33.
    发明专利
    未知

    公开(公告)号:DE3679150D1

    公开(公告)日:1991-06-13

    申请号:DE3679150

    申请日:1986-10-15

    Applicant: BASF AG

    Abstract: Finely divided, gel-like crosslinked polymers are prepared by a continuous method in which a monomer mixture which contains, per 100 parts by weight of acrylic acid or methacrylic acid, from 50 to 100 mol % of which in each case are neutralized, acrylamide, methacrylamide or N-vinylpyrrolidone, from 0 to 30 parts by weight of other water-soluble monoethylenically unsaturated monomers and from 0 to 20 parts by weight of water-insoluble monoethylenically unsaturated monomers is copolymerized with from 0.01 to 5 parts by weight of a crosslinking agent, in 20-65% strength by weight aqueous solution in the presence of an initiator at from 45 DEG to 95 DEG C. in a single-screw cylindrical mixer whose stirrer shaft possesses disk segments which have, at the outer end, mixing bars which are arranged in a manner such that the substances fed in at the entrance of the mixer are conveyed in the axial direction to the exit of the mixer, the aqueous monomer solution in the mixer is polymerized under from 100 to 800 mbar, and some of the water is removed during the polymerization, so that a crumb-like gel having a solids content of from 30 to 70% by weight is discharged.

    ACID GALVANIC ZINC BATH
    34.
    发明专利

    公开(公告)号:DE3370835D1

    公开(公告)日:1987-05-14

    申请号:DE3370835

    申请日:1983-12-20

    Applicant: BASF AG

    Abstract: In an aqueous acidic plating bath for the electrolytic deposition of zinc, which contains conventional conductive salts, brighteners and surfactants, one of the surfactants is a surfactant of the formula I where R1 is C4-C20-alkyl, R2 is identical to R1 or is hydrogen, X and Y are each a radical -SO3H, where the hydrogen atom can be replaced by an alkali metal or alkaline earth metal atom or by one equivalent of zinc and n is an integer from 5 to 50.

    35.
    发明专利
    未知

    公开(公告)号:DE3248503A1

    公开(公告)日:1984-07-05

    申请号:DE3248503

    申请日:1982-12-29

    Applicant: BASF AG

    Abstract: In an aqueous acidic plating bath for the electrolytic deposition of zinc, which contains conventional conductive salts, brighteners and surfactants, one of the surfactants is a surfactant of the formula I where R1 is C4-C20-alkyl, R2 is identical to R1 or is hydrogen, X and Y are each a radical -SO3H, where the hydrogen atom can be replaced by an alkali metal or alkaline earth metal atom or by one equivalent of zinc and n is an integer from 5 to 50.

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