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公开(公告)号:JPH11126947A
公开(公告)日:1999-05-11
申请号:JP29303597
申请日:1997-10-24
Applicant: SONY CORP
Inventor: KOBAYASHI TOSHIMASA , MIYAJIMA TAKAO , OZAWA MASABUMI
IPC: H01L33/32 , H01L33/40 , H01L33/44 , H01S5/00 , H01S5/042 , H01S5/323 , H01S5/343 , H01S3/18 , H01L33/00
Abstract: PROBLEM TO BE SOLVED: To provide a semiconductor element in which the adhesion of electrodes can be improved. SOLUTION: An n-side contact layer 13, an n-type clad layer 14, an active layer 15, a p-type clad layer 16, and a p-side contact layer 17 which are respectively made of III nitride compound semiconductors are successively laminated upon a sapphire substrate 10. In addition, a P-side electrode 19 is formed on the p-side contact layer 17 through the opening 18a of an insulating film 18 and an electrode 20 for contact is formed on the p-side electrode 19 and insulating layer 18 so as to cover the entire surface of the electrode 19. The electrode 19 is composed of a metal containing Ni and the electrode 20 is composed of another metal containing Ti. An ohmic contact is secured by means of the electrode 19 and the adhesibility of the electrode 19 is reinforced by means of the electrode 20.
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公开(公告)号:JPH09321388A
公开(公告)日:1997-12-12
申请号:JP15765896
申请日:1996-05-29
Applicant: SONY CORP
Inventor: OZAWA MASABUMI , TOJO TAKESHI , IKEDA MASAO
Abstract: PROBLEM TO BE SOLVED: To provide a structural substrate manufacturing method capable of forming impurity regions selectively without worsening the surface morphology, and capable of making device characteristics better. SOLUTION: After an n-type first AlGaAs layer (Alx Ga1-x As(0
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公开(公告)号:JPH09129983A
公开(公告)日:1997-05-16
申请号:JP31007895
申请日:1995-11-02
Applicant: SONY CORP
Inventor: OZAWA MASABUMI , HIEI FUTOSHI
IPC: H01L33/06 , H01L33/14 , H01L33/28 , H01L33/30 , H01L33/44 , H01L33/60 , H01S5/00 , H01S5/028 , H01S5/327 , H01S3/18 , H01L33/00
Abstract: PROBLEM TO BE SOLVED: To reduce the light absorbing quantity of a reflectivity control film containing at least one II-VI compound semiconductor film so as to suppress the generation of heat from a semiconductor light emitting element by providing the control film in a light emitting section on the light emitting surface of the element. SOLUTION: A reflectivity control film is constituted in a multilayered film composed of dielectric films and II-VI compound semiconductor films. The dielectric films are made of SiO2 , Al2 O3 , etc., having a low refractive index and respectively form coating materials 1, 5, and 7. The II-VI compound semiconductor films are made of ZnSe, etc., having a high refractive index and respectively form coating materials 2, 4, and 6. In order to reduce the laminating cycle of the multilayered film as much as possible and to obtain high reflectivity, the material having a high refractive index is used. Therefore, the characteristics and reliability of a semiconductor light emitting element are improved by suppressing the heat generation caused by absorbed light by preventing the useless light absorption of the reflectivity control film.
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公开(公告)号:JPH09121073A
公开(公告)日:1997-05-06
申请号:JP29891495
申请日:1995-10-24
Applicant: SONY CORP
Inventor: TOMITANI SHIGETAKA , OZAWA MASABUMI , ITO SATORU , IKEDA MASAO
Abstract: PROBLEM TO BE SOLVED: To provide a semiconductor light emitting element having a low operating voltage and a long service life using a highly reliable II-VI compound semiconductor. SOLUTION: A p-type Alx Ga1-x As buffer layer 2 and a p-type (Alx Ga1-x )y In1-y buffer layer 3 are formed sequentially on a p-type GaAs substrate 1 and then II-VI compound semiconductor layers, i.e., a p-type ZnSe buffer layer 5, a p-type ZnMeSSe clad layer 7, a p-type ZnSSe optical waveguide layer 8, a ZnCdSe active layer 9, an n-type ZnSSe optical waveguide layer 10, an n-type ZnMgSSe clad layer 11, etc., are formed thereon to constitute a semiconductor light emitting element. In this regard, a p-type GaAs crystal defect suppression layer 4 is provided between the p-type (Alx Ga1-x )y In1-y buffer layer 3 and p-type ZnSe buffer layer 5.
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公开(公告)号:JPH07335985A
公开(公告)日:1995-12-22
申请号:JP12899394
申请日:1994-06-10
Applicant: SONY CORP
Inventor: OZAWA MASABUMI , JIYONASAN UESUTOUOOTAA
Abstract: PURPOSE:To surely contact electrodes with a low contact resistance, without increasing the threshold current Ith. CONSTITUTION:After a II-VI compd. semiconductor layer 31 is formed on a GaAs substrate 1, an electrode 13 is formed on the hack side of the substrate 1 and a laser beam is radiated from this electrode 13 to alloy it with the substrate 1.
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公开(公告)号:JPH06310811A
公开(公告)日:1994-11-04
申请号:JP9783793
申请日:1993-04-23
Applicant: SONY CORP
Inventor: OZAWA MASABUMI , NAKAYAMA NORIKAZU , KOBAYASHI TOSHIMASA , MIYAJIMA TAKAO , NARUI FUMIYO
IPC: H01L33/04 , H01L33/14 , H01L33/28 , H01L33/30 , H01L33/40 , H01L33/44 , H01S5/00 , H01S3/18 , H01L33/00
Abstract: PURPOSE:To make it possible to manufacture a target II-VI compound semiconductor element reliably and stably by a method wherein a treatment temperature accompanied by a heating in a process of manufacturing the II-VI compound semiconductor element is selected at a specified or lower temperature. CONSTITUTION:A first clad layer 2 consisting of a ZnMgSSe layer of the same conductivity type as that of a first conductivity type substrate 1, an active layer 3 consisting of an undoped or low-impurity concentration Zn(Cd)Se layer, a second clad layer 4 consisting of a second conductivity type ZnMgSSe layer and a cap layer 5 consisting of a superlattice structure, which consists of a thin ZnSe layer and a thin ZnTe layer, are epitaxially grown in order on the first conductivity type substrate 1, such as a GaAs substrate, by an MBE method. In this case, a heating treatment temperature accompanied by the manufacture of a laser is restricted to 400 deg.C or lower. The blue light laser obtained in such a way can be formed in prescribed characteristics stably and reliably.
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公开(公告)号:JPH065920A
公开(公告)日:1994-01-14
申请号:JP18582192
申请日:1992-06-19
Applicant: SONY CORP
Inventor: IKEDA MASAO , ITO SATORU , IRAKU YOSHINO , MIYAJIMA TAKAO , OZAWA MASABUMI , AKIMOTO KATSUHIRO
IPC: H01L33/06 , H01L33/14 , H01L33/28 , H01L33/30 , H01L33/40 , H01S5/00 , H01S5/042 , H01S5/327 , H01S5/347 , H01L33/00 , H01S3/18
Abstract: PURPOSE:To improve the element characteristics by realizing ohmic contact of a p-side electrode for a light emitting element using a p-type ZnSe layer and thereby reducing the applied voltage required for operation. CONSTITUTION:In a ZnSe-based light emitting element having a p-n junction comprising an n-type ZnSe layer 2 and a p-type ZnSe layer 3, a p-type ZnTe layer 4 is provided on the p-type ZnSe layer 3, and an Au electrode 5 is provided as p-side electrode on the p-type ZnTe layer 4.
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