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公开(公告)号:JPH07183272A
公开(公告)日:1995-07-21
申请号:JP32693893
申请日:1993-12-24
Applicant: CANON KK
Inventor: UENO RIE
IPC: H01L21/302 , H01L21/3065
Abstract: PURPOSE:To readily perform a complete etching at an excellent manufacturing yield by a method wherein, after a fine processing part is modified by electron- beam irradiation, dry etching is performed for the fine processing part on the surface of a semiconductor substrate, etc., without using resist. CONSTITUTION:A Pt film of a thickness about 300Angstrom is formed on a glass substrate washed excellently. This sample is introduced into a general-purpose SEM and electron beams are scanned and radiated to a part 1 that is desired to cut out by etching for this film surface. Next, oxygen ions are radiated on the entire surface of this film surface by flat milling. The electron-beam irradiated part is thinned by about several tens of millimeters. Thereby, a fine processing can be performed in the simplest step and a submicron-order processing can be performed.
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公开(公告)号:JP2002075660A
公开(公告)日:2002-03-15
申请号:JP2000258388
申请日:2000-08-29
Applicant: CANON KK
Inventor: OSATO YOICHI , UENO RIE , AEBA TOSHIAKI , URAKAWA SHINICHI , TANABE HIROSHI , HASHIMOTO YUICHI , UENO KAZUNORI , SENOO AKIHIRO
Abstract: PROBLEM TO BE SOLVED: To eliminate generation of defective products in the early stage caused by a hole injection electrode surface shape or foreign materials attaching on the electrode surface in an organic electroluminescent element. SOLUTION: Surface roughness of not more than 5.0 nm and the maximum roughness of not more than 55 nm are selected as a hole injection electrode made of a transparent conductive material, and diameters of foreign materials attaching on the electrode surface is to be not more than 3 μm.
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公开(公告)号:JP2002075637A
公开(公告)日:2002-03-15
申请号:JP2000258387
申请日:2000-08-29
Applicant: CANON KK
Inventor: OSATO YOICHI , UENO RIE , AEBA TOSHIAKI , URAKAWA SHINICHI , TANABE HIROSHI , HASHIMOTO YUICHI , UENO KAZUNORI , SENOO AKIHIRO
Abstract: PROBLEM TO BE SOLVED: To prevent dispersions of luminescence property, generation of dark spot and short circuit due to unevenness of hole injection electrode surface and foreign matters adhered to a hole injection electrode surface in organic EL element. SOLUTION: By adopting a hole injection transport layer 3 contacted with the hole injection electrode 2 as a coating film, an influence of unevenness of hole injection electrode 2 surface is reduced, and the hole injection transport layer 3 having a smooth surface is formed.
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公开(公告)号:JP2001147208A
公开(公告)日:2001-05-29
申请号:JP33103499
申请日:1999-11-22
Applicant: CANON KK
Inventor: UENO RIE
IPC: G01N23/22 , G01N1/28 , G01N23/225 , G01N23/227
Abstract: PROBLEM TO BE SOLVED: To provide an analyzer capable of accurately specifying the irradiating position of converged beam with high resolving power before and after measurment and a sample holder used in the analyzer. SOLUTION: A sample holder for fixing a sample is used in an analyzer irradiating the sample with converged beam to measure the state or characteristics of the sample and has a position specifying means for specifying a position irradiated with converged beam, an input means receiving control for indicating the movement of the position specifying means from the outside and a drive means for moving the position specifying means, based on the control. The input means is an electric contact receiving a control signal and the drive means is a motor for driving the position specifying means.
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35.
公开(公告)号:JP2000304713A
公开(公告)日:2000-11-02
申请号:JP11363599
申请日:1999-04-21
Applicant: CANON KK
Inventor: UENO RIE , HASHIMOTO HIROYUKI
IPC: G01N23/227 , G01N1/00
Abstract: PROBLEM TO BE SOLVED: To make reducible the light-axis adjustment time by forming such a sample composition that an elastic scattered electron or a photoelectron is generated when X rays or electron beams are applied and a fluorescence is generated when converged X rays are applied. SOLUTION: Approximately 10 μm ZnS is applied to a Cu mesh 31 that is used for retaining the sample of a transmission-type electron microscope as a fluorescent substance 32 by the settlement method. Since the fluorescent substance 32 has been applied to only the metal part of the Cu mesh 31, a part that emits light when a light axis is adjusted becomes clear and a focus can be easily adjusted. Further, an approximately 50 Å Ag film 33 is deposited on a mesh surface where the fluorescent substance 32 has been applied. The Ag film 33 is used to calibrate the energy of a photoelectron and at the same time matching the X-ray application point to the focus of an analysis optical system. The mesh 31 has a diameter of 3 mm, a Cu mesh lattice 21 is a Cu ray with a width of 3 μm, and the effective size of a hole 22 is 60 μm2±10% for adjusting light axis.
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公开(公告)号:JP2000238855A
公开(公告)日:2000-09-05
申请号:JP4849399
申请日:1999-02-25
Applicant: CANON KK
Inventor: TOMITA YASUKO , UENO RIE
Abstract: PROBLEM TO BE SOLVED: To make a change in substrate surface energy difficult to occur during storage by constituting an internal surface of a container using a material with a volatilization quantity of organic compound at a normal temperature of a specific value or less. SOLUTION: An internal surface of a container 1 is constituted using a material whose volatilization quantity of organic compound at a normal temperature is 0.2 pg/s or less. Though the material with the volatilization quantity of organic compound at a normal temperature is not specifically limited, glass, metal particularly stainless steel, and ceramic may be preferably used. The storage container 1 having an internal surface constituted of such a member has an extremely small quantity of volatilization of an organic compound at a normal temperature, and a change in surface energy on a stored substrate is also small. Thus the storage container 1 which is inexpensive and simply structured and is free from a change in surface energy of a stored material can be obtained. In addition, by providing a moving means such as a caster 2 on the container 1, the container can be smoothly transferred during each process or between respective processes.
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公开(公告)号:JP2000173451A
公开(公告)日:2000-06-23
申请号:JP34845398
申请日:1998-12-08
Applicant: CANON KK
Inventor: AEBA TOSHIAKI , UENO RIE , MOTOI YASUKO , NAKAMURA HISAMI , SHIBATA MASAAKI , YAMANOBE MASATO
Abstract: PROBLEM TO BE SOLVED: To provide a stable and long life electron emitting characteristic and to control the degradation of an element caused by discharge, by forming a clearance in a part of a thin conductive film, arranging first films having carbon in this clearance and on the thin conductive film, and arranging a second film having carbon on the first film having carbon. SOLUTION: A pair of element electrodes 2, 3 is facingly arranged on a board 1, and a thin conductive film 4 is separated right and left and is facingly arranged on the surface of the board 1 on the both sides of a clearance 6 formed in a part of the thin conductive film 4 in a forming process or the like. Films 10 having carbon as a deposit are arranged on the board 1 in a first clearance, namely the clearance 6 and on the thin conductive film 4 close to it. These films 10 having carbon are facingly arranged transversely to the surface of the board 1, on the both sides of a second clearance, namely a clearance 7, placed in the clearance 6. The films 10 having carbon as the deposit are deposited over the element electrodes 2, 3 and can be interconnected depending on a condition such as a distance L between the element electrodes.
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38.
公开(公告)号:JPH1012135A
公开(公告)日:1998-01-16
申请号:JP17547096
申请日:1996-06-17
Applicant: CANON KK
Inventor: KOBAYASHI TOYOKO , ISHIZAKI AKIYOSHI , MOTOI YASUKO , UENO RIE
Abstract: PROBLEM TO BE SOLVED: To ensure a uniform film thickness of a conductive thin film, simplify a manufacturing process of the film thickness, and enable an element to be formed on a large-area substrate at a low cost easily by applying a droplet by means of an ink jet method. SOLUTION: A constitutive example of a flat, surface conductive electron emission element is shown in Fig. Element electrodes 2 and 3 made of a semiconductor material such as poly-silicon are opposed to each other on a substrate 1 such as quartz glass. An interval L between the element electrodes 2 and 3 is 1 to 100 micrometers in consideration of an applied voltage or the like, and a length W is several micrometers or several hundreds of micrometers in consideration of an electrode resistance value and electron emission characteristics. In addition, a conductive film 4 using a fine particle film is formed between the element electrodes 2 and 3 to obtain good electrode emission characteristics. The conductive thin film 4 is formed by using a device employing an ink jet method and applying a droplet of solution containing a material for thin film formation. After heating and firing process, an electron emission portion 5 is formed by means of a forming process.
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39.
公开(公告)号:JPH09245696A
公开(公告)日:1997-09-19
申请号:JP5463996
申请日:1996-03-12
Applicant: CANON KK
Inventor: UENO RIE
Abstract: PROBLEM TO BE SOLVED: To provide an electron source which improves a yield rate at a manufacturing time to be able to form an image having reliability and high accuracy further with a large picture plane, by forming a wiring of width wider than a wiring overlapped with the wiring on an insulation belt. SOLUTION: On an insulation belt 4 orthogonal to a wiring 3 connected to one element electrode 1 of a surface conduction electron emitting element, a wiring 5 of thin width is formed. On the wiring 5 and the wiring 5 is a connection region to the other element electrode 2, a wiring 6 of width wider than the wiring 5 is provided to be piled so as to cover the wiring 5. Thus by forming the wiring 6 of wider width piled on the wiring 5, sagging when the wiring is formed is prevented, short-circuiting of the element electrode 1 and the wiring 3 can be prevented. Even when wire cracking and wire breaking are generated in a contact part between the wiring 5 and the element electrode 2, electric contact is maintained by the wiring 6, reliability can be improve. Further, since thickness of the wiring is thickened, the wiring of low resistance can be realized.
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公开(公告)号:JPH0720021A
公开(公告)日:1995-01-24
申请号:JP14617493
申请日:1993-06-17
Applicant: CANON KK
Inventor: UENO RIE
IPC: G01N1/28 , G01N23/225 , H01J37/252
Abstract: PURPOSE:To perform secondary ion-mass spectrometry on an insulator sample with high reproducibility and excellent efficiency by forming a conductive fine- particle layer on the surface of the sample and performing measurement by utilizing the surface layer. CONSTITUTION:The qualitative and quantitative analyses of an insulator sample are performed by irradiating the sample with a primary ion beam and drawing out secondary ions generated from the surface of the sample for mass spectrometry. Before measurement, a fine-particle layer of a conductive material is formed on the surface of the sample and the measurement is performed by using the layer. In order to obtain a uniform and flat fine-particle layer, it is desirable to control the particle size of the fine particles to
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