31.
    发明专利
    未知

    公开(公告)号:ES2190116T3

    公开(公告)日:2003-07-16

    申请号:ES98954254

    申请日:1998-09-05

    Applicant: BASF AG

    Abstract: A process is described for copolymerizing ethylene with vinyl esters and, if desired, with further vinylic comonomers in a tube reactor at pressures of from 500 to 4000 bar and at not more than 220° C., which comprises initiating the free-radical polymerization at at least two locations of the tube reactor by adding a catalyst/initiator and adjusting the temperature profile within the reactor such that the temperature maxima downstream of the initiation locations are from 150 to 220° C. and differ by less than ±10° C. from one another.

    32.
    发明专利
    未知

    公开(公告)号:DE59706044D1

    公开(公告)日:2002-02-21

    申请号:DE59706044

    申请日:1997-04-24

    Applicant: BASF AG

    Abstract: A process is disclosed for preparing ethylene polymers with a molecular weight Mw (weight average) lower than 20,000 g/mole at temperatures in a range from 200 to 280 DEG C and pressures in a range from 1000 to 3500 bars in the presence of a catalyst system. The catalyst system used contains: (A) a non-bridged substituted or unsubstituted biscyclopentadienyl complex; (B) a metal compound of general formula (I) M (R )r (R )s (R )t, in which M is an alkaline, an alkaline earth metal or a metal of the third main group of the periodic table; R is hydrogen, C1-C10-alkyl, C6-C15-aryl, alkylaryl or arylalkyl with 1 to 10 C atoms in the alkyl radical and 6 to 20 C atoms in the aryl radical; R and R independently represent hydrogen, halogen, C1-C10-alkyl, C6-C15-aryl, alkylaryl, arylalkyl or alkoxy with 1 to 10 C atoms in the alkyl radical and 6 to 20 C atoms in the aryl radical; r is an integer from 1 to 3; and s and t are integers from 0 to 2, the sum r+s+t corresponding to the valency of M ; and (C) a metallocene ion-forming compound selected in a group which consists of strong, neutral Lewis acids, ionic compounds with lewis acid cations and ionic compounds with Brönsted acids as cations. Components (A), (B) and (C) are mixed together and after at the latest 5 minutes are dosed in the reactor.

    35.
    发明专利
    未知

    公开(公告)号:AT172226T

    公开(公告)日:1998-10-15

    申请号:AT95907582

    申请日:1995-01-23

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP95/00225 Sec. 371 Date Jul. 31, 1996 Sec. 102(e) Date Jul. 31, 1996 PCT Filed Jan. 23, 1995 PCT Pub. No. WO95/21221 PCT Pub. Date Aug. 10, 1995Prints are produced by the offset heatset process using a printing ink based on mineral oil and additionally using an agent for increasing the abrasion resistance of the prints, where the agent for increasing the abrasion resistance is an oxidized olefin polymer which has a melt viscosity of from 100 to 15,000 mm2/s, measured in accordance with DGF M-III 8 (75), and an acid number of from 5 to 50 mg of KOH/g of polymer, measured in accordance with DGF M-IV 2 (57).

    36.
    发明专利
    未知

    公开(公告)号:FI89750B

    公开(公告)日:1993-07-30

    申请号:FI873500

    申请日:1987-08-12

    Applicant: BASF AG

    Abstract: The process produces a sensitized lithographic printing plate from an aluminium base which has been pretreated mechanically, chemically and/or electrochemically in the standard way and anodised, and a photosensitive copying layer applied to said base, a thin hydrophilising layer consisting of a hydrolysate or condensate of at least one silane being applied between said base and copying layer. … These lithographic printing plates are suitable, in particular, for offset printing.

    37.
    发明专利
    未知

    公开(公告)号:NO873428L

    公开(公告)日:1988-02-17

    申请号:NO873428

    申请日:1987-08-14

    Applicant: BASF AG

    Abstract: The process produces a sensitized lithographic printing plate from an aluminium base which has been pretreated mechanically, chemically and/or electrochemically in the standard way and anodised, and a photosensitive copying layer applied to said base, a thin hydrophilising layer consisting of a hydrolysate or condensate of at least one silane being applied between said base and copying layer. … These lithographic printing plates are suitable, in particular, for offset printing.

    38.
    发明专利
    未知

    公开(公告)号:NO873428D0

    公开(公告)日:1987-08-14

    申请号:NO873428

    申请日:1987-08-14

    Applicant: BASF AG

    Abstract: The process produces a sensitized lithographic printing plate from an aluminium base which has been pretreated mechanically, chemically and/or electrochemically in the standard way and anodised, and a photosensitive copying layer applied to said base, a thin hydrophilising layer consisting of a hydrolysate or condensate of at least one silane being applied between said base and copying layer. … These lithographic printing plates are suitable, in particular, for offset printing.

    39.
    发明专利
    未知

    公开(公告)号:NO324462B1

    公开(公告)日:2007-10-22

    申请号:NO20002778

    申请日:2000-05-30

    Applicant: BASF AG

    Abstract: In a process for preparing ethylene-vinyl acetate copolymers in which a mixture of ethylene and vinyl acetate is polymerized continuously in the presence of free-radical polymerization initiators and, if desired, molecular weight regulators in a cooled tube reactor at a pressure in the range from 1000 to 3500 bar, and the poly-merization initiator is added at the beginning and at two or more points along the tube reactor, and temperature changes in the reaction mixture along the tube reactor, between the first temperature maximum and the last addition of the polymerization initiator, are within a range of not more than 20° C.

    40.
    发明专利
    未知

    公开(公告)号:DE50210496D1

    公开(公告)日:2007-08-30

    申请号:DE50210496

    申请日:2002-01-22

    Applicant: BASF AG

    Abstract: Preparation of ethylene polymers (A) by a high pressure process involves dissolving radical initiator(s) in ketone(s) (I); compressing; dosing the mixture to the polymerization reactor in one or more portions; and carrying out polymerization. Preparation of ethylene polymers (A) by a high pressure process involves: (1) dissolving radical initiator(s) in ketone(s) of formula R 1-CO-R 2(I); (2) compressing; (3) dosing the mixture to the polymerization reactor in one or more portions; and (4) carrying out polymerization at 140-350[deg]C and 400-4500 bars. R 1, R 21-6C alkyl or 3-12C cycloalkyl; or are linked to complete a 4-13 membered ring.

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