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    ELECTRON BEAM IRRADIATION DEVICE AND SCANNING ELECTRON MICROSCOPE DEVICE
    1.
    发明专利
    ELECTRON BEAM IRRADIATION DEVICE AND SCANNING ELECTRON MICROSCOPE DEVICE 审中-公开

    公开(公告)号：JP2003217493A

    公开(公告)日：2003-07-31

    申请号：JP2002018725

    申请日：2002-01-28

    Applicant: CANON KK

    Inventor： AEBA TOSHIAKI ,  OTSUKA MITSURU

    IPC: H01J37/18 ,  H01J37/28

    Abstract: PROBLEM TO BE SOLVED: To provide an electron beam irradiation device allowing simplification, miniaturization and cost reduction of the device, or reduction of conductance of evacuation. SOLUTION: This electron beam irradiation device is at least provided with: an electron beam source; an acceleration electrode for accelerating electrons emitted from the electron beam source; and an electron lens for converging the accelerated electron beam; and a means for sweeping the irradiation position of the electron beam onto a sample. An evacuation system of the electron beam irradiation device is stopped when reaching a set value of a first degree of vacuum. The evacuation system of the electron beam irradiation device is operated when reaching a set value of a second degree of vacuum lower than that of the first degree of vacuum. The electron beam irradiation is executed when the degree of vacuum is between the set value of the first degree of vacuum and the set value of the second degree of vacuum and when the evacuation system is stopped. COPYRIGHT: (C)2003,JPO

    POLISHING DEVICE, CUTTING/GRINDING DEVICE, AND CUTTING DEVICE FOR SOLID MATERIAL
    4.
    发明专利
    POLISHING DEVICE, CUTTING/GRINDING DEVICE, AND CUTTING DEVICE FOR SOLID MATERIAL 失效

    公开(公告)号：JPH06297304A

    公开(公告)日：1994-10-25

    申请号：JP10594693

    申请日：1993-04-09

    Applicant: CANON KK

    Inventor： AEBA TOSHIAKI ,  ISHIZAKI AKIYOSHI ,  OBA MITSURU

    IPC: B24B27/06 ,  B24B1/04 ,  G01N1/28 ,  G01N1/32 ,  H01J37/20

    Abstract: PURPOSE:To polish a sample without fixing it by means of an adhesive or the like by providing a device with two ultrasonic drivers that are opposite to each other and function as driving sources for polishing the surfaces of a solid body, and by constituting the device in such a way that the upper and lower surfaces of the solid body can be simultaneously or separately polished by these ultrasonic drivers. CONSTITUTION:A device is provided with ultrasonic drivers 21, 22 in which nickel vibrators have been used, and thereto ultrasonic vibrators 23, 24 which are arranged in the vertical direction so as to be opposite to each other are provided respectively. The surface of the upper ultrasonic vibrator 23 is formed in a curved shape, for example, of a radius of curvature of 5mm, and the surface of the lower ultrasonic vibrator 24 is formed in a plane shape. When a sample 27 is polished, carborundum aqueous solution is used as an abrasive, and polishing is carried out by operating only the ultrasonic vibrator 23. To mirror-polishing the upper and lower surfaces, the upper and lower ultrasonic vibrators 23, 24 are changed to another ultrasonic vibrators each of which has the same shape and whose surface has been covered with buff cloth, and also the abrasive is changed to alumina aqueous solution. In this condition, the upper and lower vibrators 23, 24 are driven, and the upper and lower surfaces of the sample 27 are simultaneously polished.

    METAL OXIDE MATERIAL
    5.
    发明专利
    METAL OXIDE MATERIAL 失效

    公开(公告)号：JPH03170329A

    公开(公告)日：1991-07-23

    申请号：JP30744089

    申请日：1989-11-29

    Applicant: CANON KK

    Inventor： DEN TORU ,  AEBA TOSHIAKI

    IPC: C04B35/00 ,  C01G1/00 ,  C01G3/00 ,  C01G15/00 ,  C01G29/00 ,  C04B35/45 ,  H01B12/00 ,  H01L39/12

    Abstract: PURPOSE:To prepare a copper oxide material produced at low temperature, having good sinterability and useful as a superconductive material by comprising a specific periodic lamellar structure having surfaces with atomic arrangements vertical to the c-axis and containing CuO2 surfaces along the c axis. CONSTITUTION:A lamellar metal oxide material comprising surfaces having atomic arrangements vertical to the c-axis has a periodical structure comprising AO, AO, BO, CuO2, CO, DO, CO, CuO2, BO and AO surfaces along the c-axis. In the oxide material the A, B, C and D are preferably elements or atomic groups selected from an elements group consisting of Bi, Pb, Ti, Ca, Sr, Ba, Y and lanthanide elements. In an especially preferable metal oxide material, A is Bi and B, C and D are Sr.

    RECORDED MATERIAL
    6.
    发明专利
    RECORDED MATERIAL 失效

    公开(公告)号：JPS62214986A

    公开(公告)日：1987-09-21

    申请号：JP5828986

    申请日：1986-03-18

    Applicant: CANON KK

    Inventor： AKITANI TAKASHI ,  MUNAKATA EMI ,  SAITOU MASAKO ,  AEBA TOSHIAKI

    IPC: B41M5/00 ,  B41M5/52 ,  D21H27/00

    Abstract: PURPOSE:To improve an ink absorption as a recorded material for an ink jet recording and prevent bleeding and feathering to obtain a recording image being enhanced in dot-shape, color properties, density, and resolving power, by making a recorded material from a pulp having a specific physical properties. CONSTITUTION:A recorded material made of a pulp of 37-60 deg. SR in Schopper freeness can eliminate various problems in the prior art. On the other hand, a recorded material made of a pulp of 37 deg. SR below in Schopper freeness generates the feathering etc. to a great extent, thus failing to form a high- quality image as a recorded material for water-color ink, particularly for an ink jet system. A recorded material made of a pulp of 60 deg. SR above in Schopper freeness lowers in its opaqueness and stiffness and the like, thus becoming unsuitable for the use as a recorded material of paper series and inferior in appearance as a recorded material.

    METHOD OF MANUFACTURING MICRO OPTICAL ELEMENT, MICRO OPTICAL ELEMENT MANUFACTURED BY THE METHOD, AND OPTICAL DEVICE USING THE ELEMENT
    7.
    发明专利
    METHOD OF MANUFACTURING MICRO OPTICAL ELEMENT, MICRO OPTICAL ELEMENT MANUFACTURED BY THE METHOD, AND OPTICAL DEVICE USING THE ELEMENT 失效

    公开(公告)号：JP2002323428A

    公开(公告)日：2002-11-08

    申请号：JP2001129212

    申请日：2001-04-26

    Applicant: CANON KK

    Inventor： AEBA TOSHIAKI ,  KURODA AKIRA

    IPC: B23K15/00 ,  G01N11/14 ,  G01Q60/22 ,  G02B5/00 ,  G02B21/06 ,  G11B7/135 ,  G01N13/14 ,  G12B21/06

    Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing micro optical element by which high-accuracy micro-working can be performed on a micro optical element by suppressing the occurrence of the drift of an ion beam caused by an abrupt change in electrostatic charge in the course of working (FIB working) which is performed by using a converged ion beam, and to provide a micro optical element manufactured by the method and an optical device using the optical element. SOLUTION: The method of manufacturing micro optical element in which openings smaller than the wavelength of light are formed includes a step of preparing an object to be worked having at least a conductive light shielding film and an insulating light transmitting substrate and a step of forming the openings smaller than the wavelength of light at desired positions by etching the conductive light shielding film partway in the thickness direction of the film by projecting a converged ion beam upon the object to be worked.

    ELECTRON EMISSION ELEMENT, ELECTRON SOURCE, IMAGE FORMING DEVICE AND MANUFACTURE OF THE SAME
    10.
    发明专利
    ELECTRON EMISSION ELEMENT, ELECTRON SOURCE, IMAGE FORMING DEVICE AND MANUFACTURE OF THE SAME 失效

    公开(公告)号：JP2000243261A

    公开(公告)日：2000-09-08

    申请号：JP4567199

    申请日：1999-02-24

    Applicant: CANON KK

    Inventor： AEBA TOSHIAKI ,  ARAI YOSHITAKA

    IPC: H01J9/02 ,  H01J1/316 ,  H01J31/12

    Abstract: PROBLEM TO BE SOLVED: To prevent enlargement of a processing device and increase of the cost and to shorten a time necessary for manufacturing, by forming the elementary electrodes and a conductive film on a substrate, forming an electron emissive portion on the conductive film, then repeatedly applying the pulse voltage between a pair of elementary electrodes in the atmosphere including acetylene gas within a specific range of pressure to deposit the carbon-contained sediment on the electron emissive portion. SOLUTION: Elementary electrodes 2, 3 are formed on a substrate 1, for example, by a photolithographic technique, and then a solution of an organic metallic compound is applied thereto to form an organic metallic thin film. The organic metallic thin film is heated, and the patterning is executed thereto by etching and the like to form a conductive film 4. The voltage pulse is applied between the elementary electrodes 2, 3 to form an electron emissive portion 5 having the changed structure on a part of the conductive film 4, and then a pulse voltage is repeatedly applied between a pair of elementary electrodes in the atmosphere including acetylene gas, preferably in a mixed gas of the acetylene gas and an inert gas, having 5×104 through 2×105 Pa of pressure to deposit a sediment, including carbon on the electron emissive portion 5.

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