Abstract:
A sample support apparatus is provided in which a XY-table and a Z-table moving along a height direction are disposed in a Z-reference surface as a height reference, and in which a sample is disposed at a predetermined height position while supported by the Z-table, the sample support apparatus comprising, a height correction unit that controls movement of the Z-table, and a Z-sensor that is provided on the Z-reference surface to measure the height from the Z-reference surface, wherein a measuring surface is aligned along the same axis with respect to a measuring position of the sample, the height of the measuring surface from the Z-reference surface is measured by the Z-sensor, the height correction unit moves the Z-table according to the measured value of the height so that the sample is disposed at the predetermined height position.
Abstract:
A displacement measuring apparatus includes an illumination system to obliquely irradiate the target object surface with beams, a sensor to receive a reflected light from the target object surface, an optical system to diverge the reflected light in a Fourier plane with respect to the target object surface, a camera to image a diverged beam in the Fourier plane, a gravity center shift amount calculation circuitry to calculate a gravity center shift amount of the reflected light in the light receiving surface of the sensor, based on a light quantity distribution of the beam imaged by the camera, and a measurement circuitry to measure a heightwise displacement of the target object surface by an optical lever method, using information on a corrected gravity center position obtained by correcting the gravity center position of the reflected light received by the sensor by using the gravity center shift amount.
Abstract:
Disclosed is a template substrate for use in adjusting a focus offset to detect a defect using an optical image obtained by irradiating a substrate with light emitted from a light source. The template substrate includes a first pattern constructed with a repetitive pattern that is not resolved by the wavelength of the light source, and at least one alignment mark that is arranged on the same plane as the first pattern. The alignment mark includes a second pattern constructed with a repetitive pattern that is not resolved by the wavelength of the light source, and a programmed defect that is provided in the second pattern and not resolved by the wavelength of the light source. The alignment mark includes the second pattern, and a region, where the second pattern is not arranged but a mark used in alignment is formed by contrast with a region where the second pattern is arranged.
Abstract:
An inspection apparatus includes a tone correction unit, a dimensional error acquisition unit, and a map generating unit. The correction unit acquires a transmissivity distribution for transmission of light from a light source through an incident surface of an inspection target based on the optical image data to correct a tone of the optical image data so as to eliminate variations in contrast of the optical image data which correspond to the transmissivity distribution. The acquisition unit determines a dimension of the pattern based on the corrected optical image data to acquire a dimensional error that is a difference between the dimension of the pattern and a design value for the pattern. The generating unit generates a map in which the dimensional error is associated with the position coordinates of the table on the inspection target based on the position coordinates and the dimensional error.
Abstract:
An inspection target is illuminated by an illumination optical unit using a light source. Optical image data of a pattern disposed in the inspection target is acquired by an imaging unit by causing light transmitted or reflected to be incident to a first and second area of a sensor. Reference image data is generated, corresponding to the optical image data, from design data of the pattern. The optical image data is corrected by obtaining a fluctuation of a gradation value of optical image data acquired using light incident to the second area, and correcting a gradation value of optical image data acquired using the light incident to the first area. A line width of the pattern of the corrected data, and a line width error which is a difference between the line widths of corrected data and reference image data are obtained by the line width error obtaining unit.
Abstract:
According to one embodiment, a pattern test apparatus includes a light source configured to apply test light to a test sample, a polarizing beam splitter which reflects or transmits the test light, an imaging device which receives light which has been reflected by the test sample and transmitted through or reflected by the polarizing beam splitter, an optical system which forms a Fourier transform plane of the test sample between the test sample and the polarizing beam splitter, and a polarizing controller disposed in the Fourier transform plane. The polarizing controller includes a first region which lets the test light through, and a second region which is greater than the first region and lets the light reflected by the test sample through, and the each regions have different retardation quantities.
Abstract:
An imaging capturing apparatus comprising, a light source, a polarizing beam splitter configured to illuminate a target with light from the light source, a sensor configured to capture an image of the inspection target by incidence of light reflected from the target through the polarizing beam splitter, and a Faraday rotator provided between the polarizing beam splitter and the target and disposed away from the polarizing beam splitter such that a Faraday rotation angle in the polarizing beam splitter is within a range of an angle equal to or larger than −0.5 degrees and an angle equal to or smaller than 0.5 degrees.
Abstract:
An inspection apparatus comprising, a Rochon prism configured to branch the light transmitted through a half-wave plate, a first sensor and a second sensor for acquiring an optical image of a pattern of the sample, the branched light being incident to the first sensor and the second sensor, a light quantity acquisition unit configured to acquire a light quantity ratio (1:A) of the second sensor to the first sensor using the optical image, and to obtain an angle θ of the half-wave plate such that the light quantity ratio becomes A:1, an angle controller configured to receive information on the angle θ from the light quantity acquisition unit to control an angle of the half-wave plate, a light source controller configured to control a light quantity of the light source such that each of the light quantity values becomes a target value.
Abstract:
An inspection method and apparatus comprising, a step of reflecting linearly-polarized light having a predetermined wavelength using an non-polarizing beam splitter after transmitting the linearly-polarized light through a half-wave plate, irradiating a sample with the linearly-polarized light having a polarization plane of a predetermined angle, causing the light reflected by the sample to be incident to an image capturing sensor through a lens, the non-polarizing beam splitter, and an analyzer, and acquiring an optical image of a pattern formed on the sample; acquiring a plurality of optical images by changing an angle of the analyzer or the half-wave plate, and obtaining an angle of the analyzer or the half-wave plate such that a value of (σ/√A) becomes a minimum; and a step of inspecting whether a defect of the pattern exists, wherein the pattern is a repetitive pattern having a period at a resolution limit or less.
Abstract:
A luminous flux branching element includes a transparent base member arranged diagonally to an optical axis and having an incidence plane and an emission plane parallel to each other. Incident light from the incidence plane is split into a main luminous flux emitted from an emission position on the emission plane and a branched luminous flux emitted from a branch position apart from the emission position and having a smaller light quantity than of the main luminous flux. A reflecting member is arranged on the incidence plane to cause the incidence plane to reflect reflected light from the emission plane. A non-coat region in which antireflection-treatment is not performed is formed in a region of the emission plane where the incident light from the incidence plane is reached, and antireflection-treatment is performed in the emission plane excluding the non-coat region and the incidence plane.