Abstract:
Methods and systems for determining one or more parameters of a wafer inspection process are provided. One method includes acquiring metrology data for a wafer generated by a wafer metrology system. The method also includes determining one or more parameters of a wafer inspection process for the wafer or another wafer based on the metrology data.
Abstract:
Described is a system for inducing and detecting multi-photon processes, in particular multi- photon fluorescence or higher harmonic generation in a sample. The system comprises a dynamically-controllable light source, said dynamically-controllable light source comprising a first sub-light source, said first sub-light source being electrically controllable such as to generate controllable time-dependent intensity patterns of light having a first wavelength, and at least one optical amplifier, thereby allowing for active time-control of creation of multi-photon-excitation. The system further comprises a beam delivery unit for delivering light generated by said dynamically-controllable light source to a sample site, and a detector unit or detector assembly for detecting signals indicative of said multi-photon process, in particular multi-photon fluorescence signals or higher harmonics signals.
Abstract:
This invention concerns spectroscopy apparatus comprising a light source (101) arranged to generate a light profile (110) on a sample, a photodetector (103) having at least one photodetector element (104) for detecting characteristic light generated from interaction of the sample with light from the light source (101), a support (109) for supporting the sample, the support (109) movable relative to the light profile (110), and a processing unit (121). The processing unit (121) is arranged to associate a spectral value recorded by the photodetector element (104) at a particular time with a point on the sample predicted to have generated the characteristic light recorded by the photodetector element (104) at the particular time based on relative motion anticipated to have occurred between the support (109) and the light profile (110).
Abstract:
A fine particle measuring method of performing optical measurement of fine particles introduced into a plurality of sample fluidic channels (111) provided at predetermined distances on a substrate (11) by scanning light to the sample fluidic channels (111) is disclosed. The method includes: sequentially irradiating the light to at least two or more reference regions provided together with the sample fluidic channels (111); detecting a change of optical property occurring in the light due to the reference regions; and controlling timing of emission of the light to the sample fluidic channels (111).
Abstract:
There are provided a control device of an image reading apparatus, an operation method and an operation program thereof, and an image detection system capable of quickly and easily outputting an image having an appropriate density for analysis from an image reading apparatus. An image receiving unit (80) receives a pre-image output in pre-scanning performed before main scanning for outputting a main image for analysis in an image reading apparatus (11). A region information receiving unit (81) receives information of a region in the pre-image designated by a user. A calculation unit (83) calculates an appropriate voltage value (HVM) that is a voltage value of the photomultiplier (31) at which a density of the region becomes an appropriate density for analysis. A scanning conditions setting unit (84) sets the appropriate voltage value (HVM) as temporary scanning conditions (76M) of main scanning.
Abstract:
Described is a system for inducing and detecting multi-photon processes, in particular multi-photon fluorescence or higher harmonic generation in a sample. The system comprises a dynamically-controllable light source, said dynamically-controllable light source comprising a first sub-light source, said first sub-light source being electrically controllable such as to generate controllable time-dependent intensity patterns of light having a first wavelength, and at least one optical amplifier, thereby allowing for active time-control of creation of multi-photon-excitation. The system further comprises a beam delivery unit for delivering light generated by said dynamically-controllable light source to a sample site, and a detector unit or detector assembly for detecting signals indicative of said multi-photon process, in particular multi-photon fluorescence signals or higher harmonics signals.
Abstract:
PROBLEM TO BE SOLVED: To provide a real time spectral image analyzer, and an analyzing method capable of concurrently measuring two-dimensional positional information and wavelength information of a sample on a real time basis as a spectral image. SOLUTION: The real time spectral image analyzer is provided with a movable stage 1 carrying the sample S, a light source 2 irradiating white light on a surface of the sample S, a spectroscope 4 making a spectral diffraction at once of an area on one line of reflected light of the white light from the surface of the sample S, a black-and-white CCD camera 5 taking in a spectrum from the spectral diffraction of the reflected light made by the spectroscope 4 as one-dimensional positional information and wavelength information in one frame, and a computer 6 storing, analyzing, and image-processing the one-dimensional positional information and wavelength information taken in by the black-and-white CCD camera 5, and uniaxially operating the movable stage 1 in frame units of the black-and-white CCD camera 5. COPYRIGHT: (C)2004,JPO&NCIPI
Abstract:
기판 위에 배설(配設; provide)된 복수의 시료용 유로에 대해 광을 주사하고, 그 시료용 유로내에 도입된 미소 입자의 광학 측정을 행할 때에, 높은 측정 정밀도를 얻는 것이 가능한 측정 방법을 제공하는 것을 과제(목적)로 한다. 상기 과제를 해결하기 위해서, 기판(11) 위에 배설된 복수의 시료용 유로(111)에 대해 광을 주사하고, 그 시료용 유로(111) 내에 도입된 미소 입자의 광학 측정을 행하는 미소 입자 측정 방법에 있어서, 상기 시료용 유로(111)에 병설된 적어도 두개 이상의 참조 영역(113)에 대해, 상기 광을 순차(順次) 조사하고, 그 참조 영역(113)에 의해서 상기 광에 생기는 광학 특성의 변화를 검지하는 것에 의해, 상기 시료용 유로(111)에 대한 상기 광의 출사(出射; emission) 타이밍을 제어하는 것을 특징으로 하는 미소 입자 측정 방법을 제공한다. 미소 입자 측정 장치, 기판, 레이저 광원, 주사부, 대물 렌즈, 콜리메이터 렌즈, 검출기, 분광기, 광 제어부, 유로, 참조 영역, 검출 영역, 레이저광(측정광), 검출 대상광, 주사선.