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公开(公告)号：CN1864447B
公开(公告)日：2011-03-23
申请号：CN200480028985.3
申请日：2004-08-04
Applicant: X射线光学系统公司
CPC classification number: H05G1/36 , G21K2201/06 , H01J2235/1291 , H05G1/025
Abstract: 一种X射线源组件，包括：具有斑点的阳极，基于提供给该组件的功率电平以电子撞击在该斑点上；以及光学元件，被耦合而用以接收在该斑点处产生的发散X射线，并从该组件发射输出X射线。提供控制系统，用以通过改变提供给该组件的功率电平，在该X射线源组件的操作过程中动态维持输出X射线的强度，尽管该X射线源组件的至少一个工作条件有变化。该控制系统可包括至少一个调节器，用于例如通过控制与该组件相关的电源来改变提供给该组件的功率电平。该控制系统还可改变阳极的温度和/或位置来维持输出强度。
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公开(公告)号：CN1864447A
公开(公告)日：2006-11-15
申请号：CN200480028985.3
申请日：2004-08-04
Applicant: X射线光学系统公司
IPC: H05G1/36 , G01N23/223
CPC classification number: H05G1/36 , G21K2201/06 , H01J2235/1291 , H05G1/025
Abstract: 一种X射线源组件，包括：具有斑点的阳极，基于提供给该组件的功率电平以电子撞击在该斑点上；以及光学元件，被耦合而用以接收在该斑点处产生的发散X射线，并从该组件发射输出X射线。提供控制系统，用以通过改变提供给该组件的功率电平，在该X射线源组件的操作过程中动态维持输出X射线的强度，尽管该X射线源组件的至少一个工作条件有变化。该控制系统可包括至少一个调节器，用于例如通过控制与该组件相关的电源来改变提供给该组件的功率电平。该控制系统还可改变阳极的温度和/或位置来维持输出强度。
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公开(公告)号：KR1020070110885A
公开(公告)日：2007-11-20
申请号：KR1020077021531
申请日：2006-02-24
Applicant: 사이머 엘엘씨
Inventor： 보워링노보트알. , 한손브존에이.,엠. , 바이카노프알렉산더엔. , 코디킨올레 , 엘쇼프알렉산더아이. , 파틀로윌리엄엔.
CPC classification number: G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
Abstract translation: 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。
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公开(公告)号：KR1020040004384A
公开(公告)日：2004-01-13
申请号：KR1020037004516
申请日：2001-09-28
Applicant: 칼 짜이스 에스엠티 게엠베하
IPC: G03F7/20
CPC classification number: G21K1/06 , B82Y10/00 , G03F7/70075 , G03F7/70083 , G03F7/70091 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G03F7/70891 , G21K1/067 , G21K2201/06 , G21K2201/064
Abstract: 본 발명은 주요 광원; 제 1 광학부; 제 2 광학부; 이미지면과 출사 동공으로 구성되고, 상기 제 1 광학부가 주요 광원을 상기 출사 동공 내 상기 제 2 광학부에 의해 상형성된 다수의 제 2 광원으로 변형시킨다는 점, 상기 제 1 광학부가 상기 이미지면 내의 필드 상에 적어도 부분적으로 겹쳐진 다수의 상을 형성하는 상기 이미지면 내로 상이 형성되는 다수의 제 1 래스터 요소를 가진 제 1 광학적 요소를 포함한다는 점, 상기 다수의 제 1 래스터 요소가 사각형이라는 점, 상기 제 2 광학부는 상기 환형 구획에 상기 필드를 형성하는 음의 광학적 힘을 가진 제 1 필드 거울과 양의 광학적 힘을 가진 제 2 필드 거울을 포함한다는 점, 다수의 광선 각각이 70°이상의 입사각을 가진 상기 제 1 필드 거울을 가로지른다는 점, 다수의 광선 각각이 25°이상의 입사각을 가진 상기 제 2 필드 거울을 가로지른다는 점을 특� �으로 하는 특히 파장 193 nm 이하의 마이크로리소그래피를 위한 조명 시스템에 관한 것이다.
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公开(公告)号：US20180007771A1
公开(公告)日：2018-01-04
申请号：US15697915
申请日：2017-09-07
Applicant: Gigaphoton Inc.
Inventor： Kouichi SATOU , Takayuki YABU , Yoshifumi UENO , Hirokazu HOSODA
CPC classification number: H05G2/008 , G21K2201/06 , H01S3/10 , H05G2/005 , H05G2/006
Abstract: The stability of operations of an EUV light generating apparatus is improved. A droplet detector may include: a light source unit configured to emit illuminating light onto a droplet, which is output into a chamber and generate extreme ultraviolet light when irradiated with a laser beam; a light receiving unit configured to receive the illuminating light and to detect changes in light intensities; and a timing determining circuit configured to output a droplet detection signal that indicates that the droplet has been detected at a predetermined position within the chamber, based on a first timing at which the light intensity of the illuminating light decreases due to the droplet being irradiated therewith and a second timing at which the light intensity of the illuminating light increases.
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Patent Agency Ranking
公开(公告)号：US09348067B2
公开(公告)日：2016-05-24
申请号：US13319196
申请日：2010-06-09
Applicant: Gereon Vogtmeier , Klaus Juergen Engel , Thomas Koehler , Ewald Roessl
Inventor： Gereon Vogtmeier , Klaus Juergen Engel , Thomas Koehler , Ewald Roessl
CPC classification number: G02B5/1857 , A61B6/484 , G21K2201/06 , G21K2207/005
Abstract: The present invention relates to phase-contrast imaging which visualizes the phase information of coherent radiation passing a scanned object. Focused gratings are used which reduce the creation of trapezoid profile in a projection with a particular angle to the optical axis. A laser supported method is used in combination with a dedicating etching process for creating such focused grating structures.
Abstract translation: 本发明涉及相位成像，其可视化通过扫描对象的相干辐射的相位信息。 使用聚焦光栅，其减小了与光轴具有特定角度的投影中的梯形轮廓的产生。 激光支持的方法与用于产生这种聚焦光栅结构的专用蚀刻工艺组合使用。
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37.发明申请公开(公告)号：US20130070893A1
公开(公告)日：2013-03-21
申请号：US13682445
申请日：2012-11-20
Applicant: CANON KABUSHIKI KAISHA
Inventor： Chidane Ouchi , Kentaro Nagai , Toru Den , Hidenosuke Itoh
IPC: G01J9/02
CPC classification number: G06T7/0002 , A61B6/4291 , A61B6/484 , G01J9/02 , G01N23/04 , G01N23/20075 , G01N2223/401 , G21K1/06 , G21K2201/06 , G21K2201/067
Abstract: An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.
Abstract translation: X射线成像装置包括相位光栅，吸收光栅，检测器和运算单元。 算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。 此外，运算单元执行相位检索步骤，从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱，对分离的频谱进行傅里叶逆变换，获取差分相位图像。
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38.发明申请公开(公告)号：US20130009076A1
公开(公告)日：2013-01-10
申请号：US13636086
申请日：2011-03-02
Applicant: Daiki Yamatani
Inventor： Daiki Yamatani
IPC: G21K5/00
CPC classification number: H01L21/0274 , G03F7/2004 , G03F7/70033 , G03F7/70133 , G03F7/70141 , G03F7/70166 , G03F7/7085 , G21K1/067 , G21K2201/06 , H05G2/00 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: In an extreme ultraviolet (“EUV”) light source apparatus, uneven angle distribution images of EUV light are detected prior to an adjustment function by a detector, and angle distribution image data is recorded. Movement data corresponding to the recorded angle distribution image data is also recorded. The movement data corresponds to a movement amount and direction that the optical focusing means is moved from a position in which the angle distribution is even to the position in which the corresponding uneven angle distribution image is obtained. For the adjustment, a current angle distribution property image is detected by the detector and is compared with the uneven angle distribution property image data stored, and image data which is most closely matched with the current angle distribution property is selected. The movement data that corresponds to the selected image data is read out, and the light focusing optical means is moved based thereon.
Abstract translation: 在极紫外（EUV）光源装置中，通过检测器在调节功能之前检测到EUV光的不均匀角分布图像，并记录角度分布图像数据。 还记录与记录角度分布图像数据对应的运动数据。 运动数据对应于光学聚焦装置从角度分布均匀的位置移动到获得相应的不均匀角度分布图像的位置的移动量和方向。 对于调整，由检测器检测当前的角度分布特性图像，并将其与存储的不均匀角度分布特性图像数据进行比较，并且选择与当前角度分布特性最紧密匹配的图像数据。 读取对应于所选择的图像数据的移动数据，并且基于此移动聚焦光学装置。
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公开(公告)号：US08263950B2
公开(公告)日：2012-09-11
申请号：US12788903
申请日：2010-05-27
Applicant: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Kurt Gielissen , Martin Jacobus Johan Jak
Inventor： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Kurt Gielissen , Martin Jacobus Johan Jak
CPC classification number: H05G2/001 , G03F7/70033 , G03F7/70858 , G21K2201/06
Abstract: A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.
Abstract translation: 辐射源可以包括用于发射辐射的辐射发射器，用于收集由辐射发射器发射的辐射的收集器以及在使用中被配置成将冷却的气体引入到辐射源中的出口。
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40.发明授权Use of a focusing vortex lens as the objective in spiral phase contrast microscopy 有权使用聚焦旋转透镜作为螺旋相差显微镜的目标公开(公告)号：US07864415B2
公开(公告)日：2011-01-04
申请号：US11856403
申请日：2007-09-17
Applicant: Ian McNulty
Inventor： Ian McNulty
IPC: G02B21/00
CPC classification number: G21K1/06 , G02B5/189 , G02B21/14 , G21K2201/06 , G21K2201/067 , G21K2207/005
Abstract: A method and objective apparatus are provided for implementing an enhanced phase contrast microscope. A focusing vortex lens, defined by a diffractive spiral zone plate (SZP) lens, is used for the objective for the phase contrast microscope. The SZP lens focuses and imparts a helical phase to incident illumination to image the specimen with spiral phase contrast. The spiral phase contrast microscope is sensitive to phase gradients in all sample axes. Replacing the objective of a microscope with the diffractive SZP lens of the invention immediately provides existing instruments with spiral phase contrast capability.
Abstract translation: 提供了一种实现增强型相差显微镜的方法和目标装置。 用于相差显微镜的目标使用由衍射螺旋区域（SZP）透镜限定的聚焦涡透镜。 SZP透镜聚焦并向入射照明施加螺旋相以对具有螺旋相位对比度的样品进行成像。 螺旋相差显微镜对所有样品轴的相位梯度敏感。 用本发明的衍射SZP透镜替代显微镜的目的立即提供现有的具有螺旋相位对比能力的仪器。
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