公开(公告)号：JPS60125811A

公开(公告)日：1985-07-05

申请号：JP23265983

申请日：1983-12-12

Applicant: CANON KK

Inventor： YOMODA MINORU ,  YAMAMURA MITSUGI

IPC: G02B7/02 ,  G02B7/00 ,  G02B7/09 ,  G02B7/28 ,  G03F7/20 ,  G03F9/00

Abstract: PURPOSE:To correct the in-focus position of the optical projection system of an optical device supported on a base and to prevent deterioration in optical performance by fitting a member which deforms according to temperature variation to the base, and moving it according to variation in ambient temperature. CONSTITUTION:An upward projection type bimetal 8 is mounted over a wafer chuck base 7 and a wafer chuck 6 is provided on the bimetal 8 slidably to and away from the base 7 in the vertical direction. The bimetal 8 is made of such a material of suitable size as to move the wafer chuck 8 vertically by the same extent according to the focusing movement extent of the whole device due to variation in ambient temperature. Therefore, when the pattern of the mask 3 is printed on the wafer 5, the bimetal 8 deforms according to the ambient temperature all the time to move up and down the wafer chuck 6, and the wafer 5 on the chuck 6 is hled at the optimum image formation position of the optical projection system 4.

公开(公告)号：JPH03101215A

公开(公告)日：1991-04-26

申请号：JP20959290

申请日：1990-08-07

Applicant: CANON KK

Inventor： YOMODA MINORU ,  TSUKAMOTO IZUMI

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To correctly and quickly adjust a mask and a wafer by processing matching deviation between a plurality of marks on the mask side and a plurality of marks on the wafer side based on a predetermined operational formula and adjusting transfer magnification of a transfer optical system or by moving the transfer optical system based on this processing result in order to adjust transfer deviation. CONSTITUTION:In an optical path of laser light l to be emitted from a laser light source 10, standard masks 16 and transfer optical systems 17 having correct alignment marks 1 as well as standard wafers 18 having correct alignment marks 2 are arranged at a plurality of spots respectively, while pulse-shaped output is detected at the spot, where laser light l on A in a photoelectric converter element 20 intersects the alignment marks 1 and 2 to measure the alignment marks 1 and 2 at two spots separated by the distances C and D in the directions x and y in the standard masks 16 and the standard wafers 18 respectively to find a matching deviation amount. These operations are performed by an operation processing circuit 21 for performing automatic adjustment of amplification of the transfer optical system 17 based on the found amplification Mx and My by means of an adjustment mechanism 22.

公开(公告)号：JPS61243404A

公开(公告)日：1986-10-29

申请号：JP8458485

申请日：1985-04-22

Applicant: CANON KK

Inventor： YOMODA MINORU ,  HARA KOICHI

IPC: G02B5/08 ,  H01S3/101

Abstract: PURPOSE:To prevent a damage from being caused and optical characteristics from deteriorating by providing an optical reflecting mirror, a holding member fixed on the back surface of the optical reflection mirror in one body, and a temperature controller which circulates fluid after temperature control through the holding member. CONSTITUTION:The optical reflection mirror 1 is fixed to the finned holding member 3 to sufficient contacting area with good heat conductivity. The member 3 is provided with projections or fins so that heat is easily exchanged. The fluid supplied from the temperature controller after temperature control flows on the surface of the member 3 where the projections are formed. Further, a temperature sensor 7 is fitted to the reflection mirror 1 and the controller 8 controls the temperature of the fluid flowing through it by using the sensor 7. A fixing member 2 fixes the reflection mirror 1 at an accurate position. The member 2 fixes the member 3, but the member 2 may fixes the reflection mirror 1 directly. In this case, no inclusion is required to fix the reflection mirror 1, so the position precision is improved.

公开(公告)号：JPS60168149A

公开(公告)日：1985-08-31

申请号：JP2289084

申请日：1984-02-13

Applicant: CANON KK

Inventor： SATOU TERUYA ,  YOMODA MINORU

IPC: H01L21/30 ,  G03F7/20 ,  G03F9/00 ,  G11B15/26 ,  H01L21/027

Abstract: PURPOSE:To offer a position matching signal processing device which can execute a position matching with high accuracy, by selecting a threshold which can be detected with high accuracy. CONSTITUTION:Outputs of the first and the second amplitude discriminating circuits 6, 7 connected to the first and the second amplifiers 3, 4 are connected to a controlling circuit provided with an operating part and a storage part, through a signal synthesizing circuit 8 for extracting selectively only a necessary signal component and synthesizing it. On the other hand, outputs of the first or the second amplifiers 3, 4, which have passed through a switch 5 are provided to an A/D conveter 12 through a low-pass filter 10 and a changeover switch 11, and also sent out to the controlling circuit 9. Also, outputs of the first or the second amplifiers 3, 4 further pass through a switch 13 and the transmitted to a peak holding circuit 14, and connected to the A/D converter 12 through the changeover switch 11. The controlling crcuit 9 stores and calculates a value obtained from the A/D converter 12 and the signal synthesizing circuit 8, also sends out a calculated threshold to the first and the second amplitude discriminating circuits 6, 7, and also transmits a switching instructing signal to the changeover switches 5, 11 and the switch 13.

公开(公告)号：JPS60150630A

公开(公告)日：1985-08-08

申请号：JP563784

申请日：1984-01-18

Applicant: CANON KK

Inventor： HIRAGA RIYOUZOU ,  YOMODA MINORU

IPC: H01L21/30 ,  G01S7/481 ,  G01S7/491 ,  G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To shorten the detection time while simplifying the constitution of the titled device by a method wherein the detection signals on a detection regional surface are utilized as synchronous signals of pattern signals as well as a threshold voltage of signal detection. CONSTITUTION:A photoreceiving surface 18a on the central part of a photodetector 18 outputs signals informing an amplifier 51 of the status that scanning beams for detection are scanning of a detection region whenever it is detected. The amplifier 51 outputs the amplified signals to a voltage comparator 58 and an A/D converter 54. The signals on a photoreceiving surface 18a outputted to the A/D converter 54 are converted into digital signals to be transmitted to a processing circuit 57. The level of signals from the first time scanning beams inputted in the processing circuit 57 is detected by the circuit 57 to be outputted to a D/A converter 53 after deciding the threshold level by processing. This threshold voltage is utilized as the reference voltage of the voltage comparator 58. This voltage comparator 58 compares the output of the amplifier 51 by the second time scanning beams with the reference voltage to output signals while the scanning beams for detection are scanning on the detection region.

公开(公告)号：JPS60150629A

公开(公告)日：1985-08-08

申请号：JP563684

申请日：1984-01-18

Applicant: CANON KK

Inventor： HIRAGA RIYOUZOU ,  YOMODA MINORU

IPC: H01L21/30 ,  G01S7/481 ,  G01S7/491 ,  G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To improve the signal detection ratio by a method wherein photoelectric elements correspond to any detected patterns in the diffractive direction to be divided for arrangement in the radial direction so that specified signals may be detected by means of selective combination of each photoelectric element. CONSTITUTION:A photodetector 18 is composed of the photoreceiving surfaces 18b1-b4, 18c1-c4, 18e1-e4 respectively divided to receive signals independently. When mark patterns 12a, 13a, 12b are detected, the sum of signals transmitted from the photoreceiving surfaces 18b1, 18c1, 18d1, 18e1, 18b3, 18c3, 18d3, 18e3 will become the mark signals (A channel) while the sum of signals transmitted from the photoreceiving surfaces 18b2, 18c2, 18d2, 18e2, 18b4, 18c4, 18d4, 18e4 will become the noise signals (B channel). Fig. (a) represents the output if there is a dirt 42 on the scanning line when patterns on a mask and a wafer are scanned, while Figs. (b) and (c) respectively represent the outputs of A channel and B channel. On the other hand, Figs, (d)-(f) represent the signals passing through the differential amplifier processing A-B channels to restrain any noise due to a dirt signal from sounding while augmenting pattern S/N.

公开(公告)号：JPS60150628A

公开(公告)日：1985-08-08

申请号：JP563584

申请日：1984-01-18

Applicant: CANON KK

Inventor： HIRAGA RIYOUZOU ,  YOMODA MINORU

IPC: H01L21/30 ,  G01S7/481 ,  G01S7/491 ,  G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To avoid an erroneous detection due to dirt, etc. by a method wherein, in a photoelectric detector for relative alignment device of two items such as mask and wafer in a semiconductor baking device, the photoreceiving surface of a photodetector is divided into two surfaces i.e. for detecting pattern and for receiving scattering light. CONSTITUTION:A photodetector 18 is composed of the photoreceiving surfaces 18a, 18b1-b4, 18c1-c4, 18d1-d4, 18e1-e4 respectively divided to receive signals independently. The central photoreceiving surface 18a receives the normal reflecting light of photoscanning beams. In such a constitution, it is recognized that photoscanning beams are scanning the detecting region while enabling synchroneous signals to be transmitted from a postprocessing circuit and reflecting power of a detected item to be measured. When a mark pattern 12a is detected, the sum of signals transmitted from the photoreceiving surfaces 18b1, 18c1, 18d1, 18b3, 18c3, 18d3, 18e3 will become the mark signals while the sum of signals transmitted from the photoreceiving surfaces 18b2, 18c2, 18d2, 18e2, 18b4, 18c4, 18d4, 18e4 will become the noise signals. When the mark signals and the noise signals are detected by said procedures, any noise signal synchronized with the amount almost similar to that of scattering light due to dirt, etc. contained in the mark signals may be detected easily.

公开(公告)号：JPS60146675A

公开(公告)日：1985-08-02

申请号：JP5084

申请日：1984-01-05

Applicant: CANON KK

Inventor： HIRAGA RIYOUZOU ,  YOMODA MINORU

IPC: H01L21/683 ,  B24B37/04 ,  B24B37/30 ,  B24B41/06 ,  H01L21/67

Abstract: PURPOSE:To hold a work, such as a wafer, etc., of different shape and size with a sufficient strength and correct properly it flatness by using a porous material in the adsorption area of a chuck body. CONSTITUTION:A water chuck body 5 has 6 adsorption members in its inner side and also 6 adsorption members in its outer side 6b, 6e, 6h, 6k, each of them having a separate and independent adsorption surface. Each adsorption member is formed with a porous material of calcined porous metal for example, and is fixed and supported on each of grooves 6b', 6e', 6h', 6k' formed on the body 5. These grooves are each connected to the vacuum pumps through respective pipe lines 10b, 10e, 10h, 10k and respective electromagnetic valves 8b, 8e, 8h, 8k. Based on the electric signals from vacuum gauges 7b, 7e, 7h, 7k, the electromagnetic valves are open/close-controlled by an arithmetic operation control circuit 9 to adjust the degree of vacuum of each adsorption member independently and exclucively, and a wafer W of different shape and size is held by the chuck body 5 in the state that its flatness is corrected.

公开(公告)号：JPS60105232A

公开(公告)日：1985-06-10

申请号：JP21249183

申请日：1983-11-14

Applicant: CANON KK

Inventor： YAMAMURA MITSUGI ,  YOMODA MINORU

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To save the time for measurement and realize accurate and quick focusing by moving the wafer in vertical for the specified distance for focusing during movement in the horizontal direction to the predetermined region by making use of position data of a plurality of detector at the time of preceding focusing. CONSTITUTION:When a wafer 4 moves upward by the drive of piezo-element 23, amount of drive is detected by air sensor nozzles 34, 35, 36, 37 and an eddy current type position detector 22 and then can also be measured. A differential amplifier 45 sequentially compares amount of drive of wafer by piezoelement 23 detected by the eddy current type position detector 22 and amount of drive indicated by a micro processor 40 and drives wafers until such difference is ranged within the range of error. As a result, surface of wafer 4 is accurately located to the predetermined focusing surface position. As a first detector, a photoelectric reflection type displacement member max be used in addition to the air microsensor displacement meter. As a second detector, measurement can be realized with high accuracy even by using an electrostatic capacitance type displacement meter is addition to the eddy current type displacement meter.

公开(公告)号：JPS60105231A

公开(公告)日：1985-06-10

申请号：JP21249083

申请日：1983-11-14

Applicant: CANON KK

Inventor： YAMAMURA MITSUGI ,  YOMODA MINORU

IPC: G03F7/20 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To realize high response and high precision position matching by using two independent detectors in accordance with the functions thereof. CONSTITUTION:When a wafer 4 moves upward or downward with the drive of piezo-element 23, amount of drive is detected by air sensor nozzles 34, 35, 36, 37 and an eddy current type position detector 22 and can be measured. An output of eddy current type position detector 22 is converted to a voltage proportional to a displacement by a displacement voltage conversion circuit 48 and is then output to a differential amplifier 45 and an ananog-digital converter 47. The differential amplifier 45 sequentially compares amount of drive of wafer 4 by piezo-element 23 detected by the eddy current type position detector 22 and amount of drive indicated by a microprocessor 40 and drives wafers until a difference is ranged within the range of error. As a result, the surface of wafer 4 can be positioned with a high accuracy to the predetermined focusing surface position.