Abstract:
A process comprises combining a Ce (IV) salt dissolved in a solvent comprising water with a carbon material comprising CNT or graphene wherein the Ce (IV) salt is selected from a Ce (IV) ammonium salt of a nitrogen oxide acid, Ce (IV) ammonium salt of a sulfur oxide acid, Ce (IV) salt of a lower alkyl organo sulfur acid, or Ce (IV) salt of a lower alkane organo sulfur acid. In one embodiment the Ce (IV) salt is selected from Ce (IV) ammonium nitrate, Ce (IV) ammonium sulfate, Ce (IV) lower alkyllsulfonate, or Ce (IV) trifluoro lower alkanesulfonate. A product is produced by this process. An article of manufacture comprises this product on a substrate.
Abstract:
A process comprises combining a Ce (IV) salt dissolved in a solvent comprising water with a carbon material comprising CNT or graphene wherein the Ce (IV) salt is selected from a Ce (IV) ammonium salt of a nitrogen oxide acid, Ce (IV) ammonium salt of a sulfur oxide acid, Ce (IV) salt of a lower alkyl organo sulfur acid, or Ce (IV) salt of a lower alkane organo sulfur acid. In one embodiment the Ce (IV) salt is selected from Ce (IV) ammonium nitrate, Ce (IV) ammonium sulfate, Ce (IV) lower alkyllsulfonate, or Ce (IV) trifluoro lower alkanesulfonate. A product is produced by this process. An article of manufacture comprises this product on a substrate.
Abstract:
An electron emitter includes a guard electrode 13 on the outer circumferential side of a carbon film structure 10 which is formed on a substrate 7 by plasma CVD method. This guard electrode 13 includes a curved surface portion (a curved surface portion that curves from top toward a side opposite to the film-forming direction) 13a convex in a film-forming direction of the carbon film structure 10. A curvature radius R1 of an outer-circumferential-side portion of the curved surface portion 13a is larger than or equal to a curvature radius R2 of a carbon-film-structure-side portion of the curved surface portion 13a.
Abstract:
A field emission device (10) includes a sealed container (11) with a light-permeable portion (12). A phosphor layer (13) is formed on the light-permeable portion. A light-permeable anode (14) is formed on the light-permeable portion. At least one cathode is positioned opposite to the light-permeable anode. A shielding barrel (16) is electrically connected to the at least one cathode and disposed in the container. The shielding barrel has opposite open ends respectively facing towards the light-permeable anode and the cathode (18, 19). The shielding barrel has an inner surface, and a slurry layer (17) containing conductive nano material is formed on the inner surface of the shielding barrel.
Abstract:
Electron emission sources, electron emission devices including the electron emission sources, and methods of making the electron emission sources are provided. The electron emission source includes a carbon-based material, and a degradation prevention material for preventing degradation of the carbon-based material. A binding energy between the degradation prevention material and external oxygen is greater than a binding energy between the carbon-based material and the external oxygen. The electron emission sources have excellent field emission efficiencies and long lifetimes.
Abstract:
An electron emission device includes a base substrate, first electrodes on the base substrate, second electrodes electrically insulated from the first electrodes, a first insulation layer between the first electrodes and the second electrodes, electron emission source holes formed in the first insulation layer and the second electrodes to expose the first electrodes, and electron emission sources in the electron emission source holes, each electron emission source including at least one electron emission material and at least one catalyst metal nano particle.
Abstract:
Provided is a method for manufacturing a field emission array with a carbon microstructure, The method includes: a photomask attachment step of attaching a photomask with a pattern groove to one surface of a transparent substrate; a photoresist attachment step of attaching a negative photoresist to one surface of the photomask; an exposure step of irradiating light toward the opposite surface of the transparent substrate from the photomask to cure a portion of the negative photoresist with the light irradiated on the negative photoresist through the pattern groove; a developing step of removing an uncured portion of the negative photoresist while leaving the cured portion of the negative photoresist as a microstructure; a pyrolysis step of heating and carbonizing the microstructure thus obtained; and a cathode attachment step of attaching a voltage- supplying cathode to the surface of the transparent substrate on which the microstructure is formed.
Abstract:
Provided are methods of manufacturing carbon nanotube (CNT) paste, to which a nano-sized particle is added, and a CNT emitter with high reliability for a field emission display (FED). The method includes the steps of: (i) dispersing CNT powder in a solvent; (ii) adding an organic binder to the solution in which the CNT powder is dispersed; and (iii) performing a milling process to adjust viscosity of the dispersion solution to which the organic binder is added, wherein a nano-sized metal particle is added in step (i) or (iii). Accordingly, the nano-sized metal particle is added as a metal filler of the CNT paste, and thus a metal may be melted at a low temperature at which CNTs do not deteriorate. Thus, adhesion between the CNT paste and a cathode may be improved, and resistance between the cathode and the CNT or between CNTs may be reduced. Further, the CNT paste manufactured by the above method is employed in manufacturing the CNT emitter to thereby obtain uniform emission of electrons from the CNT emitter and increase electron emission sites, and thus the reliability of the CNT emitter may be further improved.
Abstract:
Emitter (3) and target (7) are arranged so as to face each other in vacuum chamber (1), and guard electrode (5) is provided at outer circumferential side of electron generating portion (31) of emitter (3). Emitter (3) is supported movably in both end directions of vacuum chamber (1) by emitter supporting unit (4) having movable body (40). To perform regeneration process of guard electrode (5), emitter is moved to no-discharge position by operating emitter supporting unit, and state in which field emission of electron generating portion (31) is suppressed is set, then by applying voltage across guard electrode (5), discharge is repeated. After regeneration process, by operating emitter supporting unit again, emitter is moved to discharge position, and state in which field emission of electron generating portion (31) is possible is set with movement of movable body (40) toward the other end side being restrained by movement restraining unit (6).
Abstract:
An electron emitter includes a guard electrode 13 on the outer circumferential side of a carbon film structure 10 which is formed on a substrate 7 by plasma CVD method. This guard electrode 13 includes a curved surface portion (a curved surface portion that curves from top toward a side opposite to the film-forming direction) 13a convex in a film-forming direction of the carbon film structure 10. A curvature radius R1 of an outer-circumferential-side portion of the curved surface portion 13a is larger than or equal to a curvature radius R2 of a carbon-film-structure-side portion of the curved surface portion 13a.