公开(公告)号：GB2393447A

公开(公告)日：2004-03-31

申请号：GB0317224

申请日：2003-07-23

Applicant: KAO CORP

Inventor： KITAYAMA HIROAKI ,  FUJII SHIGEO ,  OSHIMA YOSHIAKI ,  HAGIHARA TOSHIYA

IPC: C09G1/02

Abstract: A polishing composition comprising an abrasive, water and an organic acid or a salt thereof, wherein the composition has a specified viscosity of from 1.0 to 2.0 mPa Ò s at a shearing rate of 1500 s and 25{C; and a roll-off reducing agent comprising a BrÎnsted acid or a salt thereof, having an action of lowering viscosity so that the amount of viscosity lowered is 0.01 mPa Ò s or more, wherein the amount of viscosity lowered is expressed by the following equation: (Amount of Viscosity Lowered) = (Viscosity of Standard Polishing Composition) - (Viscosity of Roll-Off Reducing Agent-Containing Polishing Composition), wherein the standard polishing composition is prepared which comprises 20 parts by weight of an abrasive, said abrasive being high-purity alumina having Al2O3 purity of 98.0% by weight or more composed of a -type co-random crystal, 1 part by weight of citric acid, and 79 parts by weight of water; the roll-off reducing agent-containing polishing composition is prepared which comprises 20 parts by weight of an abrasive, said abrasive being high-purity alumina having Al2O3 purity of 98.0% by weight or more composed of a -type co-random crystal, 1 part by weight of citric acid, 78.9 parts by weight of water and 0.1 parts by weight of a roll-off reducing agent; and the viscosity is a viscosity at a shearing rate of 1500 s and 25{C.

公开(公告)号：JP2009057570A

公开(公告)日：2009-03-19

申请号：JP2008273593

申请日：2008-10-23

Applicant: Kao Corp ,  花王株式会社

Inventor： FUJII SHIGEO

IPC: C11D7/18 ,  C11D7/08 ,  C11D7/10 ,  C11D7/26

Abstract: PROBLEM TO BE SOLVED: To provide a rinse agent composition to be used for producing a memory hard disk substrate on the surface of which there is no defect (no scratch and no pit) and on which no abrasive grain and no grinding swarf is left behind by preventing abrasive grains or grinding swarf to be produced by grinding work from being left behind or removing the remainders of the abrasive grains and the swarf, and to provide a method for producing the memory hard disk substrate by using the rinse agent composition. SOLUTION: The rinse agent composition for the memory hard desk substrate contains water and hydrogen peroxide. The method for producing the memory hard desk substrate comprises a step of rinsing the memory hard desk substrate by using the rinse agent composition. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于生产表面上没有缺陷（无划痕和无凹坑）的记忆硬盘基板的清洗剂组合物，其上没有磨粒和无研磨屑 通过防止研磨作业产生的磨料颗粒或研磨屑留下或除去磨粒和切屑的剩余部分而留下，并提供通过使用漂洗剂组合物来生产记忆硬盘基材的方法 。 解决方案：用于存储硬桌面底物的漂洗剂组合物含有水和过氧化氢。 用于生产记忆硬桌面基板的方法包括通过使用漂洗剂组合物来冲洗存储硬性桌面基板的步骤。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2005023266A

公开(公告)日：2005-01-27

申请号：JP2003270150

申请日：2003-07-01

Applicant: Kao Corp ,  花王株式会社

Inventor： KITAYAMA HIROAKI ,  FUJII SHIGEO

IPC: B24B37/00 ,  C09G1/02 ,  C09K3/14 ,  C09K13/00 ,  G11B5/84 ,  G11B7/26 ,  G11B11/105

CPC classification number: C09G1/02 ,  C09K3/1463

Abstract: PROBLEM TO BE SOLVED: To provide a polishing liquid composition that has a high polishing speed and is capable of reducing the waviness of a substrate to be polished, to provide a method for reducing the waviness of the substrate to be polished using the polishing liquid composition and to provide a process for producing a high-quality substrate with reduced waviness using the polishing liquid composition. SOLUTION: The polishing liquid composition comprises α-alumina, an intermediate alumina, an oxidizing agent and water. The method for reducing the waviness of the substrate to be polished uses the polishing composition. The process for producing the substrate has a step of polishing the substrate to be polished using the polishing liquid composition. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种具有高抛光速度并且能够降低待抛光的基材的波纹的抛光液组合物，以提供一种降低待抛光的基板的波纹的方法，该方法使用 抛光液组合物，并提供使用抛光液组合物生产具有降低波纹度的高质量基材的方法。 解决方案：抛光液组合物包含α-氧化铝，中间氧化铝，氧化剂和水。 用于降低待抛光的基底的波纹的方法使用抛光组合物。 制造基板的方法具有使用抛光液组合物研磨待研磨的基板的工序。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004204116A

公开(公告)日：2004-07-22

申请号：JP2002376430

申请日：2002-12-26

Applicant: Kao Corp ,  花王株式会社

Inventor： FUJII SHIGEO ,  KITAYAMA HIROAKI

IPC: B24B37/00 ,  C09K3/14 ,  G11B5/84 ,  H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide a small undulation reducing agent to efficiently reduce the small undulation of a substrate, a polishing liquid composition containing the small undulation reducing agent, a method for reducing the undulation of a substrate for a precision part using the polishing liquid composition and a method for producing a substrate using the polishing liquid composition. SOLUTION: The small undulation reducing agent for the polishing of a substrate for a precision part is composed of a surfactant having ≥2 ionic hydrophilic groups. The polishing liquid composition for the substrate of a precision part contains the small undulation reducing agent, an abrasive and water. The method for reducing the small undulation of the substrate for precision part uses the polishing liquid composition. The method for producing the substrate has a step to polish the object substrate with the polishing liquid composition. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2003003156A

公开(公告)日：2003-01-08

申请号：JP2001188722

申请日：2001-06-21

Applicant: Kao Corp ,  花王株式会社

Inventor： FUJII SHIGEO ,  YOSHIDA HIROYUKI

IPC: B24B53/017 ,  C09K3/14 ,  G11B5/84 ,  H01L21/304 ,  B24B37/00

Abstract: PROBLEM TO BE SOLVED: To provide both a clogging preventing agent composition for a polishing pad capable of reducing the clogging of the polishing pad and preventing lowering of the polishing rate or occurrence of surface defects such as pits even in continuous polishing and a method for producing a substrate to be polished using the clogging preventing agent composition for the polishing pad. SOLUTION: This clogging preventing agent composition for the polishing pad is used in polishing of a material to be polished containing nickel. The clogging preventing agent composition comprises >=0.01 and

Abstract translation: 要解决的问题：即使在连续抛光中也能够提供能够减少抛光垫的堵塞并且防止抛光速率的降低或诸如凹坑的表面缺陷的发生的抛光垫的防堵剂组合物和制造方法 使用用于抛光垫的防堵剂组合物进行抛光的基材。 解决方案：用于抛光垫的这种堵塞防止剂组合物用于抛光含镍的材料。 堵塞防止剂组合物包含由选自由具有OH基团或SH基团的2-20C羧酸组成的组中的一种或多种化合物组成的阻燃防止剂的≥0.01和<2重量％，1- 20C单羧酸，2-3C二羧酸，2-3Cα-氨基酸，3-10C烯醇有机酸及其盐和水。 用于制造待抛光的基材的方法包括用用于抛光垫的防堵剂组合物抛光基材。

公开(公告)号：JP2000315667A

公开(公告)日：2000-11-14

申请号：JP12269199

申请日：1999-04-28

Applicant: KAO CORP

Inventor： HASHIMOTO RYOICHI ,  YONEDA YASUHIRO ,  FUJII SHIGEO

IPC: B24B37/00 ,  C09K3/14 ,  H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide an abrasive composition which enhances the polishing rate of a metal film and is superior in prevention effects such as dishing, or the like of a metal siring layer, in a polishing surface having an insulation layer and metal layer. SOLUTION: An abrasive composition which polishes a surface to be polished having an insulation layer and a metal layer contains an acrylic acid system polymer, an organic acid, and water, and is an abrasive composition (a first abrasive composition) of pH 7 or lower, further an abrasive composition (a second abrasive composition) containing an oxidizing agent, and an abrasive composition (a third abrasive composition) containing the first or second abrasive composition, and further an abrasive.

公开(公告)号：JPH09205012A

公开(公告)日：1997-08-05

申请号：JP3145596

申请日：1996-01-24

Applicant: KAO CORP

Inventor： ARIKITA SHIYUUHEI ,  HAMA YOSHINORI ,  FUJII SHIGEO ,  IGAKI MICHIHITO

IPC: C01G49/00 ,  H01F1/00 ,  H01F1/06

Abstract: PROBLEM TO BE SOLVED: To obtain unwelded and high performance metal magnetic powders by a method wherein, after a wet cake having a moisture content percentage that a dried granulate has a specific critical moisture content percentage or more is formed and granulated, it is dried without operating an outer force. SOLUTION: In a method for manufacturing metal magnetic powders that, from a suspension slurry of iron compound powders containing a moisture content ion oxide or an ion oxide as a main body, its dried granulate is obtained and reduced by reduction gas to obtain metal magnetic powders, after a wet cake having a moisture content percentage that a dried granulate has a critical moisture content percentage or more (a moisture content percentage in the case where the suspension slurry of iron compound powders is kneaded at a constant rate and dried, when an increment from a base value of a kneaded dynamic force becomes 10% the increment corresponding to the maximum value of the kneaded dynamic force) is formed and granulated, it is dried without operating an outer force. Thereby, as there are not a needle-shaped deformation due to the influences of generated vapor or sintering among skeleton particles, it is possible to manufacture metal magnetic powders having excellent magnetic characteristics.

公开(公告)号：JPS61179264A

公开(公告)日：1986-08-11

申请号：JP2025585

申请日：1985-02-05

Applicant: KAO CORP

Inventor： WAKASA MASANOBU ,  FUJII SHIGEO ,  TAKEDA TSUNESHI

IPC: C09C1/00 ,  C09B67/02 ,  C09B67/20 ,  C09C1/40

Abstract: PURPOSE:To obtain an alumina carrier having such excellent properties that it can adsorb an org. dye to allow the dye to be enclosed therein, its pores can be sealed and it absorbs less visible light, by treating an aq. suspension of porous intermediate alumina with an acid and drying or firing it. CONSTITUTION:An aq. dispersion of porous intermediate alumina is treated with an acid at a pH of 2-6.5 under an equilibrium condition and the treated alumina is dried and/or fired to obtain the desired alumina carrier which is porous alumina which has a specific surface area of 10m /g or above and a particle size of 0.03-100mu, whose 2.4wt% aq. dispersion has a pH of 3.0-6.5 and at least part of which is converted into hydrated alumina when treated with water at 70-250 deg.C. Alternatively, the alumina carrier can be prepd. in such a manner (i) that hydrated alumina or porous intermediate alumina is mixed with an ammonium salt powder or is brought into contact with an ammonium salt soln. and the mixture is fired, or (ii) that hydrated alumina or porous intermediate alumina is fired in a hydrogen chloride atmosphere.

公开(公告)号：JP2008163154A

公开(公告)日：2008-07-17

申请号：JP2006353244

申请日：2006-12-27

Applicant: Kao Corp ,  花王株式会社

Inventor： FUJII SHIGEO ,  SUENAGA KENICHI

IPC: C09K3/14 ,  B24B37/00

Abstract: PROBLEM TO BE SOLVED: To provide a method for production of a polishing liquid composition containing aluminum oxide particle as abrasive grain, to provide a production method of a polishing liquid composition for producing a hard disc substrate, which composition can decrease sticking of the aluminium oxide particle to the substrate and undulation and is obtained by the production method, and to provide a polishing liquid composition obtained by the production method. SOLUTION: The method for production of a polishing liquid composition containing aluminum oxide particle is provided. The particle has 0.1-0.7 μm volume median particle diameter of secondary particle and the content of particles having ≥1 μm diameter is ≤0.2 wt.%. The production method comprises a step for supplying a suspension of 5-50 wt.% aluminum oxide particle to the inside of a classification cylinder of a wet classifier and a step for discharging the liquid after classification from an outlet set above the inlet. The average flow rate of the suspension, in the upward vertical direction in the classification cylinder is 0.1-3 mm/min and the temperature of the suspension is within a range of 1-70°C. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 解决方案：提供一种生产含有氧化铝颗粒作为磨粒的抛光液组合物的方法，以提供用于制造硬盘基材的抛光液组合物的制备方法，该组合物可以减少 通过该制造方法得到基板上的氧化铝颗粒和起伏，并提供通过该制造方法获得的抛光液组合物。 解决方案：提供含有氧化铝颗粒的抛光液组合物的制造方法。 颗粒的二次颗粒的体积中值粒径为0.1-0.7μm，直径≥1μm的颗粒的含量≤0.2重量％。 该制造方法包括将5-50重量％的氧化铝粒子的悬浮液供给到湿式分选机的分级圆筒的内部的步骤，以及从入口上方的出口排出液体的步骤。 悬浮液在分级圆筒中的向上垂直方向上的平均流速为0.1-3mm / min，悬浮液的温度在1-70℃的范围内。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007168057A

公开(公告)日：2007-07-05

申请号：JP2005373088

申请日：2005-12-26

Applicant: Kao Corp ,  花王株式会社

Inventor： SUENAGA KENICHI ,  FUJII SHIGEO

IPC: B24B37/00 ,  G11B5/84

Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method of a magnetic disc substrate which attains practical polishing speed and reducing the piercing of the substrate with aluminum oxide particles.
SOLUTION: This manufacturing method of the magnetic disk substrate is constituted by having a rough polishing process to polish the substrate by using a polishing liquid composite A containing the aluminum oxide particles an average secondary grain diameter (D
Al ) of which is 0.1 to 0.7 μm and acid and a finishing polishing process to polish the substrate provided in the rough polishing process by using a polishing liquid composite B containing colloidal particles, a polishing load P of the rough polishing process satisfies an expression (1); 74-(40×D
Al )≤P≤138-(80×D
Al ), and polishing quantity R of the finishing polishing process satisfies an expression (2); {P×(D
Al )
2 +10}×0.01≤R≤0.5. Hereby, D
Al , P and R are respectively expressed in μm, g/cm
2 and μm units.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种获得实际的抛光速度并减少氧化铝颗粒对基板的刺穿的磁盘基板的制造方法。 解决方案：该磁盘基板的制造方法是通过使用含有氧化铝颗粒的抛光液复合材料A进行粗抛光处理以抛光基板，平均二次晶粒直径（D SB>）为0.1〜0.7μm，通过使用含有胶体粒子的研磨液复合体B，在粗抛光处理中对基板进行抛光的酸和精抛光工序，粗抛光工序的研磨负载P满足表达式 （1）; （40×D A1 ）≤P≤138-（80×D A1 ），精抛光工艺的研磨量R满足式（2）。 AP×（D 的Al ） 2 10}×0.01≤R≤0.5。 因此，D Al ，P和R分别表示为μm，g / cm 2＆lt; SP＆gt;和μm单位。 版权所有（C）2007，JPO＆INPIT