Abstract:
A wafer carrier for supporting a plurality of wafers, including a plurality of slots provided in a cradle, the cradle being formed of silicon carbide and having an oxide layer overlying the silicon carbide.
Abstract:
A method for cleaning ceramic workpieces such as SiC boats used in semiconductor fabrication is disclosed. The method comprises washing a virgin or used ceramic workpiece with a chemical stripping agent and then using a pelletized CO2 cleaning process on the acid-washed component. The inventive method has been found to produce a workpiece having a very low level of metallic and particulate contaminants on its surface.
Abstract:
Processes for forming ceramic particulate material. The ceramic particulate material includes alumina particles, the particles having a specific surface area (SSA) not less than 15 m2/g and not greater than 75 m2/g and a sphericity quantified by at least one of (i) a mean roundness not less than 0.710 as measured by Roundness Correlation Image Analysis, and (ii) a concavity less than 20%, wherein concavity is the percent of alumina particles based on a sample of at least 100 particles, which have a concave outer peripheral portion that extends along a distance not less than 10% of d50 by TEM inspection, the concave outer peripheral portion having a negative radius of curvature as viewed from an interior of the particle.
Abstract:
Disclosed is a ceramic particulate material, comprising: alumina particles comprised of alpha phase alumina, the particles having an average primary particle size not greater than 135 nm as measured by TEM and/or a specific surface area (SSA) not less than 15 m2/g and not greater than 75 m2/g, and wherein the alumina particles have a sphericity quantified by at least one of (i) a mean roundness not less than 0.710 as measured by Roundness Correlation Image Analysis, and (ii) a concavity less than 20 percent, wherein concavity is the percent of alumina particles based on a sample of at least 100 particles, which have a concave outer peripheral portion that extends along a distance not less than 10 percent of d50 by TEM inspection, the concave outer peripheral portion having a negative radius of curvature as viewed from an interior of the particle. Methods for forming the ceramic particulate material are also disclosed.
Abstract:
An abrasive particulate material is disclosed that includes alumina particles. The alumina particles include a transition alumina and at least 5.0 wt % of an amorphous phase. The transition alumina particles also have a density not greater than about 3.20 g/cm3.
Abstract:
Processes for forming ceramic particulate material. The ceramic particulate material includes alumina particles, the particles having a specific surface area (SSA) not less than 15 m2/g and not greater than 75 m2/g and a sphericity quantified by at least one of (i) a mean roundness not less than 0.710 as measured by Roundness Correlation Image Analysis, and (ii) a concavity less than 20%, wherein concavity is the percent of alumina particles based on a sample of at least 100 particles, which have a concave outer peripheral portion that extends along a distance not less than 10% of d50 by TEM inspection, the concave outer peripheral portion having a negative radius of curvature as viewed from an interior of the particle.
Abstract:
An abrasive particulate material is disclosed that includes alumina particles. The alumina particles include a transition alumina and at least 5.0 wt % of an amorphous phase. The transition alumina particles also have a density not greater than about 3.20 g/cm3.
Abstract:
A polishing slurry includes liquid medium and particulate abrasive. The particulate abrasive includes soft abrasive particles, hard abrasive particles, and colloidal silica particles, wherein the soft abrasive particles have a Mohs hardness of not greater than 8 and the hard abrasive particles have a Mohs hardness of not less than 8, and wherein the soft abrasive particles and the hard abrasive particles are present at a weight ratio of not less than 2: 1.
Abstract:
A particulate material includes an abrasive particle having a superabrasive material with an external surface, and a coating including a metal overlying the external surface of the abrasive particle. The coating can include domains having an average domain size of not greater than about 260 nm, and the coating can include between about 1 wt % and about 20 wt % of the total weight of the abrasive particle and coating.
Abstract:
A particulate material comprising cerium oxide particles having a secondary particle size distribution in a range of 80 nm to 199 nm and a density of at least 6.6 g/cm3.