
公开(公告)日：2018-05-29
申请号：US14775263
申请日：2014-02-26
Applicant: ASML Netherlands B.V. , Carl Zeiss SMT GmbH
Inventor： Erik Roelof Loopstra , Olav Waldemar Vladimir Frijns , Stig Bieling , Antonius Theodorus Wilhelmus Kempen , Ivo Vanderhallen , Nicolaas Ten Kate , Ruud Antonius Catharina Maria Beerens , Richard Henricus Adrianus Van Lieshout , Theodorus Petrus Maria Cadee , Sjoerd Nicolaas Lambertus Donders , Alexander Matthijs Struycken , Marcus Petrus Scheepers
CPC classification number: G03F7/70033 , G02B5/0891 , G02B19/0095 , G03F7/70166 , G03F7/702 , G03F7/70916 , G03F7/70983 , G21K1/067 , H05G2/003 , H05G2/008
Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.
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公开(公告)号：US09857696B2
公开(公告)日：2018-01-02
申请号：US15273416
申请日：2016-09-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
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