公开(公告)号：JPH0311348A

公开(公告)日：1991-01-18

申请号：JP14528089

申请日：1989-06-09

Applicant: TOSOH CORP

Inventor： TSUTSUMI YOSHITAKA ,  TANAKA TETSUO ,  FUKAMACHI MASATO ,  HASEGAWA MASAZUMI

IPC: G03F7/038 ,  C08F290/00 ,  C08F299/00 ,  H01L21/027

Abstract: PURPOSE:To provide the negative type photosensitive resin which is transparent in a visible light region, is resistant to dry etching and is excellent in sensitivity and resolution by using a polymer having an arom. ring for a base polymer, giving a substituent having an unsatd. group to this arom. ring and using an additive of a bisazide system. CONSTITUTION:The resin consists of the resin contg. the structural unit in which R in formula I consists of the group contg. unsatd. double bonds and the additive. In the formula, A denotes a benzene ring and/or naphthalene ring; B denotes H, 1 to 4C alkyl group. The negative type photosensitive resin consisting of the resin having the unsatd. group in the arom. ring and the bisazide compd. is transparent in the visible light region, is resistant to dry etching and has the high sensitivity and the resist function excellent in the resolution. this resin is adequate as a coating material and a smoothing resin to be used for solid-state image pickup elements and semiconductor integrated circuit element, etc.

公开(公告)号：JPH032758A

公开(公告)日：1991-01-09

申请号：JP13593589

申请日：1989-05-31

Applicant: TOSOH CORP

Inventor： HASEGAWA MASAZUMI ,  TSUTSUMI YOSHITAKA

IPC: G03F7/004 ,  G02B5/20 ,  G03F7/038 ,  H04N5/335 ,  H04N5/369 ,  H04N5/372 ,  H04N5/374

Abstract: PURPOSE:To obtain the functions of a resist having transparency in the visible light region, dry etching resistance, high sensitivity and superior resolution by forming an intermediate layer and/or a smooth layer and/or a surface coat with a compsn. consisting of a polymer contg. specified structural units and additives. CONSTITUTION:When an image pickup element is produced, an intermediate layer 5 and/or a smooth layer 6 and/or a surface coat 7 is formed with a photosensitive coating film material consisting of a polymer obtd. by introducing halogen and/or halomethyl groups as substituents into arom. rings in a base polymer, that is, resin contg. structural units represented by formula I and additives. In the formula I, R is H and/or methyl, B is X and/or CH2X and X is halogen. The coating film material has the functions of a resist having transparency in the visible light region, dry etching resistance, high sensitivity and superior resolution.

公开(公告)号：JPH0247656A

公开(公告)日：1990-02-16

申请号：JP19715688

申请日：1988-08-09

Applicant: TOSOH CORP

Inventor： TSUTSUMI YOSHITAKA ,  KAMIMURA TERUHISA ,  HASEGAWA MASAZUMI

IPC: G03F7/023

Abstract: PURPOSE:To improve definition and heat resistance while maintaining sensitivity and process stability by using an alkaline soluble novolak resin contg. a specific co-condensation polymer. CONSTITUTION:The alkaline soluble resin of the positive type photoresist consisting of the alkaline soluble resin and 1,2-quinonediazide photosensitive agent is formed of the novolak resin constituted of the phenol/xylenol co- condensation polymer expressed by the formula I. Pattern formation is executed by using the positive type photoresist. In the formula I, m and n denote positive integer; m/n is 99.9/0.1-0.1/99.9. The sensitivity, definition, heat resistance, and the process stability are improved in this way.

公开(公告)号：JPH0245509A

公开(公告)日：1990-02-15

申请号：JP19447688

申请日：1988-08-05

Applicant: TOSOH CORP

Inventor： TSUTSUMI YOSHITAKA ,  MATSUMURA KOUZABUROU ,  MURANAKA KAZUAKI

IPC: G03F7/039 ,  C08F20/22 ,  C08F220/22

Abstract: PURPOSE:To provide the subject polymer causing the decomposition of the main thereof by the irradiation of radiations and useful as a highly sensitive resist material by copolymerizing alpha-trifluoromethyl acrylate containing fluorine atoms and a benzene ring in the ester portion thereof with a copolymerizable monomer. CONSTITUTION:(A) alpha-Trifluoromethyl acrylate (e.g., 2-phenyl hexafluoroisopropyl alpha-trifluoromethylacrylate) containing fluorine atoms and a benzene ring in the ester portion thereof is copolymerized with (B) a monomer (e.g., methyl acrylate) having a double bond copolymerizable therewith to provide the objective polymer of formula I [A is a structural unit derived from the monomer having the copolymerizable double bond; R is a group of formula II (R1 and R2 are H or fluorine-substituted methyl; Y1-Y5 are H, lower alkyl or F; m is a positive integer; n is 0 or a positive integer) or formula III].

公开(公告)号：JPH01291240A

公开(公告)日：1989-11-22

申请号：JP11930588

申请日：1988-05-18

Applicant: TOSOH CORP

Inventor： TSUTSUMI YOSHITAKA ,  KAMIMURA TERUHISA ,  HASEGAWA MASAZUMI

IPC: G03C1/72 ,  G03F7/022

Abstract: PURPOSE:To improve the resolution and the process stability of the title material, without injuring the sensitivity and the heat resistance of the photoresist material by incorporating a 1,2-quinone diazide compd. composed of a specified compd. in the photoresist material. CONSTITUTION:The 1,2-quinone diazide compd. shown by formula I and an alkali soluble resin are incorporated in the photoresist material. In the formula, R is 1-4 C alkylene group, Ra and Rb are the same or the different with each other, and are each H, OH, 1-4 C alkyl group or halogen atom, D is 1,2-naphthoquinone diazide-4-sulfonyl group, 1,2-naphthoquinone diazide-5-sulfonyl group or 1,2-benzoquinone diazide-4-sulfonyl group, (m) and (n) are each an integer of 0-5, (m+n)>=1. Thus, the excellent performances of the photoresist material such as the sensitivity, the resolution, the heat resistance and a pattern shape of the photoresist, are obtd.

公开(公告)号：JPH01217020A

公开(公告)日：1989-08-30

申请号：JP4215288

申请日：1988-02-26

Applicant: TOSOH CORP

Inventor： TSUTSUMI YOSHITAKA ,  MURANAKA KAZUAKI ,  YANAGIHARA TOSHIMITSU ,  YAGI TOSHIAKI

IPC: C08F220/56 ,  C08F20/22 ,  C08F20/52 ,  C08F220/00 ,  C08F220/04 ,  C08F220/30 ,  G03F7/039

Abstract: PURPOSE:To provide the present derivative capable of giving positive type resist materials with improved dry etching resistance and both high sensitivity and resolution, for resist materials sensitive to radiations such as electron beams, vacuum ultraviolet light, X-rays and so on, expressed by a specific structural formula. CONSTITUTION:The objective halogen-contg. polyacrylic ester derivative of the formula (R1 and R2 are each H or fluorine-substituted methyl, where R1 and R2 are not H at the same time; X is Cl or methyl; Y1-Y5 are each H or F; Z is OH or amino; m and n are each positive integer, n/m is

公开(公告)号：JPS6426611A

公开(公告)日：1989-01-27

申请号：JP18229087

申请日：1987-07-23

Applicant: TOSOH CORP

Inventor： MATSUMURA KOUZABUROU ,  KIYOTA TORU ,  NAKAZAWA TSUNEKO ,  TSUTSUMI YOSHITAKA

IPC: C08F14/18

Abstract: PURPOSE:To provide a novel polymer which is an acrylic acid ester polymer containing specific recurring unit and having halogen at alpha-position and trifluoromethyl group and benzene ring at the ester part and useful as a resist material, a water-repellent, an antifouling agent, a polymer modifier, etc. CONSTITUTION:The objective polymer is composed of a recurring unit of formula (X is halogen; R is H or lower alkyl; n is 20-20,000). The polymer can be produced by (1) synthesizing an acrylic acid ester e.g. by the reaction of acryloyl chloride with an alcohol corresponding to the ester to be prepared, (2) reacting the acrylic acid ester with chlorine gas to obtain an alpha,beta- dichloropropionic acid ester, (3) adding equimolar amount of pyridine to the reaction mixture, (4) subjecting the mixture to vacuum distillation or refluxing and then to filtration, extraction and column separation and (5) polymerizing the resultant alpha-chloroacrylic acid ester monomer.

公开(公告)号：JPH11323022A

公开(公告)日：1999-11-26

申请号：JP12994398

申请日：1998-05-13

Applicant: TOSOH CORP

Inventor： TSUTSUMI YOSHITAKA ,  YAMAGATA YOSHIHARU

IPC: B29C43/02 ,  C08L21/00 ,  C08L101/00

Abstract: PROBLEM TO BE SOLVED: To obtain a sheet-forming composition that can provide formed sheets that can utilize crushed products as waste rubber or the like and can form sheets having practical strength and durability by mixing crushed products as waste rubber with rubber latex and the like. SOLUTION: The sheet-forming composition is produced by mixing (A) a crushed rubber waste and/or crushed plastic waste, preferably they are foamed, with (B) a rubber latex and/or a resin emulsion, preferably at a weight ratio A/B of 5-20. In a preferred embodiment, the rubber latex of the component B is a chloroprene rubber latex having the value of G=0 in the formula G (in %) = (W0/Wi)×100 [G is the fraction insoluble in chloroform in %; Wi is the weight (in g) of the film formed by casting a chloroprene rubber latex; W0, is the dry weight (in g) of the insoluble part that remains on the wire screen of 200 meshes after dissolving the film in 5% concentration of chloroform].

公开(公告)号：JPH10237404A

公开(公告)日：1998-09-08

申请号：JP1536097

申请日：1997-01-29

Applicant: TOSOH CORP

Inventor： TSUTSUMI YOSHITAKA ,  OZOE SHINJI ,  WAKAYAMA HISAMASA

IPC: C09J11/04 ,  C09J111/02 ,  C09J157/02 ,  C09J161/06 ,  C09J191/00 ,  C09J193/04

Abstract: PROBLEM TO BE SOLVED: To provide an adhesive having excellent high temperature adhesiveness, by compounding a chloroprene rubber latex containing no gel, a tackifier resin emulsion and a metal oxide emulsion. SOLUTION: This adhesive composition comprises 100 pts.wt. of a chloroprene rubber latex having a G value represented by formula I of zero, wherein G is wt.% of the insoluble part of a chloroprene rubber latex, Wi is the weight of a film prepared from the chloroprene rubber latex and W0 is a weight (g) of the insoluble part of the chloroprene film measured by preparing a 5% chloroform solution of the film and passing the solution through a 200 mesh wire filter followed by drying and weighting the residue on the filter; an amount satisfying formula II of a tackifier resin such as a hydrocarbon resin derived from petroleum, wherein Wt is the pts.wt. of the tackifier resin and T is a softening point ( deg.C) of the tackifier resin; and 0.1 to 5 pts.wt. of an emulsion of a metal oxide such as zinc oxide. The chloroprene rubber latex to be used is obtained by subjecting to emulsion polymerization 100 pts.wt. of chloroprene monomer and 0.1 to 10 pts.wt. of a vinyl monomer having a carboxyl group using an emulsifying and dispersing agent.

公开(公告)号：JPH07114186A

公开(公告)日：1995-05-02

申请号：JP26230193

申请日：1993-10-20

Applicant: TOSOH CORP

Inventor： MURANAKA KAZUAKI ,  TSUTSUMI YOSHITAKA ,  KAMIMURA TERUHISA ,  HASEGAWA MASAZUMI

IPC: G03F7/004 ,  G02B1/04 ,  G02B5/20 ,  G03F7/039

Abstract: PURPOSE:To provide a material for a micro-condenser used at the time of producing a solid-state image pickup element or a liq. crystal display device, having a high refractive index and excellent in transparency in a visible light region and solvent resistance. CONSTITUTION:This photosensitive material consists of a polymer contg. structural units represented by formula I or II as an alkali-soluble resin, 1,2- naphthoquinonediazidosulfonic ester as a photosensitive agent, a heat curing agent and a solvent. In the formula I, R1 is H or methyl, each of R2 and R3 is H, halogen, 1-6C alkyl, etc., (m) is an integer of 0-6, (n) is 0 in the case of m=0 and (n) is an integer of 1-6 in the case of m >=1. In the formula II, R1 is H or methyl, R2 is H, 1-6C alkyl or phenyl and R3 is H, halogen, 1-6C alkyl or 1-6C alkoxy.