公开(公告)号：JP2003246930A

公开(公告)日：2003-09-05

申请号：JP2002048210

申请日：2002-02-25

Applicant: JSR CORP

Inventor： HANAMURA MASAAKI ,  KONNO KEIJI ,  KUMANO KOJI ,  BESSHO NOBUO

IPC: G03F7/004 ,  C08K5/00 ,  C08L83/04 ,  C08L101/00 ,  G02B1/04 ,  G02B3/00 ,  G02B5/18 ,  G02B6/00 ,  G02B6/12 ,  G03H1/02

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive and refractive-index variable composition capable of varying the refractive-index of a material by a simple method, forming a thick film, imparting a sufficient large value of a varied refractive- index difference and affording a stable refractive-index pattern or an optical material without relying on service conditions thereafter. SOLUTION: The radiation-sensitive and refractive-index variable composition comprises (A) a degradable compound, (B) a nondegradable compound selected from the group consisting of a ladder type polysilsesquioxane, its hydrolyzate and a condensate thereof and having a lower refractive-index than that of the degradable compound (A), (C) a radiation-sensitive degrading agent and (D) a stabilizer. The components (C) and (A) in a part exposed to radiation are degraded to cause a difference between the part exposed to the radiation and a part unexposed to the radiation in the refractive index by exposing the composition through a pattern mask to the radiation. Thereby, the pattern having the different refractive-index is formed. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2012256023A

公开(公告)日：2012-12-27

申请号：JP2012034894

申请日：2012-02-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  YAMATO FUTOSHI ,  GUANG ZHAO REN ,  SAKO AKARI ,  TAKEKAWA JUN

IPC: G03F7/004 ,  G03F7/023

CPC classification number: C08L61/12 ,  G03F7/0226 ,  G03F7/0236 ,  G03F7/0751

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of forming a cured film having small internal stress; a cured film formed from the composition; and an electronic part including the cured film.SOLUTION: The photosensitive composition includes:(A) an alkali soluble resin; (B) a photosensitive compound; and (C) a crosslinking agent. The photosensitive composition includes at least a novolak resin (A1) as the alkali soluble resin (A), with a content ratio of the novolak resin (A1) being at least 80% by mass, and includes at least a compound represented by the following formula (C1) as the crosslinking agent (C). [In the formula, Ris an alkyl group having 1 to 6 carbon atoms or the like; Ris a hydroxyl group or the like; Ris a (a+1)valent hydrocarbon group or the like; Ris a (c+1)valent hydrocarbon group or the like; and Ris a single bond or the like.]

Abstract translation: 要解决的问题：提供能够形成具有小内应力的固化膜的光敏组合物; 由该组合物形成的固化膜; 以及包含固化膜的电子部件。 光敏组合物包括：（A）碱溶性树脂; （B）光敏化合物; 和（C）交联剂。 感光性组合物至少包含作为碱溶性树脂（A）的酚醛清漆树脂（A1），酚醛清漆树脂（A1）的含有比例为至少80质量％，并且至少包含下述化合物 式（C1）作为交联剂（C）。 [式中，R 1是具有1-6个碳原子的烷基等; R 2是羟基或类似物; （A + 1）价烃基等; （C + 1）价烃基等; 并且R 4 是单键等。]

版权所有：（C）2013，JPO＆INPIT

公开(公告)号：JP2012193232A

公开(公告)日：2012-10-11

申请号：JP2011056340

申请日：2011-03-15

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MATSUKI TOMOHIRO ,  HANAMURA MASAAKI

IPC: C08G59/20 ,  C08L63/00 ,  H01L21/316 ,  H01L21/76 ,  H01L33/56

Abstract: PROBLEM TO BE SOLVED: To provide a curable composition formable of a cured film that does not cause dimples, is free from peeling and cloudiness and is homogeneous, and has a flat surface even when embedding in a wide trench is performed by an application method.SOLUTION: The curable composition contains the following components (A) to (C). The component (A): an epoxy group-containing polysiloxane having a leaving group, wherein the content rate of the leaving group is 35 mol% or less, assuming that the total number of Si atoms included in the polysiloxane is 100 mol%; the component (B): a silicone-based surfactant; and the component (C): a solvent.

Abstract translation: 解决问题的方案为了提供可形成不会产生凹坑的固化膜的固化性组合物，不会脱落和混浊并且均匀，并且即使嵌入宽沟槽中也具有平坦表面，由 申请方式。 解决方案：可固化组合物包含以下组分（A）至（C）。 组分（A）：具有离去基团的含环氧基的聚硅氧烷，假定聚硅氧烷中包含的Si原子总数为100摩尔％，其中离去基团的含量为35摩尔％以下。 组分（B）：硅氧烷基表面活性剂; 和组分（C）：溶剂。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011095433A

公开(公告)日：2011-05-12

申请号：JP2009248332

申请日：2009-10-28

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  MURATA MEGUMI ,  ARAI MASAFUMI

IPC: G03F7/023 ,  C08F12/02 ,  C08F20/02

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation sensitive resin composition, from which an interlayer insulating film can be formed, the film having high radiation sensitivity and development margin and excellent heat resistance, solvent resistance, low dielectric property, transmittance for rays, resistance against light and resistance against dry etching. SOLUTION: The positive radiation sensitive resin composition contains [A] an alkali-soluble resin having a hindered amine structure and/or a hindered phenol structure and [B] a 1,2-quinone diazide compound. The component [A] can be preferably a copolymer obtained from (a1) at least one kind of monomer selected from unsaturated carboxylic acid and unsaturated carboxylic acid anhydride and (a2) an acrylic acid ester unit containing a hindered amine structure and/or a hindered phenol structure, and in addition to the compounds of (a1) and (a2), (a3) a monomer containing an epoxy group-containing unsaturated compound. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供可以形成层间绝缘膜的正辐射敏感性树脂组合物，该膜具有高的辐射敏感性和显影边缘，并且具有优异的耐热性，耐溶剂性，低介电性，对于 光线抗光，耐干蚀刻。 解决方案：正射线敏感性树脂组合物含有[A]具有受阻胺结构和/或受阻酚结构的碱溶性树脂，[B] 1,2-醌二叠氮化合物。 组分[A]可以优选是由（a1）至少一种选自不饱和羧酸和不饱和羧酸酐的单体获得的共聚物和（a2）含有受阻胺结构和/或受阻的丙烯酸酯单元 苯酚结构，除（a1）和（a2）的化合物外，（a3）含有含环氧基的不饱和化合物的单体。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011090163A

公开(公告)日：2011-05-06

申请号：JP2009243823

申请日：2009-10-22

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  HANAMURA MASAAKI

IPC: G03F7/023 ,  C08F299/00 ,  G02F1/1333 ,  G03F7/004 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a polysiloxane-based positive radiation-sensitive composition which enables to form an interlayer insulating film having a sufficiently high surface hardness and is excellent in melt flow resistance in a heating step after development.
SOLUTION: The positive radiation-sensitive composition contains [A] a siloxane polymer, [B] a (meth)acryloyl group-containing polymer, and [C] a quinonediazide compound, wherein the siloxane polymer [A] may be a hydrolytic condensation product of a hydrolyzable silane compound. The positive radiation-sensitive composition may further contain [D] a thermosensitive acid generator or a thermosensitive base generator.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够形成具有足够高的表面硬度并且显影后的加热步骤中的熔体流动阻力优异的层间绝缘膜的基于聚硅氧烷的正性辐射敏感性组合物。 阳离子敏感性组合物含有[A]硅氧烷聚合物，[B]（甲基）丙烯酰基聚合物和[C]醌二叠氮化合物，其中硅氧烷聚合物[A]可以是 水解性硅烷化合物的水解缩合产物。 正性辐射敏感组合物还可以含有[D]热敏酸产生剂或热敏碱产生剂。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011081268A

公开(公告)日：2011-04-21

申请号：JP2009234626

申请日：2009-10-08

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  HANAMURA MASAAKI

IPC: G03F7/023 ,  C08G77/50 ,  C08G77/60 ,  G02F1/1333 ,  G03F7/004 ,  G03F7/075

Abstract: PROBLEM TO BE SOLVED: To provide a polysiloxane-based positive radiation-sensitive composition capable of forming an interlayer dielectric excellent especially in low dielectric property, in addition to heat resistance, transparency and solvent resistance, and having sufficient radiation sensitivity and storage stability. SOLUTION: The positive radiation-sensitive composition includes [A] a hydrolysis condensate acquired by (a3) hydrolyzing and condensing, in the presence of a catalyst, (a1) polycarbosilane having a hydrolyzable group and (a2) a silane monomer having a hydrolyzable group, and [B] quinonediazide compound. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 待解决的问题：除了具有耐热性，透明性和耐溶剂性以及具有足够的辐射敏感性和储存性之外，还提供能够形成特别优异的低介电特性的层间电介质的基于聚硅氧烷的正性辐射敏感性组合物 稳定性。 阳离子敏感性组合物包括[A]在催化剂存在下通过（a3）水解和缩合获得的水解缩合物，（a1）具有可水解基团的聚碳硅烷和（a2）具有 可水解基团和[B]醌二叠氮化合物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010134422A

公开(公告)日：2010-06-17

申请号：JP2009195974

申请日：2009-08-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KINOSHITA YOSHINORI ,  HANAMURA MASAAKI ,  DOI TAKASHI ,  TAKASE HIDEAKI

IPC: G03F7/023 ,  G02B1/04 ,  G02B3/00 ,  G03F7/004 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivity to radiation and having such a development margin that desirable pattern configuration is formed even when the optimum development time is exceeded in the development step.
SOLUTION: The radiation-sensitive resin composition includes [A] an alkali-soluble resin, [B] a 1,2-quinonediazide compound, and [C] a compound having at least one ethylenically unsaturated bond per molecule and having a skeleton derived from trimethylolpropane or pentaerythritol or an isocyanurate skeleton. The alkali-soluble resin [A] may be a copolymer of unsaturated compounds including (a1) an unsaturated carboxylic acid and/or unsaturated carboxylic anhydride and (a2) an epoxy group-containing unsaturated compound.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供对辐射具有高灵敏度的辐射敏感性树脂组合物，并且具有即使在显影步骤中超过最佳显影时间时形成所需图案构型的显影余量。 解决方案：辐射敏感性树脂组合物包括[A]碱溶性树脂，[B] 1,2-醌二叠氮化合物和[C]每分子具有至少一个烯属不饱和键的化合物，并具有 衍生自三羟甲基丙烷或季戊四醇的骨架或异氰脲酸酯骨架。 碱溶性树脂[A]可以是包含（a1）不饱和羧酸和/或不饱和羧酸酐的不饱和化合物和（a2）含环氧基的不饱和化合物的共聚物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009229892A

公开(公告)日：2009-10-08

申请号：JP2008076158

申请日：2008-03-24

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ONUMA YUUKI ,  HANAMURA MASAAKI ,  HAMADA KENICHI ,  IIJIMA TAKAHIRO

IPC: G03F7/075 ,  C08F220/00 ,  C08G59/40 ,  G02B1/04 ,  G02B3/00 ,  G03F7/023

Abstract: PROBLEM TO BE SOLVED: To provide an inter-layer insulating film and a radiation-sensitive resin composition suitable for forming a microlens, which have a high radiation-sensitive sensitivity and an excellent development margin, and with which a pattern thin film with excellent adhesion with a ground can be easily formed. SOLUTION: The radiation-sensitive resin composition contains: a copolymer of an unsaturated mixture containing at least one type chosen from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride and at least one type chosen from the group of an oxiranyl group-containing unsaturated compound and an oxetanyl group-containing unsaturated compound; a 1, 2-quinonediazide compound; and silsesquioxane having a 6-15C aryl group. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种适合于形成微透镜的层间绝缘膜和辐射敏感性树脂组合物，其具有高的辐射敏感性和优异的显影余量，并且通过其形成图案薄膜 能够容易地形成与地面的良好粘附性。 解决方案：辐射敏感性树脂组合物包含：含有选自不饱和羧酸和不饱和羧酸酐中的至少一种类型的不饱和混合物的共聚物和选自不饱和羧酸和不饱和羧酸酐的至少一种， 含环氧乙烷基的不饱和化合物和含氧杂环丁烷基的不饱和化合物; 1,2-醌二叠氮化合物; 和具有6-15个C的芳基的倍半硅氧烷。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008242078A

公开(公告)日：2008-10-09

申请号：JP2007082648

申请日：2007-03-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MINOWA TAKAKI ,  SHIRATO KAORI ,  HANAMURA MASAAKI ,  MATOBA TAKUMI ,  KOIDE TOSHIYUKI

IPC: G03F7/075 ,  G02B5/20 ,  G03F7/004 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation-sensitive composition for colored layer formation giving pixels and a black matrix which are excellent in adhesion to a substrate and solvent resistance even at a small amount of light exposure and produce no residue on development. SOLUTION: The radiation-sensitive composition for colored layer formation comprises (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, (D) a photopolymerization initiator and (E) a siloxane oligomer containing at least one functional group selected from the group comprising an oxiranyl group, an oxetanyl group, an episulfide group, a vinyl group, an allyl group, a (meth) acryloyl group, a carboxyl group, a hydroxyl group, a mercapto group, an isocyanate group, an amino group, a ureido group and a styryl group. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供用于着色层形成的新的辐射敏感组合物，给出像素和黑矩阵，其即使在少量的曝光下也具有优异的与基片的粘附性和耐溶剂性，并且不产生残留物 发展。 解决方案：用于着色层形成的辐射敏感组合物包含（A）着色剂，（B）碱溶性树脂，（C）多官能单体，（D）光聚合引发剂和（E）硅氧烷低聚物 含有至少一个选自环氧乙烷基，氧杂环丁烷基，环硫基，乙烯基，烯丙基，（甲基）丙烯酰基，羧基，羟基，巯基， 异氰酸酯基，氨基，脲基和苯乙烯基。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008225162A

公开(公告)日：2008-09-25

申请号：JP2007064660

申请日：2007-03-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MITANI KOJI ,  IIJIMA TAKAHIRO ,  KAJITA TORU ,  HAMADA KENICHI ,  HANAMURA MASAAKI

IPC: G03F7/023 ,  C08F220/04 ,  C08F220/28 ,  G02B1/04 ,  G02B3/00 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having a sufficient process margin and good storage stability and giving a cured product having heat and solvent resistances, transparency and adhesion to a substrate required as an interlayer insulation film or a microlens. SOLUTION: The radiation-sensitive resin composition comprises: a copolymer of an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, a (meth)acryloyloxyalkyloxetane and another olefinically unsaturated compound; a 1,2-quinonediazide compound; and an epoxy group-containing compound and/or another oxetanyl group-containing compound. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供具有足够的工艺余量和良好的储存稳定性的辐射敏感性树脂组合物，并提供具有耐热和耐溶剂性的固化产物，对作为层间绝缘膜所需的基材的透明性和粘附性 微透镜。 解决方案：辐射敏感性树脂组合物包括：不饱和羧酸和/或不饱和羧酸酐的共聚物，（甲基）丙烯酰氧基烷氧基乙烷和另一种烯属不饱和化合物; 1,2-醌二叠氮化合物; 和含环氧基的化合物和/或其它含氧杂环丁烷基的化合物。 版权所有（C）2008，JPO＆INPIT