公开(公告)号：GB2477067B

公开(公告)日：2012-10-17

申请号：GB201108173

申请日：2009-11-04

Applicant: KAO CORP

Inventor： OSHIMA YOSHIAKI ,  HAMAGUCHI TAKESHI ,  SATO KANJI ,  YAMAGUCHI NORIHITO ,  DOI HARUHIKO

IPC: C09K3/14 ,  B24B37/04 ,  C09G1/02

公开(公告)号：GB2422614A

公开(公告)日：2006-08-02

申请号：GB0602057

申请日：2003-12-05

Applicant: KAO CORP

Inventor： OSHIMA YOSHIAKI ,  NISHIMOTO KAZUHIKO ,  HAGIHARA TOSHIYA

IPC: C09G1/02 ,  C09K3/14

Abstract: A polishing composition for a substrate for a memory hard disk comprises an abrasive material in an aqueous medium, wherein the abrasive material comprises silica particles having particle sizes from 5 to 120nm in an amount of 50% by volume or more, wherein the silica particles comprise (i) 10-70% by volume silica particle having particle size from 5nm to less than 40nm; (ii) 20-70% by volume silica particle having particle size from 40nm to less than 80nm; and (iii) 0.1 to 40% by volume silica particle having particle size from 80nm to 120nm;wherein said percentages are based on the whole amount of the silica particles having particle size from 5 to 120nm. By using the polishing composition an Ni-P plated substrate for a disk can be efficiently manufactured to have an excellent surface smoothness with reduced micropits.

公开(公告)号：GB2397579B

公开(公告)日：2006-06-28

申请号：GB0328253

申请日：2003-12-05

Applicant: KAO CORP

Inventor： OSHIMA YOSHIAKI ,  NISHIMOTO KAZUHIKO ,  HAGIHARA TOSHIYA

IPC: C09K3/14 ,  C09G1/02

Abstract: A polishing composition for a substrate for memory hard disk comprising water and silica particles, wherein the silica particles have a particle size distribution in which the relationship of a particle size (R) and a cumulative volume frequency (V) in a graph of particle size-cumulative volume frequency obtained by plotting a cumulative volume frequency (%) of the silica particles counted from a small particle size side against a particle size (nm) of the silica particles satisfies the above formula (1) and the above formula (2), and wherein a particle size at 90% of a cumulative volume frequency (D90) is within the range of 65 nm or more and less than 105 nm. By using the polishing composition of the present invention, there can be efficiently manufactured an Ni-P plated substrate for a disk polished to have an excellent surface smoothness, in which the micropits are effectively reduced.

公开(公告)号：GB2398075A

公开(公告)日：2004-08-11

申请号：GB0400248

申请日：2004-01-07

Applicant: KAO CORP

Inventor： SUENAGA KENICHI ,  OSHIMA YOSHIAKI ,  HAGIHARA TOSHIYA

IPC: C09G1/02 ,  C09K3/14

Abstract: A polishing composition for a substrate for memory hard disk, comprising silica particles in an aqueous medium, wherein the silica particles satisfy a specified relationship between an average particle size of the silica particles on the number basis and a standard deviation on the number basis, wherein the average particle size is obtained by a determination by transmission electron microscope (TEM) observation, and wherein a particle size and a cumulative volume frequency in a range of particle sizes of from 60 to 120 nm satisfies a specified relationship; a method of reducing microwaviness of a substrate for memory hard disk, comprising the step of polishing the substrate for memory hard disk with the polishing composition; and a method for manufacturing a substrate for memory hard disk, comprising the step of polishing an Ni-P plated substrate for memory hard disk with the polishing composition. The method can be suitably used for the manufacture of a substrate for precision parts, such as a substrate for memory hard disk.

公开(公告)号：GB2437643B

公开(公告)日：2011-01-19

申请号：GB0708008

申请日：2007-04-25

Applicant: KAO CORP

Inventor： OSHIMA YOSHIAKI ,  YAMAGUCHI NORIHITO ,  DOI HARUHIKO

IPC: C09G1/02 ,  C09K3/14

公开(公告)号：MY136689A

公开(公告)日：2008-11-28

申请号：MYPI20011882

申请日：2001-04-20

Applicant: KAO CORP

Inventor： HAGIHARA TOSHIYA ,  FUJII SHIGEO ,  OSHIMA YOSHIAKI

IPC: C09G1/02

Abstract: A ROLL-OFF REDUCING AGENT COMPRISING ONE OR MORE COMPOUNDS SELECTED FROM THE GROUP CONSISTING OF CARBOXYLIC ACIDS HAVING 2 TO 20 CARBON ATOMS HAVING EITHER OH GROUP OR GROUPS OR SH GROUP OR GROUPS, MONOCARBOXYLIC ACIDS HAVING 1 TO 20 CARBON ATOMS, AND DICARBOXYLIC ACIDS HAVING 2 TO 3 CARBON ATOMS, AND SALTS THEREOF; AND A ROLL-OFF REDUCING AGENT COMPOSITION COMPRISING A ROLL OFF-REDUCING AGENT COMPRISING ONE OR MORE COMPOUNDS SELECTED FROM THE GROUP CONSISTING OF CARBOXYLIC ACIDS HAVING 2 TO 20 CARBON ATOMS HAVING EITHER OH GROUP OR GROUPS OR SH GROUP OR GROUPS, MONOCARBOXYLIC ACIDS HAVING 1 TO 20 CARBON ATOMS, AND DICARBOXYLIC ACIDS HAVING 2 TO 3 CARBON ATOMS, AND SALTS THEREOF; AN ABRASIVE; AND WATER.

公开(公告)号：GB2402941B

公开(公告)日：2007-06-27

申请号：GB0411896

申请日：2004-05-27

Applicant: KAO CORP

Inventor： OSHIMA YOSHIAKI ,  NISHIMOTO KAZUHIKO ,  SUENAGA KENICHI ,  HAGIHARA TOSHIYA

IPC: C09G1/02 ,  B24B37/04 ,  B24D3/00 ,  C09K3/14

公开(公告)号：GB2397068B

公开(公告)日：2006-08-30

申请号：GB0327851

申请日：2003-12-01

Applicant: KAO CORP

Inventor： SUENAGA KENICHI ,  OSHIMA YOSHIAKI ,  HAGIHARA TOSHIYA

IPC: C09K3/14 ,  B24B37/00 ,  C09G1/02 ,  G11B5/84

Abstract: A polishing composition for memory hard disk containing water and silica particles, wherein the silica particles have a particle size distribution in which the relationship of a particle size (R) and a cumulative volume frequency (V) in a graph of particle size-cumulative volume frequency obtained by plotting a cumulative volume frequency (%) of the silica particles counted from a small particle size side against a particle size (nm) of the silica particles in the range of particle sizes of from 40 to 100 nm satisfy the following formula (1): V>=0.5xR+40 (1), wherein the particle size is determined by observation with a transmission electron microscope (TEM). The polishing composition of the present invention can be even more suitably used for the manufacture of a substrate for precision parts such as substrates for memory hard disks.

公开(公告)号：GB2397579A

公开(公告)日：2004-07-28

申请号：GB0328253

申请日：2003-12-05

Applicant: KAO CORP

Inventor： OSHIMA YOSHIAKI ,  NISHIMOTO KAZUHIKO ,  HAGIHARA TOSHIYA

IPC: C09G1/02 ,  C09K3/14

Abstract: A polishing composition for a substrate for memory hard disk comprising water and silica particles, wherein the silica particles have a particle size distribution in which the relationship of a particle size (R) and a cumulative volume frequency (V) in a graph of particle size-cumulative volume frequency obtained by plotting a cumulative volume frequency (%) of the silica particles counted from a small particle size side against a particle size (nm) of the silica particles satisfies the above formula (1) and the above formula (2), and wherein a particle size at 90% of a cumulative volume frequency (D90) is within the range of 65 nm or more and less than 105 nm. By using the polishing composition of the present invention, there can be efficiently manufactured an Ni-P plated substrate for a disk polished to have an excellent surface smoothness, in which the micropits are effectively reduced. Also shown is a polishing composition comprising water and silica particles from 5 to 120nm in an amount of 50% by volume or more, wherein the silica particles comprise (i) 10 to 70% by volume silica particles from 5nm to less than 40nm in size; (ii) 20 to 70% by volume silica particles from 40nm to less than 80nm in size ; and (iii) 0.1 to 40% by volume silica particles from 80nm to 120nm by size.

公开(公告)号：DE69708320T2

公开(公告)日：2002-07-11

申请号：DE69708320

申请日：1997-12-03

Applicant: KAO CORP

Inventor： OSHIMA YOSHIAKI ,  HAGIHARA TOSHIYA ,  TOGASHI HIROYASU ,  KOBAYASHI YUICHIRO ,  TAIRA KOJI

IPC: C09K3/00 ,  C09K5/04 ,  C10M111/04 ,  C10M129/16 ,  C10M129/70 ,  C10M145/36 ,  C10M145/38 ,  C10M169/04 ,  C10M171/00 ,  C10N20/00 ,  C10N30/04 ,  C10N40/30

Abstract: A refrigeration oil having a volume resistivity at 25 DEG C of not less than 1 x 10 OMEGA .cm, including (a) an ester base oil, and (b) a compound represented by the formula (1): R O(EO)m(PO)nR . In said formula, R is a hydrocarbon group having 1 to 36 carbon atoms; R is hydrogen atom, a hydrocarbon group having 1 to 36 carbon atoms, or an acyl group having 1 to 24 carbon atoms; EO is oxyethylene group; PO is oxypropylene group; and m is a number of from 0 to 50, and n is a number of from 0 to 50, with proviso that the sum of m and n is from 1 to 100. In the refrigeration oil, the amount of (b) is 2 to 25 parts by weight, based on 100 parts by weight of (a). A working fluid composition for refrigerating machine including the above refrigeration oil and one or more hydrofluorocarbons.